JPWO2020115595A5 - - Google Patents
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- Publication number
- JPWO2020115595A5 JPWO2020115595A5 JP2020559046A JP2020559046A JPWO2020115595A5 JP WO2020115595 A5 JPWO2020115595 A5 JP WO2020115595A5 JP 2020559046 A JP2020559046 A JP 2020559046A JP 2020559046 A JP2020559046 A JP 2020559046A JP WO2020115595 A5 JPWO2020115595 A5 JP WO2020115595A5
- Authority
- JP
- Japan
- Prior art keywords
- oxide layer
- insulating film
- film
- oxide
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 5
- 238000004519 manufacturing process Methods 0.000 claims 4
- 239000002184 metal Substances 0.000 claims 2
- 238000001459 lithography Methods 0.000 claims 1
- 238000001039 wet etching Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018229973 | 2018-12-07 | ||
| JP2018229973 | 2018-12-07 | ||
| PCT/IB2019/060011 WO2020115595A1 (ja) | 2018-12-07 | 2019-11-21 | 半導体装置、および半導体装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2020115595A1 JPWO2020115595A1 (ja) | 2021-12-23 |
| JPWO2020115595A5 true JPWO2020115595A5 (https=) | 2022-11-25 |
| JP7391875B2 JP7391875B2 (ja) | 2023-12-05 |
Family
ID=70973580
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020559046A Active JP7391875B2 (ja) | 2018-12-07 | 2019-11-21 | 半導体装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US12278291B2 (https=) |
| JP (1) | JP7391875B2 (https=) |
| WO (1) | WO2020115595A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12477837B2 (en) * | 2019-10-11 | 2025-11-18 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| TW202431429A (zh) * | 2022-10-14 | 2024-08-01 | 日商半導體能源研究所股份有限公司 | 半導體裝置及記憶體裝置 |
| WO2024095108A1 (ja) * | 2022-11-03 | 2024-05-10 | 株式会社半導体エネルギー研究所 | 半導体装置、及び記憶装置 |
| WO2025046436A1 (ja) * | 2023-08-31 | 2025-03-06 | 株式会社半導体エネルギー研究所 | 半導体装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9373711B2 (en) | 2013-02-27 | 2016-06-21 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
| JP6126509B2 (ja) * | 2013-10-04 | 2017-05-10 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| TW201624708A (zh) | 2014-11-21 | 2016-07-01 | 半導體能源研究所股份有限公司 | 半導體裝置及記憶體裝置 |
| JP6711642B2 (ja) | 2015-02-25 | 2020-06-17 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP6705663B2 (ja) | 2015-03-06 | 2020-06-03 | 株式会社半導体エネルギー研究所 | 半導体装置およびその作製方法 |
| KR102320483B1 (ko) * | 2016-04-08 | 2021-11-02 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 그 제작 방법 |
| KR102330605B1 (ko) * | 2016-06-22 | 2021-11-24 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| KR20180048327A (ko) * | 2016-11-01 | 2018-05-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 및 반도체 장치의 제작 방법 |
| KR20180055701A (ko) * | 2016-11-17 | 2018-05-25 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 반도체 장치의 제작 방법 |
| KR20180066848A (ko) * | 2016-12-09 | 2018-06-19 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치, 및 반도체 장치의 제작 방법 |
-
2019
- 2019-11-21 US US17/296,358 patent/US12278291B2/en active Active
- 2019-11-21 WO PCT/IB2019/060011 patent/WO2020115595A1/ja not_active Ceased
- 2019-11-21 JP JP2020559046A patent/JP7391875B2/ja active Active
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