JPWO2019142406A1 - 炭化珪素半導体装置 - Google Patents
炭化珪素半導体装置 Download PDFInfo
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 105
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 105
- 239000004065 semiconductor Substances 0.000 title claims abstract description 51
- 239000012535 impurity Substances 0.000 claims abstract description 302
- 239000000758 substrate Substances 0.000 claims abstract description 40
- 239000010410 layer Substances 0.000 description 33
- 239000011229 interlayer Substances 0.000 description 30
- 210000000746 body region Anatomy 0.000 description 26
- 239000000463 material Substances 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 235000012239 silicon dioxide Nutrition 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 3
- 229910005883 NiSi Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000001294 propane Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 238000005092 sublimation method Methods 0.000 description 1
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Abstract
Description
まず、本開示の実施形態の概要について説明する。
以下、実施の形態について図に基づいて説明する。なお、以下の図面において、同一または相当する部分には同一の参照番号を付し、その説明は繰り返さない。本明細書中の結晶学的記載においては、個別方位を[]、集合方位を<>、個別面を()、集合面を{}でそれぞれ示している。また結晶学上の指数が負であることは、通常、”−”(バー)を数字の上に付すことによって表現されるが、本明細書中では数字の前に負の符号を付している。
まず、第1不純物領域を形成する工程が実施される。たとえば昇華法によって製造された炭化珪素インゴット(図示せず)がスライスされることにより、炭化珪素単結晶基板15が準備される。次に、炭化珪素層を形成する工程が実施される。たとえば原料ガスとしてシラン(SiH4)とプロパン(C3H8)との混合ガスを用い、キャリアガスとしてたとえば水素(H2)を用いたCVD(Chemical Vapor Deposition)法により、炭化珪素単結晶基板15上に炭化珪素層16が形成される(図6参照)。炭化珪素単結晶基板15と炭化珪素層16とが第1不純物領域11を構成する。エピタキシャル成長の際、たとえば窒素などのn型不純物が炭化珪素層16に導入される。炭化珪素層16は、n型の導電型を有する。炭化珪素層16の形成と同時に、炭化珪素単結晶基板15上に第1ドリフト層26(図2参照)が形成される。
本実施形態に係る炭化珪素半導体装置100によれば、第1不純物領域11、第2不純物領域12、第3不純物領域13および第4不純物領域14の各々は、ゲートパッド5とドレイン電極40との間にある。第2不純物領域12および第4不純物領域14の双方により、ドレイン電極40からゲートパッド5に向かう電気力線を遮蔽することができる。これにより、ドレイン電極40とゲートパッド5との間の静電容量を低減することができる。結果として、炭化珪素半導体装置100のスイッチング特性を向上することができる。
Claims (13)
- 第1主面と、前記第1主面と反対側の第2主面とを有する炭化珪素基板と、
前記第1主面に対面するゲートパッドと、
前記第2主面に接するドレイン電極とを備え、
前記炭化珪素基板は、
前記第2主面を構成し、かつ第1導電型を有する第1不純物領域と、
前記第1不純物領域上に設けられ、前記第1導電型と異なる第2導電型を有する第2不純物領域と、
前記第2不純物領域上に設けられ、かつ前記第1導電型を有する第3不純物領域と、
前記第3不純物領域上に設けられ、前記第1主面を構成し、かつ前記第2導電型を有する第4不純物領域とを含み、
前記第1不純物領域、前記第2不純物領域、前記第3不純物領域および前記第4不純物領域の各々は、前記ゲートパッドと前記ドレイン電極との間にある、炭化珪素半導体装置。 - 前記第1主面上にあるソース電極をさらに備え、
前記第2不純物領域は、前記ソース電極と電気的に接続されている、請求項1に記載の炭化珪素半導体装置。 - 前記第2不純物領域の不純物濃度は、1×1017cm−3以上1×1020cm−3以下である、請求項1または請求項2に記載の炭化珪素半導体装置。
- 前記第2不純物領域の厚みは、100nm以上2μm以下である、請求項1〜請求項3のいずれか1項に記載の炭化珪素半導体装置。
- 前記第4不純物領域の不純物濃度は、1×1016cm−3以上1×1020cm−3以下である、請求項1〜請求項4のいずれか1項に記載の炭化珪素半導体装置。
- 前記第4不純物領域の厚みは、100nm以上2μm以下である、請求項1〜請求項5のいずれか1項に記載の炭化珪素半導体装置。
- 前記第1主面に対して垂直な方向から見て、前記第2不純物領域の面積は、前記ゲートパッドの面積以上である、請求項1〜請求項6のいずれか1項に記載の炭化珪素半導体装置。
- 前記第1主面に対して垂直な方向から見て、前記第4不純物領域の面積は、前記ゲートパッドの面積以上である、請求項1〜請求項7のいずれか1項に記載の炭化珪素半導体装置。
- 第1主面と、前記第1主面と反対側の第2主面とを有する炭化珪素基板と、
前記第1主面に対面するゲートパッドと、
前記第2主面に接するドレイン電極と、
前記第1主面上にあるソース電極とを備え、
前記炭化珪素基板は、
前記第2主面を構成し、かつ第1導電型を有する第1不純物領域と、
前記第1不純物領域上に設けられ、前記第1導電型と異なる第2導電型を有する第2不純物領域と、
前記第2不純物領域上に設けられ、かつ前記第1導電型を有する第3不純物領域と、
前記第3不純物領域上に設けられ、前記第1主面を構成し、かつ前記第2導電型を有する第4不純物領域とを含み、
前記第1不純物領域、前記第2不純物領域、前記第3不純物領域および前記第4不純物領域の各々は、前記ゲートパッドと前記ドレイン電極との間にある、
前記第2不純物領域は、前記ソース電極と電気的に接続されており、
前記第1主面に対して垂直な方向から見て、前記第2不純物領域および前記第4不純物領域の各々の面積は、前記ゲートパッドの面積以上である、炭化珪素半導体装置。 - 前記第2不純物領域の不純物濃度は、1×1017cm−3以上1×1020cm−3以下である、請求項9に記載の炭化珪素半導体装置。
- 前記第2不純物領域の厚みは、100nm以上2μm以下である、請求項9または請求項10記載の炭化珪素半導体装置。
- 前記第4不純物領域の不純物濃度は、1×1016cm−3以上1×1020cm−3以下である、請求項9〜請求項11のいずれか1項に記載の炭化珪素半導体装置。
- 前記第4不純物領域の厚みは、100nm以上2μm以下である、請求項9〜請求項12のいずれか1項に記載の炭化珪素半導体装置。
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JP2014017326A (ja) * | 2012-07-06 | 2014-01-30 | Rohm Co Ltd | 半導体装置および半導体装置の製造方法 |
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