JPWO2019131904A1 - 接続構造体及びその製造方法 - Google Patents
接続構造体及びその製造方法 Download PDFInfo
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- JPWO2019131904A1 JPWO2019131904A1 JP2019562183A JP2019562183A JPWO2019131904A1 JP WO2019131904 A1 JPWO2019131904 A1 JP WO2019131904A1 JP 2019562183 A JP2019562183 A JP 2019562183A JP 2019562183 A JP2019562183 A JP 2019562183A JP WO2019131904 A1 JPWO2019131904 A1 JP WO2019131904A1
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- conductive
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- electrode
- adhesive
- conductive particle
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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Abstract
Description
フェノキシ樹脂(ユニオンカーバイド株式会社製、製品名:PKHC、重量平均分子量:45000)50gを、トルエン(沸点:110.6℃)と酢酸エチル(沸点:77.1℃)との混合溶剤(質量比でトルエン:酢酸エチル=1:1)に溶解して、固形分40質量%のフェノキシ樹脂溶液を得た。このフェノキシ樹脂溶液に、ラジカル重合性材料として、ウレタンアクリレート(根上工業株式会社製、製品名:UN7700)及びリン酸エステルジメタクリレート(共栄社化学株式会社製、製品名:ライトエステルP−2M)と、硬化剤として1,1−ビス(t−ヘキシルパーオキシ)−3,3,5−トリメチルシクロヘキサン(日油株式会社製、製品名:パーヘキサTMH)とを、フェノキシ樹脂:ウレタンアクリレート:リン酸エステルジメタクリレート:硬化剤=10:10:3:2の固形質量比で配合し溶液A1を得た。
まず、ジビニルベンゼン、スチレンモノマー及びブチルメタクリレートの混合溶液に、重合開始剤としてベンゾイルパーオキサイドを投入して、高速で均一撹拌しながら加熱して重合反応を行うことで微粒子分散液を得た。この微粒子分散液をろ過し減圧乾燥することで、微粒子の凝集体であるブロック体を得た。さらに、このブロック体を粉砕することで、それぞれ架橋密度の異なる平均粒子径20μmの核体(樹脂粒子)を作製した。
<接着剤フィルムの作製>
100体積部の溶液A1に対して、45体積部の導電粒子B1と15体積部の導電粒子C1を分散させて、混合溶液を得た。得られた混合溶液を、厚さ80μmのフッ素樹脂フィルム上に塗布し、70℃で10分間熱風乾燥することにより溶剤を除去して、フッ素樹脂フィルム上に形成された厚さ20μmの接着剤フィルム(接着剤層)を得た。
(低圧接続時の導電性の評価)
図3(a),(b)に示すように、得られたフィルム状の接着剤組成物を6mm×6mmに切り出した接着剤フィルム31を、6mm×50mmの銅箔32の略中央に配置し、株式会社大橋製作所製BD−07を用いて加熱加圧(50℃、0.1MPa、2秒間)を行って貼り付けた。続いて、図3(c),(d)に示すように、50mm×6mmのアルミ箔表面に、絶縁層として厚さ2μmのポリプロピレン層を形成したアルミラミネートフィルム(藤森工業株式会社製、製品名:アルミナミネートフィルムZBP−0513)33を用意した。銅箔32と接着剤フィルム31との積層体に対して、接着剤フィルム31を覆うようにアルミラミネートフィルム33を重ねて、株式会社大橋製作所製BD−07で加熱加圧(150℃、1.0MPa、10秒間)を行った。これにより、銅箔32、接着剤フィルム31、絶縁層(ポリプロピレン層)及びアルミ箔がこの順で積層された評価用の接続構造体を得た。得られた接続構造体に対して、図4に示すように電流計及び電圧計を接続し、4端子法で接続抵抗(初期)を測定した。結果を表1に示す。
図3(a),(b)に示すように、得られたフィルム状の接着剤組成物を6mm×6mmに切り出した接着剤フィルム31を、6mm×50mmの銅箔32の略中央に配置し、株式会社大橋製作所製BD−07を用いて加熱加圧(50℃、0.5MPa、2秒間)を行って貼り付けた。続いて、図3(c),(d)に示すように、50mm×6mmのアルミ箔表面に、絶縁層として厚さ2μmのポリプロピレン層を形成したアルミラミネートフィルム(藤森工業株式会社製、製品名:アルミナミネートフィルムZBP−0513)33を用意した。銅箔32と接着剤フィルム31との積層体に対して接着剤フィルム31を覆うようにアルミラミネートフィルム33を重ねて、株式会社大橋製作所製BD−07で加熱加圧(150℃、3.0MPa、10秒間)を行った。これにより、銅箔32、接着剤フィルム31、絶縁層(ポリプロピレン層)及びアルミ箔がこの順で積層された評価用の接続構造体を得た。
得られた接続構造体に対して、図4に示すように電流計、電圧計を接続し、4端子法で接続抵抗(初期)を測定した。なお、端子をアルミラミネートフィルム33に接続する際には、端子を強く押し付けて充分に導通させた後に抵抗を測定した。また、エスペック株式会社製TSA−43ELを使用して、−20℃で30分間保持、10分間かけて100℃まで昇温、100℃で30分間保持、10分間かけて−20℃まで降温、というヒートサイクルを500回繰り返すヒートサイクル試験を接続構造体に対して行った後に、上記と同様にして接続抵抗(ヒートサイクル試験後)を測定した。結果を表1に示す。
第1の接着剤層及び第2の接着剤層において、導電粒子B1(第1の導電粒子)を用いなかった以外は、実施例1と同様にして、接着剤フィルムの作製、並びに、接続構造体の作製及び評価を行った。
第1の接着剤層及び第2の接着剤層において、導電粒子C1(第2の導電粒子)を用いなかった以外は、実施例1と同様にして、接着剤フィルムの作製、並びに、接続構造体の作製及び評価を行った。
Claims (4)
- 第1の基板及び前記第1の基板上に形成された第1の電極を有する第1の電子部材と、第2の基板及び前記第2の基板上に形成された第2の電極を有する第2の電子部材との間に接着剤層を配置し、前記第1の電極と前記第2の電極とが互いに電気的に接続するように、前記第1の電子部材と前記第2の電子部材とを前記接着剤層を介して圧着する工程を備える、接続構造体の製造方法であって、
前記第1の電子部材は、前記第1の電極の前記第1の基板と反対側に形成された絶縁層を更に有し、
前記接着剤層は、デンドライト状の導電粒子である第1の導電粒子と、前記第1の導電粒子以外の導電粒子であって、非導電性の核体及び該核体上に設けられた導電層を有する導電粒子である第2の導電粒子と、を含有する、製造方法。 - 前記導電層が、金、ニッケル及びパラジウムからなる群より選ばれる少なくとも1種を含有する、請求項1に記載の製造方法。
- 第1の基板、前記第1の基板上に形成された第1の電極、及び前記第1の電極の前記第1の基板と反対側に形成された絶縁層を有する第1の電子部材と、
第2の基板、及び前記第2の基板上に形成された第2の電極を有する第2の電子部材と、
前記第1の電極と前記第2の電極とを互いに電気的に接続する接続部材と、を備え、
前記接続部材は、デンドライト状の導電粒子である第1の導電粒子と、前記第1の導電粒子以外の導電粒子であって、非導電性の核体及び該核体上に設けられた導電層を有する導電粒子である第2の導電粒子と、を含有する、接続構造体。 - 前記導電層が、金、ニッケル及びパラジウムからなる群より選ばれる少なくとも1種を含有する、請求項3に記載の接続構造体。
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WO2019131904A1 (ja) | 2019-07-04 |
TWI797225B (zh) | 2023-04-01 |
KR20200103043A (ko) | 2020-09-01 |
CN111512502B (zh) | 2022-06-03 |
TW201933964A (zh) | 2019-08-16 |
US11355469B2 (en) | 2022-06-07 |
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