JPWO2019131115A1 - 静電チャック装置 - Google Patents
静電チャック装置 Download PDFInfo
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- JPWO2019131115A1 JPWO2019131115A1 JP2019562943A JP2019562943A JPWO2019131115A1 JP WO2019131115 A1 JPWO2019131115 A1 JP WO2019131115A1 JP 2019562943 A JP2019562943 A JP 2019562943A JP 2019562943 A JP2019562943 A JP 2019562943A JP WO2019131115 A1 JPWO2019131115 A1 JP WO2019131115A1
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- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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Abstract
Description
本願は、2017年12月28日に、日本に出願された特願2017−253791号に基づき優先権を主張し、その内容をここに援用する。
本発明の第一の態様においては、前記ベース部は、前記静電チャック部側の面に、前記第2の貫通孔と連通し前記第2の貫通孔よりも径が大きいザグリ穴が設けられている構成としてもよい。
本発明の第一の態様においては、前記第1の貫通孔、前記第3の貫通孔、前記ザグリ穴、及び前記第2の貫通孔は、平面視で、同心の円形状であり、かつ、この順で連通しており、前記第2の貫通孔内の前記絶縁碍子の先端の高さは、ザグリ穴の底面と同じ高さにあっても良い。
本発明の第一の態様においては、前記第1の貫通孔の内径及び前記筒状の絶縁碍子の内径が等しくても良い。
本発明の第一の態様においては、前記筒状の絶縁碍子の内径が前記第1の貫通孔の内径より大きくても良い。
以下、図1〜図5を参照しながら、本発明の実施形態に係る静電チャック装置について説明する。なお、以下の全ての図面においては、図面を見やすくするため、各構成要素の寸法や比率などは適宜異ならせている場合がある。また以下の例は、発明の趣旨をより良く理解させるために具体的に好ましい例を説明するものであり、特に指定のない限り、本発明を限定するものではない。本発明の趣旨を逸脱しない範囲で、数や位置やサイズや割合や部材等などについて、省略、追加、置換、その他の変更が可能である。
静電チャック部2は、上面を半導体ウエハなどの板状試料Wを載置する載置面2aとした載置板11と、この載置板11と一体化され前記載置板11の底部側を支持する支持板12と、これら載置板11と支持板12との間に設けられた静電吸着用電極13および静電吸着用電極13の周囲を絶縁する絶縁材層14と、を有している。
ベース部3は、静電チャック部2を所望の温度に調整するためのもので、厚みのある円板状の部材である。また、ベース部3は、高周波発生用電極の機能を兼ね備えていてもよい。
ヒータ9は、静電チャック部2の下面2bに図示略の接着剤を介して固定されている。
また、ヒータ9は、静電チャック部2の下面2bとベース部3の上面3aの間において、接着層4に埋め込まれている。
接着層4は、静電チャック部2の下面2bと、ベース部3の上面3aとの間に介在し、静電チャック部2とベース部3とを接着一体化する。静電チャック部2の下面2bに取り付けられたヒータ9は、接着層4に埋没している。
静電チャック部2、ベース部3および接着層4には、これらを上下に貫通する冷却ガス導入孔30Aとピン挿通孔30Bとがそれぞれ複数設けられている。
絶縁碍子40は、任意に選択される材料、例えばセラミックを形成材料とする。絶縁碍子40は、プラズマに対する耐久性を有する。絶縁碍子40を構成するセラミックスとしては、窒化アルミニウム(AlN)、酸化アルミニウム(Al2O3)、窒化ケイ素(Si3N4)、酸化ジルコニウム(ZrO2)、サイアロン、窒化ホウ素(BN)、炭化ケイ素(SiC)から選択された1種または2種以上を含むセラミックスを好ましく採用できる。
図3は、比較例としての静電チャック装置1Xについて、使用時の様子を説明する図である。
図4は、静電チャック装置1の効果を説明する図である。図3,4はいずれも図2と同じ視野の断面図である。
図に示すヒータ9は、平面視で貫通孔30の周囲を囲んで形成された帯状の第1部位91と、第1部位91よりも貫通孔30から離れて形成された帯状の第2部位92と、を有している。第1部位91と第2部位92とは連続している。また、第1部位91の幅は、第2部位92の幅よりも細く設けられている。帯状の第1部位91は、アルファベットのC型の形状、すなわち閉じない環の形状を有する。示される流路21の形状は好ましい例であるが、これのみに限定されない。
また平面視での、ヒータ9と第2の貫通孔の内周面までの最小距離は、条件に応じて任意に選択できる。例えば前記距離は、第1部位と貫通孔との最小距離L1に対して、0.3〜0.7であることが好ましい。このような距離にあることで、耐電圧と均熱性が両立する効果が得られる。
また平面視での、ヒータ9とザグリ穴の側面までの最小距離も、条件に応じて任意に選択できる、例えば前記距離は、第1部位と貫通孔との最小距離L1に対して、0.2〜0.8であることが好ましく、0.3〜0.6であることがより好ましい。このような距離にあることで、耐電圧と均熱性が両立する効果が得られる。
1X 比較例の静電チャック装置
2…静電チャック部
2a…載置面
2b…静電チャック部の下面
3…ベース部
3a ベース部の上面
4…接着層
9…ヒータ
11 載置板
12 支持板
13…静電吸着用電極
14 絶縁材層
15 給電用端子16 貫通孔
21…流路
22 リフトピン
30…貫通孔
30A 冷却ガス導入孔
30B ピン挿通孔
31…第1の貫通孔
32…第2の貫通孔
32a 第2の貫通孔の内周面
33…ザグリ穴
33a ザグリ穴の側面
33b ザグリ穴の底面
34 大径のザグリ穴
34a 大径のザグリ穴の固定面
34b ネジ孔
39…第3の貫通孔
40…絶縁碍子
40a 絶縁碍子の外周面
41 絶縁碍子の第1の端部
41a…絶縁碍子の先端(頂面)
42 絶縁碍子の第2の端部
42a フランジ部
42b 貫通孔
46 ネジ
48…固定部
49 接着層
50 支持板の底面
91…第1部位
92…第2部位
A1、A2,A3 白矢印(熱)
G 冷却ガス
L1 第1部位と貫通孔との最小距離
L2 流路と貫通孔との最小距離
W…板状試料
W1 第1部位の幅
W2 第2部位の幅
α 領域
II 領域
Claims (9)
- 一主面として板状試料を載置する載置面を有し、静電吸着用電極を備える静電チャック部と、
前記静電チャック部に対し、前記載置面とは反対側に配置され、前記静電チャック部を冷却するベース部と、
前記静電チャック部と前記ベース部との間、または静電チャック部の内部に層状に配置されたヒータと、
前記静電チャック部と前記ベース部とを接着して一体化する接着層と、を備え、
前記静電チャック部には、第1の貫通孔が設けられ、
前記ベース部には、前記第1の貫通孔と連通する第2の貫通孔が設けられ、
前記接着層には、前記第1の貫通孔および第2の貫通孔と連通する第3の貫通孔が設けられ、
前記第2の貫通孔には、筒状の絶縁碍子が固定され、
前記絶縁碍子の前記静電チャック部側の先端は、前記静電チャック部と空間を介して離間している、静電チャック装置。 - 前記ベース部は、前記静電チャック部側の面に、前記第2の貫通孔と連通し前記第2の貫通孔よりも径が大きいザグリ穴が設けられている、請求項1に記載の静電チャック装置。
- 前記第3の貫通孔は、前記第1の貫通孔よりも径が大きい、請求項1に記載の静電チャック装置。
- 前記ヒータは、平面視で前記第1の貫通孔の周囲を囲んで形成された帯状の第1部位と、
前記第1部位よりも前記第1の貫通孔から離れて形成された帯状の第2部位と、を有し、
前記第1部位と前記第2部位とは連続しており、
前記第1部位の幅は、前記第2部位の幅よりも細い、請求項1に記載の静電チャック装置。 - 前記ベース部は、冷媒を流動させる流路を有し、
前記ヒータは、平面視で前記第1の貫通孔の周囲を囲んで形成された帯状の第1部位を有し、
平面視における前記第1部位と前記第1の貫通孔との距離の最小値は、平面視における前記流路と前記第1の貫通孔との距離の最小値よりも小さい、請求項1に記載の静電チャック装置。 - 前記絶縁碍子の前記静電チャック部とは反対側の端部は、前記ベース部に着脱可能に固定する固定部を有する、請求項1に記載の静電チャック装置。
- 前記第1の貫通孔、前記第3の貫通孔、前記ザグリ穴、及び前記第2の貫通孔は、平面視で、同心の円形状であり、この順で連通しており、
前記第2の貫通孔内の前記絶縁碍子の先端の高さは、ザグリ穴の底面と同じ高さにある、請求項2に記載の静電チャック装置。 - 前記第1の貫通孔の内径及び前記筒状の絶縁碍子の内径が等しい、請求項1に記載の静電チャック装置。
- 前記筒状の絶縁碍子の内径が、前記第1の貫通孔の内径より大きい、請求項1に記載の静電チャック装置。
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