JPWO2019106809A1 - シート状積層体及び積層物 - Google Patents
シート状積層体及び積層物 Download PDFInfo
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- JPWO2019106809A1 JPWO2019106809A1 JP2019556496A JP2019556496A JPWO2019106809A1 JP WO2019106809 A1 JPWO2019106809 A1 JP WO2019106809A1 JP 2019556496 A JP2019556496 A JP 2019556496A JP 2019556496 A JP2019556496 A JP 2019556496A JP WO2019106809 A1 JPWO2019106809 A1 JP WO2019106809A1
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- resin
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- laminate
- metal element
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- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000000634 powder X-ray diffraction Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical compound [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003755 zirconium compounds Chemical class 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/082—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising vinyl resins; comprising acrylic resins
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Soft Magnetic Materials (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Abstract
Description
(Fe1−aMa)100−x−y−z−α−β−γCuxSiyBzM’αM’’βXγ (1)
化学式(1)中、Mは、Co及びNiのうち一方又は両方である。M’は、Nb、Mo、Ta、Ti、Zr、Hf、V、Cr、Mn及びWからなる群より選ばれる少なくとも一種である。M’’は、Al、白金族元素、Sc、希土類元素、Au、Zn、Sn及びReからなる群より選ばれる少なくとも一種である。Xは、C、Ge、P、Ga、Sb、In、Be及びAsからなる群より選ばれる少なくとも一種である。a、x、y、z、α、β及びγは、それぞれ0≦a≦0.5、0.1≦x≦3、0≦y≦30、0≦z≦25、5≦y+z≦30、0≦α≦20、0≦β≦20及び0≦γ≦20を満足する。
アクリル樹脂のシクロヘキサノン溶液219.6g、エポキシ樹脂のメチルエチルケトン溶液39.84g、フェノールノボラック樹脂のメチルエチルケトン溶液17.32g、硬化促進剤のメチルエチルケトン溶液2.00g及びシランカップリング剤4.5gを計り取り、これらの原料を650mlの軟膏容器に入れた。
実施例2〜11及び比較例1其々のシート状積層体の作製では、樹脂層を構成する成分として、下記の表1又は表2に示されるアクリル樹脂、エポキシ樹脂、フェノール樹脂、硬化促進剤、カップリング剤及び金属粉(金属元素)が用いられた。実施例2〜11及び比較例1其々の樹脂層の作製に用いられた各成分の質量は、下記の表1又は表2に示さる。実施例2〜11及び比較例1其々の樹脂層における金属元素含有粉の含有量(単位:質量%)は、下記の表1又は表2に示される。実施例2〜11及び比較例1其々の樹脂層における金属元素含有粉の含有量(単位:体積%)は、下記の表1又は表2に示される。実施例2〜11及び比較例1其々のシート状積層体の作製では、下記の表1又は表2に示される金属箔を用いた。実施例2〜11及び比較例1其々のMA/(ME+MP)は、下記表1に示される。
下記の表1及び表2に記載の「JER828」は、三菱ケミカル株式会社製のビスフェノールA型エポキシ樹脂である。JER828のメチルエチルケトン溶液のNV(不揮発分の含有量)は、60.2質量%であった。
下記の表1及び表2に記載の「YX4000」は、三菱ケミカル株式会社製のビフェニル型エポキシ樹脂である。YX4000のメチルエチルケトン溶液のNV(不揮発分の含有量)は、50.8質量%であった。
下記の表1及び表2に記載の「TypeA」は、新東工業株式会社製のFeSiCrからなる粉末平均粒子径2μm)である。
下記の表1及び表2に記載の「MT18SD‐H」は、三井金属鉱業株式会社製の銅箔(キャリア箔付き銅箔、厚み:3μm)である。
下記の表1及び表2に記載の「3EC‐M3‐VLP」は、三井金属鉱業株式会社製の銅箔(ロープロファイル電解銅箔、厚み:12μm)である。
下記の表1及び表2に記載の「MW‐P‐VSP」は、三井金属鉱業株式会社製の銅箔(厚み:18μm)である。
下記の表1及び表2に記載の「1085」は、株式会社UACJ製箔製のアルミニウム箔(厚み:12μm)である。
実施例1〜11及び比較例1其々のシート状積層体の充填性を以下の方法で個別に評価した。
実施例1〜11其々の樹脂層の比透磁率μ’を、インピーダンス・アナライザによって個別に測定した。測定結果は、下記表1又は表2に示される。比透磁率μ’の測定には、金属箔に積層される前の樹脂層を用いた。測定装置としては、キーサイト・テクノロジー合同会社製の測定装置「F9049A」(商品名)を用いた。比較例1の場合、樹脂層自体の機械的強度が著しく低かったため、樹脂層の比透磁率μ’を測定することはできなかった。
Claims (14)
- 金属箔と、
前記金属箔に積層された樹脂層と、
を備え、
前記樹脂層は、樹脂組成物及び金属元素含有粉を含み、
前記樹脂組成物は、エポキシ樹脂、フェノール樹脂及びアクリル樹脂を含有し、
前記エポキシ樹脂の質量は、MEと表され、
前記フェノール樹脂の質量は、MPと表され、
前記アクリル樹脂の質量は、MAと表され、
MA/(ME+MP)は、1/9以上7/3未満である、
シート状積層体。 - 前記アクリル樹脂のポリスチレン換算の重量平均分子量は、50万以上150万以下である、
請求項1に記載のシート状積層体。 - 前記樹脂層における前記金属元素含有粉の含有量は、70体積%以上100体積%未満である、
請求項1又は2に記載のシート状積層体。 - 前記金属箔は、Fe系合金を含む、
請求項1〜3のいずれか一項に記載のシート状積層体。 - 前記Fe系合金は、Fe及びNbを含有する、
請求項4に記載のシート状積層体。 - 前記Fe系合金は、Fe、Nb、Cu、Si及びBを含有する、
請求項4又は5に記載のシート状積層体。 - 前記金属箔は、結晶粒径が10nm以下である前記Fe系合金の結晶を含む、
請求項4〜6のいずれか一項に記載のシート状積層体。 - 前記金属元素含有粉は、Fe系合金を含有する、
請求項1〜7のいずれか一項に記載のシート状積層体。 - 前記金属元素含有粉に含有される前記Fe系合金は、Fe、Nb、Cu、Si及びBを含有する、
請求項8に記載のシート状積層体。 - 前記金属元素含有粉は、粒子径が10nm以下である金属元素含有粒子を含む、
請求項8又は9に記載のシート状積層体。 - 前記樹脂層は、前記樹脂組成物の半硬化物を含む、
請求項1〜10のいずれか一項に記載のシート状積層体。 - 請求項1〜11のいずれか一項に記載のシート状積層体と、
前記シート状積層体が重ねられた基材と、
を備え、
前記樹脂層が前記基材に接している、
積層物。 - 前記樹脂層の少なくとも一部は、前記基材に形成された凹部又は空洞に充填されている、
請求項12に記載の積層物。 - 前記樹脂層は、前記樹脂組成物の半硬化物、及び前記樹脂組成物の硬化物のうち少なくともいずれか一方を含む、
請求項12又は13に記載の積層物。
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