JPWO2018061384A1 - 感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ - Google Patents
感光性樹脂組成物、導電性パターンの製造方法、基板、タッチパネル及びディスプレイ Download PDFInfo
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- JPWO2018061384A1 JPWO2018061384A1 JP2017557153A JP2017557153A JPWO2018061384A1 JP WO2018061384 A1 JPWO2018061384 A1 JP WO2018061384A1 JP 2017557153 A JP2017557153 A JP 2017557153A JP 2017557153 A JP2017557153 A JP 2017557153A JP WO2018061384 A1 JPWO2018061384 A1 JP WO2018061384A1
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- Prior art keywords
- meth
- resin composition
- photosensitive resin
- acrylate
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- Prior art date
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- XAVMMNWPOYCFPU-UHFFFAOYSA-N 2-[bis(2-hydroxyethyl)amino]ethanolate;propan-2-olate;titanium(4+) Chemical compound [Ti+4].CC(C)[O-].CC(C)[O-].OCCN(CCO)CC[O-].OCCN(CCO)CC[O-] XAVMMNWPOYCFPU-UHFFFAOYSA-N 0.000 description 2
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Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
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Abstract
Description
炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)は、表面を被覆する層(以下、「表面被覆層」)が存在することにより、低温での導電性粒子同士の融着を抑制することができる。
W2=π/6×Dp3ρ×n
そして、以下の式から表面被覆層の平均厚みAを算出することができる。
W1−W2={4/3×π(Dp/2+A)3−π/6×Dp3}×2.0×n
感光性樹脂組成物中の炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)の含有量としては、65〜95質量%であることが好ましく、70〜95質量%であることがより好ましく、70〜90質量%であることがさらに好ましい。その範囲内で含有することで、パターン加工性と導電性の発現とを両立させることができる。ここで全固形分とは、感光性樹脂組成物が含有する成分の内、溶剤を除く全成分をいう。
(i) 感光性樹脂組成物を有機溶媒で希釈し、1H−NMR測定、GC測定及びGC/MS測定をしてその概要を調べる。
(ii) 感光性樹脂組成物を有機溶媒抽出した後に遠心分離を行い、可溶分と不溶分とを分離する。
(iii) 上記不溶分について、高極性有機溶媒で抽出した後に遠心分離を行い、可溶分と不溶分とをさらに分離する。
(iv) 上記(ii)及び(iii)で得られた可溶分の混合液について、IR測定、1H−NMR測定及びGC/MS測定を行う。さらに、上記混合液をGPC分取する。得られた分取物についてIR測定及び1H−NMR測定を行う。また、該分取物については、必要に応じてGC測定、GC/MS測定、熱分解GC/MS測定及びMALDI/MS測定を行う。
(v) 上記(iii)で得られた不溶分についてIR測定又はTOF−SIMS測定を行う。有機物が存在することが確認された場合には、熱分解GC/MS又はTPD/MS測定を行う。
(vi) 上記(i)、(iv)及び(v)の測定結果を総合的に判断することで、感光性樹脂組成物が含有する各成分の含有率を求めることができる。なお、上記(iii)で用いる高極性有機溶媒としては、クロロホルム又はメタノール等が好ましい。
アルカリ可溶性樹脂に酸解離性基を含有させることで、パターン形成後の熱処理で酸解離性基が脱離分解、気化し、パターンが収縮する。これにより、炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)同士の接触を促進し、導電性を向上させると共に、微細なパターンを形成することが可能である。
酸解離性基を有するアルカリ可溶性樹脂(B)は、一般的に、カルボキシル基を含有する化合物と酸解離性基を有する化合物および他モノマーとを共重合させることにより得られる。酸解離性基を有するアルカリ可溶性樹脂(B)は、(メタ)アクリル系共重合体であることが好ましい。ここで(メタ)アクリル系共重合体とは、共重合成分に少なくとも(メタ)アクリル系モノマーを含む共重合体をいう。ここで(メタ)アクリル系モノマーとしては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n−プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、sec−ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、tert−ブチル(メタ)アクリレート、n−ペンチル(メタ)アクリレート、アリル(メタ)アクリレート、ベンジル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、ブトキシトリエチレングリコール(メタ)アクリレート、シクロへキシル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、2−エチルへキシル(メタ)アクリレート、グリセロール(メタ)アクリレート、グリシジル(メタ)アクリレート、ヘプタデカフロロデシル(メタ)アクリレート、2−ヒドロキシエチル(メタ)アクリレート、イソボニル(メタ)アクリレート、2−ヒドロキシプロピル(メタ)アクリレート、イソデキシル(メタ)アクリレート、イソオクチル(メタ)アクリレート、ラウリル(メタ)アクリレート、2−メトキシエチル(メタ)アクリレート、メトキシエチレングリコール(メタ)アクリレート、メトキシジエチレングリコール(メタ)アクリレート、オクタフロロペンチル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、ステアリル(メタ)アクリレート、トリフロロエチル(メタ)アクリレート、(メタ)アクリルアミド、アミノエチル(メタ)アクリレート、フェニル(メタ)アクリレート、1−ナフチル(メタ)アクリレート、2−ナフチル(メタ)アクリレート、チオフェノール(メタ)アクリレート又はベンジルメルカプタン(メタ)アクリレートが挙げられる。
酸解離性基を有する化合物としては、酸解離性基を有する(メタ)アクリル酸エステルが挙げられる。
金属キレート化合物(C)は、中心金属と、該中心金属に二以上の部位で配位した配位子と、を有する化合物のことであり、配位子が容易に脱離し、アルカリ可溶性官能基と錯形成が可能である。アルカリ可溶性樹脂と錯形成することにより、樹脂成分の現像性を制御可能とし、パターン剥がれ抑制効果が顕著なものとなる。
R1は、水素、炭素数1〜6のアルキル基、炭素数4〜7のシクロアルキル基又は炭素数6〜10のアリール基が好ましく、R2及びR3は、それぞれ独立して、水素、炭素数1〜18のアルキル基、炭素数4〜7のシクロアルキル基、炭素数6〜10のアリール基、炭素数1〜4のアルコキシ基又はヒドロキシ基が好ましい。上記のアルキル基、シクロアルキル基、アリール基及びアルコキシ基は、無置換体又は置換体のいずれであっても構わない。Mは、アルミニウム、ジルコニウムまたはビスマスが好ましい。
本発明の感光性樹脂組成物は、分散剤を含有しても構わない。分散剤を含有することで、感光性樹脂組成物中に炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)を安定的に存在させることができる。
本発明の感光性樹脂組成物は、光重合開始剤を含有しても構わない。光重合開始剤を含有することで、感光性樹脂組成物にネガ型感光性を付与することができる。
本発明の感光性樹脂組成物は、溶剤を含有しても構わない。
溶剤としては、例えば、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル、2−ヘプタノール、シクロヘキサノール、シクロペンタノール、2−ブタノール、2−ペンタノール、t−ブタノール、ダイアセトンアルコール、α−テルピネオール、2−ヒドロキシイソイソ酪酸メチル、2−ヒドロキシイソイソ酪酸エチル、プロピレングリコールモノエチルエーテルアセテート、アセト酢酸エチル、アセト酢酸メチル、メチル−3−メトキシプロピオネート、3−メチル−3−メトキシブチルアセテート、シクロペンタノン、シクロヘキサノン、ベンジルエチルエーテル、ジヘキシルエーテル、アセトニルアセトン、イソホロン、酢酸ベンジル、安息香酸エチル、シュウ酸ジエチル、マレイン酸ジエチル、炭酸エチレン、炭酸プロピレン、メチルベンゾエート、エチルベンゾエート、マロン酸ジエチル、β−プロピオラクトン、γ−ブチロラクトン、γ−バレロラクトン、δ−バレロラクトン、γ−カプロラクトン、ε−カプロラクトン、エチレングリコールモノブチルエーテルアセテート、ジエチレングリコールモノエチルエーテルアセテート、ジエチレングリコールモノブチルエーテルアセテート、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジエチレングリコールメチルエチルエーテル、ジプロピレングリコールメチルエーテルアセテート、ジプロピレングリコールジメチルエーテル、プロピレングリコールジアセテート、1,3−ブチレングリコールジアセテート、シクロヘキサノールアセテート、ジメチルスルホキシド、メチルエチルケトン、酢酸イソブチル、酢酸イソブチル、酢酸ブチル、酢酸プロピル、酢酸イソプロピル、アセチルアセトン、トリアセチン又は2−ヘプタノンが挙げられる。
本発明の感光性樹脂組成物は、分散性向上や、導電性コントロールのため、炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)以外の他の粒子を含有しても構わない。他の粒子としては、例えば、表面被覆されていない金属微粒子若しくは金属酸化物微粒子、有機顔料又は無機顔料が挙げられる。
本発明の感光性樹脂組成物は、熱酸発生剤および/または光酸発生剤を含有しても構わない。発生した酸によって、酸解離性基を有するアルカリ可溶性樹脂(B)中の酸解離性基の分解が促進され、空気下での熱処理温度を低下させることが可能となる。
(重合禁止剤)
本発明の感光性樹脂組成物は、重合禁止剤を含有してもよい。重合禁止剤を適量含有することで、現像後の解像度が向上する。重合禁止剤としては特に限定はなく公知のものが使用できる。たとえば、ジ−t−ブチルヒドロキシトルエン、ブチルヒドロキシアニソール、ハイドロキノン、4−メトキシフェノール、1,4−ベンゾキノン、t−ブチルカテコールが挙げられる。また、市販の重合禁止剤としては、「IRGANOX1010」、「IRGANOX 1035」、「IRGANOX 1076」、「IRGANOX 1098」、「IRGANOX 1135」、「IRGANOX 1330」、「IRGANOX1726」、「IRGANOX 1425」、「IRGANOX 1520」、「IRGANOX 245」、「IRGANOX 259」、「IRGANOX 3114」、「IRGANOX565」、「IRGANOX 295」(以上、BASF製)等が挙げられる。
(増感剤)
本発明の感光性樹脂組成物が光酸発生剤を含有する場合、感光性樹脂組成物はさらに増感剤を含有しても構わない。増感剤は、熱処理により気化するもの、又は、硬化膜に残存した場合においても、光照射によって退色するものが好ましい。パターン加工における高解像性の観点から、増感剤は光照射によって退色するものがより好ましい。
R4〜R11におけるアルキル基としては、例えば、メチル基、エチル基又はn−プロピル基が挙げられる。アルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基又はペンチルオキシ基が挙げられる。アルケニル基としては、例えば、ビニル基、アクリロキシプロピル基又はメタクリロキシプロピル基が挙げられる。アリール基としては、例えば、フェニル基、トリル基又はナフチル基が挙げられる。アシル基としては、例えば、アセチル基が挙げられる。なお、化合物の気化性及び光二量化の反応性の観点から、R4〜R11は水素又は炭素数は1〜6の有機基であることが好ましく、R4、R7、R8及びR11は水素であることがより好ましい。
本発明の感光性樹脂組成物は、可視光に吸収を有する顔料及び/又は染料を、炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)同士の接触及び融着を阻害しない範囲で含有しても構わない。感光性樹脂組成物が可視光に吸収を有する顔料および/または染料を含有することより、ポストベーク後の導電性パターンの可視光反射を抑制できる。
本発明の感光性樹脂組成物は、感光性能を調整し、パターン加工性を向上する観点から、アクリルモノマーを、炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)同士の接触及び融着を阻害しない範囲内で含有しても構わない。
本発明の感光性樹脂組成物は、ボールミルや、サンドグラインダー、3本ロールミル、マイルド分散機、メディアレス分散機等の分散機を用いて製造される。炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)を均一に分散したい場合は、分散剤を用いて、予め有機溶剤中に炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)を分散させた分散液を調製し、この分散液を、モノマ、ポリマー、密着改良剤、界面活性剤及び重合禁止剤等を含有する溶液と混合する方法により製造しても良い。炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)の分散液は、表面被覆層が損傷を受けるのを防ぐために、マイルド分散機又はメディアレス分散機を用いて分散させることが好ましく、メディアレス分散機を用いて分散させることがより好ましい。炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)の分散液は、例えば、マイルド分散機ナノゲッター(登録商標)(アシザワファインテック(株))又は高圧湿式メディアレス微粒化装置ナノマイザー(ナノマイザー(株))等の分散機を用いて、有機溶剤中に炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)を分散させて製造される。
次に、本発明の感光性樹脂組成物を用いた、フォトリソ法による導電性パターンの製造方法について説明する。
本発明中で使用される有機成分を含む膜について説明する。
本発明で使用される有機成分を含む膜を構成する成分として、アルカリ可溶性樹脂を含有することが好ましい。アルカリ可溶性基を有することで、本発明の感光性樹脂組成物中の金属キレート化合物(C)と錯形成が可能となる。金属キレート(C)は本発明の感光性樹脂組成物中の酸解離性基を有するアルカリ可溶性樹脂(B)とも錯形成可能であるため、現像密着性が向上する。これにより、厳しい現像条件での処理が可能となり、現像残渣を低減させることができる。
アクリルポリマーは、カルボキシル基及び/または酸無水物基含有(メタ)アクリル化合物、及び(メタ)アクリル酸エステル、及び/またはマレイミドまたはマレイミド誘導をラジカル共重合したのち、エチレン性不飽和二重結合基を有するエポキシ化合物を付加反応して得られるものが好ましい。
(A−1)表面炭素被覆層の平均厚みが1nmで、1次粒子径が50nmの銀粒子(日清エンジニアリング株式会社製)。
(B−1)
500mLのフラスコに2,2’−アゾビス(イソブチロニトリル)を2g、PGMEAを50g仕込んだ。その後、メタクリル酸を15.69g、スチレンを37.45g、ジシクロペンタニルメタクリレートを46.86g仕込み、室温でしばらく撹拌し、フラスコ内をバブリングによって十分に窒素置換した後、70℃で5時間加熱撹拌した。次に、得られた溶液にメタクリル酸グリシジルを10.46g、ジメチルベンジルアミンを1g、p−メトキシフェノールを0.2g、PGMEAを100g添加し、90℃で4時間加熱撹拌し、アクリル樹脂(B−1)の溶液を得た。得られたアクリル樹脂(B−1)の溶液に固形分濃度が40質量%になるようにPGMEAを加えた。アクリル樹脂(B−1)の重量平均分子量(Mw)は25,000であった。
500mLのフラスコに2,2’−アゾビス(イソブチロニトリル)を2g、PGMEA(プロピレングリコールメチルエーテルアセテート)を50g仕込んだ。その後、メタクリル酸を23.26g、ベンジルメタクリレートを31.46g、ジシクロペンタニルメタクリレートを32.80g仕込み、室温でしばらく撹拌し、フラスコ内をバブリングによって十分に窒素置換した後、70℃で5時間加熱撹拌した。次に、得られた溶液にメタクリル酸グリシジルを12.69g、ジメチルベンジルアミンを1g、p−メトキシフェノールを0.2g、PGMEAを100g添加し、90℃で4時間加熱撹拌し、アクリル樹脂(B−2)の溶液を得た。得られたアクリル樹脂(B−2)の溶液に固形分濃度が40質量%になるようにPGMEAを加えた。アクリル樹脂(B−2)の重量平均分子量(Mw)は24,000であった。
(C−1)ALCH:エチルアセトアセテートアルミニウムジイソプロピレート(川研ファインケミカル(株)製)
(C−2)ALCH−TR:アルミニウムトリスエチルアセトアセテート(川研ファインケミカル(株)製)
(C−3)アルミキレートM:アルキルアセトアセテートアルミニウムジイソプロピレート(川研ファインケミカル(株)製)
(C−4)アルミキレートD:アルミニウムモノアセチルアセトネートビス(エチルアセトアセテート)(川研ファインケミカル(株)製)
(C−5)アルミキレートA(W):アルミニウムトリス(アセチルアセトネート)(川研ファインケミカル(株)製)
(C−6)ZC−150:ジルコニウムテトラセチルアセトネート(マツモトファインケミカル(株)製)
(C−7)ZC−540:ジルコニウムトリブトキシモノアセチルアセトネート(マツモトファインケミカル(株)製)
(C−8)ネオスタンU−600:ビスマストリオクテート/2−エチルヘキサン酸(日東化成(株)製)
[分散剤]
DISPERBYK(登録商標)21116(ビックケミー・ジャパン株式会社製)。
PGMEA:プロピレングリコールモノメチルエーテルアセテート(三協化学(株)製)
DPM:ジプロピレングリコールモノメチルエーテル(東邦化学工業(株)製)。
NCI−831(登録商標)(オキシムエステル系化合物;ADEKA(株)製)。
ライトアクリレート(登録商標)PE−3A(共栄社化学(株)製)。
(X−1)
500mlのフラスコにAIBNを1g、PGMEAを50g仕込んだ。その後、メタクリル酸を38.6g、メタクリル酸メチルを16.4g、スチレンを16.4g仕込み、室温でしばらく撹拌し、フラスコ内をバブリングによって十分に窒素置換した後、70℃で5時間加熱撹拌した。次に、得られた溶液にメタクリル酸グリシジルを28.6g、ジメチルベンジルアミンを1g、p−メトキシフェノールを0.2g、PGMEAを100g添加し、90℃で4時間加熱撹拌し、アクリルポリマーの溶液を得た。得られたアクリルポリマーの重量平均分子量(Mw)は29,000であった。
黄色灯下にて、OXE−02:0.25g、LA−87:0.50g、10wt%PGMEA溶液としたTBC:0.50gをPGMEA:14.19g、DAA:30.00gに溶解させ、10wt%PGMEA溶液としたBYK−333:0.30g(濃度300ppmに相当)を加え、撹拌した。そこへ、50wt%PGMEA溶液としたTEPIC−VL:6.49g、20wt%PGMEA溶液としたEG−200:12.49g、DPHA:6.19g、得られたアクリルポリマー:9.36g、「V−259ME(商品名)」(新日鉄住金化学(株)製):18.73g、及びKBM−403:1.00gを加え、撹拌した。次いで0.45μmのフィルターでろ過を行い、組成物(X−1)を得た。
「スミカエクセルPES 4100P(商品名)」(住友化学(株)製)10gにシクロヘキサノンを40g添加攪拌した。このようにして固形分濃度が20wt%の組成物(X−2)を得た。
乾燥窒素気流下、2,2−ビス(3−アミノ−4−ヒドロキシフェニル)ヘキサフルオロプロパン(BAHF;セントラル硝子(株)製)29.3g(0.08モル)、1,3−ビス(3−アミノプロピル)テトラメチルジシロキサン1.24g(0.005モル)、末端封止剤として、3−アミノフェノール3.27g(0.03モル)をN−メチル−2−ピロリドン(NMP)150gに溶解した。ここに3,3’,4,4’−ジフェニルエーテルテトラカルボン酸二無水物(ODPA;マナック(株)製)31.0g(0.1モル)をNMP50gとともに加えて、20℃で1時間撹拌し、次いで50℃で4時間撹拌した。その後、キシレンを15g添加し、水をキシレンとともに共沸しながら、150℃で5時間撹拌した。撹拌終了後、溶液を水3Lに投入して白色沈殿を集めた。この沈殿をろ過で集めて、水で3回洗浄した後、80℃の真空乾燥機で24時間乾燥し、ポリイミドポリマーを得た。このポリイミドポリマー7.5gにGBLを42.5g添加攪拌した。このようにして固形分濃度が15wt%の組成物(X−3)を得た。
黄色灯下にて、「PBG−305(商品名)」(強力電子社製):0.25g、「LA−87(商品名)」(ADEKA(株)製):0.50g、10wt%PGMEA溶液としたTBC:0.50gをPGMEA:2.24g、DAA:30.00gに溶解させ、10wt%PGMEA溶液としたBYK−333:0.30g(濃度300ppmに相当)を加え、撹拌した。そこへ、「TAIC(商品名)」(日本化成(株)製):4.25g、10wt%PGMEA溶液とした「オグソールPG−100(商品名)」(大阪ガスケミカル(株)製):24.50g、「オグソールEA−0250P(商品名)」(大阪ガスケミカル(株)製):1.25g、「M−315(商品名)」(共栄社(株)製):2.75g、「SIRIUS−501(商品名)」(大阪有機工業(株)製):3.12g、「V−259ME(商品名)」(新日鉄住金化学(株)製):29.34g、及び「KBM−403(商品名)」(信越化学工業(株)製):1.00gを加え、撹拌した。次いで0.45μmのフィルターでろ過を行い、組成物(X−4)を得た。
(Y−1)
組成物(X−1)を、無アルカリガラス基板(OA−10G;日本電気硝子株式会社製)上に、スピンコーター(ミカサ(株)製「1H−360S(商品名)」)を用いて650rpmで5秒の条件でスピンコートし、基板をホットプレート(大日本スクリーン製造(株)製「SCW−636(商品名)」)を用いて100℃で2分間プリベークし、膜厚2.5μmのプリベーク膜を得た。プリベーク膜をパラレルライトマスクアライナー(キヤノン(株)製「PLA−501F(商品名)」)を用いて超高圧水銀灯を光源とし、所望のマスクを介して露光した。この後、自動現像装置(滝沢産業(株)製「AD−2000(商品名)」)を用いて、0.045wt%水酸化カリウム水溶液で60秒間シャワー現像し、次いで水で30秒間リンスし、パターン加工を行った。その後、オーブン(「IHPS−222」;エスペック(株)製)を用いて、230℃で30分(空気中)ポストベークを施すことで、有機成分を含む膜(Y−1)を作製した。
組成物(X−2)を、無アルカリガラス基板(OA−10G;日本電気硝子株式会社製)上に、スピンコーター(ミカサ(株)製「1H−360S(商品名)」)を用いて650rpmで5秒の条件でスピンコートし、基板をホットプレート(大日本スクリーン製造(株)製「SCW−636(商品名)」)を用いて100℃で2分間プリベークし、膜厚2.5μmのプリベーク膜を得たその後、オーブン(「IHPS−222」;エスペック(株)製)を用いて、230℃で30分(空気中)ポストベークを施すことで、有機成分を含む膜(Y−2)を作製した。
上記(Y−2)の作製方法と同様の手順により、(X−3)から(Y−3)を作製した。
上記(Y−1)の作製方法と同様の手順により、(X−4)から(Y−4)を作製した。
無アルカリガラス基板(OA−10;日本電気硝子株式会社製)または前記(Y−1)〜(Y−4)の塗布された基板を用い、感光性樹脂組成物のパターン加工性評価を行った。なお、膜厚をプリベーク後2.5μmとし、露光時は感度測定用のグレースケールマスクを用いた。
現像後、30μmのラインアンドスペースパターンを1対1の幅に形成する露光量(以下、これを最適露光量という)を感度とし、最適露光量における現像後の最小パターン寸法を解像度とした。
無アルカリガラス基板(OA−10;日本電気硝子株式会社製)または前記(Y−1)〜(Y−4)の塗布された基板を用い、体積抵抗率評価用導電パターンを作製した。なお、膜厚はプリベーク後0.6μmとし、長方形の透光パターン(10mm×15mm)を有するフォトマスクを介し露光した。
上記の体積抵抗率評価パターンが形成された基板の未露光部分について、透過率評価により、基板上の残渣を評価した。具体的には、未露光部分について、膜形成前後の400nmにおける透過率を、紫外可視分光光度計((株)島津製作所製「MultiSpec−1500(商品名)」)を用いて、測定した。そして、膜形成前の透過率をT0、膜形成後の透過率をTとしたときに、式(T0−T)/T0で表される透過率変化を算出した。透過率変化は好ましくは1.0%未満、より好ましくは0.7%未満である。
まず、炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A−1)80.00g、DISPERBYK21116を6.25g、PGMEA146.25g、DPM150.00gに対し、ホモジナイザーにて、1200rpm、30分の混合処理を施し、さらに、高圧湿式メディアレス微粒化装置ナノマイザー(ナノマイザー(株))を用いて分散して、銀粒子分散体を得た。この銀微粒子分散体382.50gに対し、酸解離性基を有するアルカリ可溶性樹脂(B)を10.00g、金属キレート化合物(C−1)、0.3g、NCI−831を1.20g、PE−3Aを6.00g混合したものに、PGMEA50.00g、DPM50.00gを添加し撹拌することにより、感光性樹脂組成物1を得た。
実施例1と同様の方法で、表1記載の組成の感光性樹脂組成物を得て、それぞれの感光性樹脂組成物について表1〜3記載の基板上で実施例1と同様の評価をした。評価結果を、表1〜3に示す。なお、表中のガラス基板として無アルカリガラス基板(OA−10G;日本電気硝子株式会社製)を使用した。
Claims (22)
- 炭素単体物および/または炭素化合物で表面被覆された導電性粒子(A)、酸解離性基を有するアルカリ可溶性樹脂(B)および金属キレート化合物(C)を含有する、感光性樹脂組成物。
- 前記金属キレート化合物(C)が、Au、Ag、Cu、Cr、Fe、Co、Ni、Bi、Pb、Zn、Pd、Pt、Al、Ti、Zr、Wおよび/またはMoを含む、請求項1記載の感光性樹脂組成物。
- 前記金属キレート化合物(C)がAl、Zrおよび/またはBiを含む、請求項1または2記載の感光性樹脂組成物。
- 前記金属キレート化合物(C)が、2以上の配位子を含む、請求項1〜3のいずれか一項記載の感光性樹脂組成物。
- 前記導電性粒子(A)が、銀を含む、請求項1〜4のいずれか一項記載の感光性樹脂組成物。
- 前記導電性粒子(A)の1次粒子径が1〜700nmである、請求項1〜5のいずれか一項記載の感光性樹脂組成物。
- 請求項1〜6のいずれか一項記載の感光性樹脂組成物を基板上に塗布して塗布膜を得る、塗布工程と、
前記塗布膜を乾燥して乾燥膜を得る、乾燥工程と、
前記乾燥膜を露光及び現像してパターンを形成する、露光現像工程と、
前記パターンをポストベークして導電性パターンを得る、ポストベーク工程と、を備える、導電性パターンの製造方法。 - 前記導電性パターンの幅が、5μm以下である、請求項7記載の導電性パターンの製造方法。
- 請求項1〜6のいずれか一項記載の感光性樹脂組成物の硬化物からなる導電性パターンを具備する、基板。
- 少なくとも有機成分を含む膜上に、導電性パターンを具備する、請求項9記載の基板。
- 少なくとも基材側から、導電性パターン、有機成分を含む膜、および導電性パターンの積層体を具備する、請求項9または10記載の基板。
- 前記有機成分を含む膜が、アルカリ可溶性樹脂を含有する、請求項10または11記載の基板。
- 前記有機成分を含む膜中のアルカリ可溶性樹脂が、極性基を含有する、請求項12記載の基板。
- 前記有機成分を含む膜中のアルカリ可溶性樹脂が、カルド系樹脂を含有する、請求項12記載の基板。
- 前記有機成分を含む膜中のアルカリ可溶性樹脂が、さらにアクリル樹脂を含み、カルド系樹脂とアクリル樹脂の含有量比(重量比)が1:10〜10:1である、請求項14記載の基板。
- 前記有機成分を含む膜が、ポリイミド樹脂、ポリイミドシロキサン樹脂、ポリエーテルスルホン樹脂、ポリベンゾオキサゾール樹脂、アラミド樹脂、エポキシ樹脂および/またはスルホンアミド樹脂を含有する、請求項10〜15のいずれか一項記載の基板。
- 前記有機成分を含む膜が、ポリイミド樹脂、ポリイミドシロキサン樹脂、ポリベンゾオキサゾール樹脂および/またはアラミド樹脂を含有する、請求項16記載の基板。
- 少なくとも請求項1〜6のいずれか一項記載の感光性樹脂組成物を基板上に塗布、乾燥して得られた膜を露光、現像する工程を備える、タッチパネルの製造方法。
- 少なくとも請求項1〜6のいずれか一項記載の感光性樹脂組成物を現像する工程を備える、ディスプレイの製造方法。
- 少なくとも請求項1〜6のいずれか一項記載の感光性樹脂組成物を現像する工程を備える、イメージセンサの製造方法。
- 少なくとも請求項1〜6のいずれか一項記載の感光性樹脂組成物を現像する工程を備える、有機エレクトロルミネッセンス照明の製造方法。
- 少なくとも請求項1〜6のいずれか一項記載の感光性樹脂組成物を現像する工程を備える、太陽電池の製造方法。
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