JPWO2017135296A1 - 多結晶誘電体薄膜および容量素子 - Google Patents
多結晶誘電体薄膜および容量素子 Download PDFInfo
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- 239000010409 thin film Substances 0.000 title claims abstract description 99
- 239000013078 crystal Substances 0.000 claims abstract description 29
- 239000000203 mixture Substances 0.000 claims abstract description 24
- 150000002500 ions Chemical class 0.000 claims description 21
- 239000003990 capacitor Substances 0.000 abstract description 10
- 239000010408 film Substances 0.000 description 41
- 238000000034 method Methods 0.000 description 33
- 239000000758 substrate Substances 0.000 description 20
- 239000000843 powder Substances 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000002441 X-ray diffraction Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000919 ceramic Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 7
- 150000004706 metal oxides Chemical class 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000000224 chemical solution deposition Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005121 nitriding Methods 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052712 strontium Inorganic materials 0.000 description 5
- 229910001427 strontium ion Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 229910052746 lanthanum Inorganic materials 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 229910052715 tantalum Inorganic materials 0.000 description 4
- 229910052779 Neodymium Inorganic materials 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000004323 axial length Effects 0.000 description 3
- 229910052788 barium Inorganic materials 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000001683 neutron diffraction Methods 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000011268 mixed slurry Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- BDAGIHXWWSANSR-NJFSPNSNSA-N hydroxyformaldehyde Chemical compound O[14CH]=O BDAGIHXWWSANSR-NJFSPNSNSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002831 nitrogen free-radicals Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen(.) Chemical compound [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000003746 solid phase reaction Methods 0.000 description 1
- 229910000018 strontium carbonate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Abstract
Description
前記ペロブスカイト型酸窒化物が組成式Aa1Bb1OoNn(a1+b1+o+n=5)で表され、
前記ペロブスカイト型酸窒化物の結晶格子におけるa軸長が理論値よりも大きいことを特徴とする。
=2×4/5+3×1/5
=2.2 ・・・式(1)
=5×4/5+4×1/5
=4.8 ・・・式(2)
次に、薄膜キャパシタ1の製造方法について説明する。以下、Aサイト原子をSr、Bサイト原子をTaとする場合について説明するが、他の種類の原子を用いる場合でも同様である。
11・・・基板
12・・・下部電極
13・・・多結晶誘電体薄膜
14・・・上部電極
Claims (6)
- 主組成がペロブスカイト型酸窒化物である多結晶誘電体薄膜であって、
前記ペロブスカイト型酸窒化物が組成式Aa1Bb1OoNn(a1+b1+o+n=5)で表され、
前記ペロブスカイト型酸窒化物の結晶格子におけるa軸長が理論値よりも大きいことを特徴とする多結晶誘電体薄膜。 - 前記結晶格子のa軸長,b軸長およびc軸長が全て理論値よりも大きい請求項1に記載の多結晶誘電体薄膜。
- BO4N2の8面体構造を有し、前記8面体構造中におけるNの配置がcis型である請求項1または2に記載の多結晶誘電体薄膜。
- Aサイトイオンの平均価数とBサイトイオンの平均価数との和が7価である請求項1〜3のいずれかに記載の多結晶誘電体薄膜。
- 前記a軸長が5.695Å以上である請求項1〜4のいずれかに記載の多結晶誘電体薄膜。
- 請求項1〜5のいずれかに記載の多結晶誘電体薄膜を有する容量素子。
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JP2016017478 | 2016-02-01 | ||
JP2016017478 | 2016-02-01 | ||
PCT/JP2017/003579 WO2017135296A1 (ja) | 2016-02-01 | 2017-02-01 | 多結晶誘電体薄膜および容量素子 |
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JPWO2017135296A1 true JPWO2017135296A1 (ja) | 2019-01-10 |
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US (1) | US10707018B2 (ja) |
EP (1) | EP3412793A4 (ja) |
JP (1) | JP6822419B2 (ja) |
KR (1) | KR102194081B1 (ja) |
CN (1) | CN108603276B (ja) |
TW (1) | TWI612023B (ja) |
WO (1) | WO2017135296A1 (ja) |
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JP6296207B2 (ja) * | 2015-10-02 | 2018-03-20 | Tdk株式会社 | 誘電体薄膜、容量素子および電子部品 |
US11999616B2 (en) * | 2018-08-31 | 2024-06-04 | Tdk Corporation | Dielectric thin film, capacitor element, and electronic circuit board |
JPWO2020045446A1 (ja) * | 2018-08-31 | 2021-08-10 | Tdk株式会社 | 薄膜キャパシタおよび電子回路基板 |
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JP2010143788A (ja) * | 2008-12-18 | 2010-07-01 | Canon Inc | 酸窒化物圧電材料及びその製造方法 |
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EP0740347B1 (de) * | 1995-04-24 | 2002-08-28 | Infineon Technologies AG | Halbleiter-Speichervorrichtung unter Verwendung eines ferroelektrischen Dielektrikums und Verfahren zur Herstellung |
JP5807861B2 (ja) | 2011-06-21 | 2015-11-10 | 昭和電工株式会社 | 誘電体組成物及びその製造方法 |
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JP2010143788A (ja) * | 2008-12-18 | 2010-07-01 | Canon Inc | 酸窒化物圧電材料及びその製造方法 |
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SCIENTIFIC REPORTS, vol. 4, no. 4987, JPN6017012303, 2014, pages 1 - 6, ISSN: 0004324707 * |
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KR20180094021A (ko) | 2018-08-22 |
CN108603276B (zh) | 2020-07-03 |
US20190019622A1 (en) | 2019-01-17 |
KR102194081B1 (ko) | 2020-12-22 |
JP6822419B2 (ja) | 2021-01-27 |
US10707018B2 (en) | 2020-07-07 |
TWI612023B (zh) | 2018-01-21 |
EP3412793A4 (en) | 2019-09-18 |
WO2017135296A1 (ja) | 2017-08-10 |
TW201728555A (zh) | 2017-08-16 |
CN108603276A (zh) | 2018-09-28 |
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