JPWO2017022330A1 - パージ装置、パージストッカ、及びパージガスの供給方法 - Google Patents
パージ装置、パージストッカ、及びパージガスの供給方法 Download PDFInfo
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- JPWO2017022330A1 JPWO2017022330A1 JP2017532414A JP2017532414A JPWO2017022330A1 JP WO2017022330 A1 JPWO2017022330 A1 JP WO2017022330A1 JP 2017532414 A JP2017532414 A JP 2017532414A JP 2017532414 A JP2017532414 A JP 2017532414A JP WO2017022330 A1 JPWO2017022330 A1 JP WO2017022330A1
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- purge
- container
- placement
- purge gas
- flow rate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
- B08B5/023—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0821—Handling or manipulating containers, e.g. moving or rotating containers in cleaning devices, conveying to or from cleaning devices
- B08B9/0826—Handling or manipulating containers, e.g. moving or rotating containers in cleaning devices, conveying to or from cleaning devices the containers being brought to the cleaning device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/283—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking by gas jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
- B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
- B08B9/34—Arrangements of conduits or nozzles
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K21/00—Fluid-delivery valves, e.g. self-closing valves
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Warehouses Or Storage Devices (AREA)
Abstract
Description
Claims (8)
- 容器が載置されるグループ化された複数の載置部と、
前記載置部に前記容器が載置されることにより前記容器にパージガスを供給する流路が開くように形成されたノズルと、
前記グループ内の前記容器の個数に基づいて前記グループ内に供給する前記パージガスの流量を調整する流量制御装置と、を備えるパージ装置。 - 前記載置部のそれぞれは、前記容器が載置されているか否かを検出する検出部を有する、請求項1記載のパージ装置。
- 前記ノズルは、前記載置部に前記容器が載置されない状態において前記パージガスの圧力によって流路を閉塞する蓋部を有し、
前記蓋部は、前記載置部に前記容器が載置された場合に前記容器の重量によって前記流路を開放する、請求項1又は請求項2記載のパージ装置。 - 前記流量制御装置は、前記グループ内に新たな前記容器が載置された場合、前記パージガスの流量を一旦減少させてから徐々に所定流量まで増加させる、請求項1〜請求項3のいずれか1項に記載のパージ装置。
- 水平方向又は鉛直方向に並んだ前記複数の載置部を前記グループとする、請求項1〜請求項4のいずれか1項に記載のパージ装置。
- 請求項1〜請求項5のいずれか一項に記載のパージ装置を複数備える、パージストッカ。
- 前記パージ装置の前記複数の載置部に沿って走行可能であり、前記載置部に対して前記容器を移載する搬送装置を備え、
前記パージ装置の前記流量制御装置は、前記搬送装置の走行範囲の端部側にまとめて配置される、請求項6記載のパージストッカ。 - グループ化された複数の載置部に載置された容器に対してパージガスを供給する方法であって、
前記載置部に前記容器が載置されることにより前記容器にパージガスを供給する流路を開くことと、
前記グループ内の前記容器の個数に基づいて前記グループ内に供給する前記パージガスの流量を調整することと、を含むパージガスの供給方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015153757 | 2015-08-04 | ||
JP2015153757 | 2015-08-04 | ||
PCT/JP2016/067203 WO2017022330A1 (ja) | 2015-08-04 | 2016-06-09 | パージ装置、パージストッカ、及びパージガスの供給方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2017022330A1 true JPWO2017022330A1 (ja) | 2018-05-24 |
JP6468358B2 JP6468358B2 (ja) | 2019-02-13 |
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Application Number | Title | Priority Date | Filing Date |
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JP2017532414A Active JP6468358B2 (ja) | 2015-08-04 | 2016-06-09 | パージストッカ、及びパージストッカにおけるパージガスの供給方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US10766056B2 (ja) |
JP (1) | JP6468358B2 (ja) |
CN (1) | CN107851596A (ja) |
TW (1) | TWI693660B (ja) |
WO (1) | WO2017022330A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6623988B2 (ja) * | 2016-09-09 | 2019-12-25 | 株式会社ダイフク | 容器収納設備 |
JP6817757B2 (ja) * | 2016-09-16 | 2021-01-20 | 東京エレクトロン株式会社 | 基板処理装置及び基板移送方法 |
CN109983568B (zh) * | 2017-02-20 | 2023-02-28 | 村田机械株式会社 | 吹扫储料器 |
JP6794898B2 (ja) * | 2017-03-29 | 2020-12-02 | 株式会社ダイフク | 収納棚 |
EP3809454B1 (en) * | 2018-06-15 | 2023-05-03 | Murata Machinery, Ltd. | Storage shelf |
JP7090513B2 (ja) * | 2018-09-06 | 2022-06-24 | 東京エレクトロン株式会社 | 基板処理装置及びパージ方法 |
CN117402277B (zh) * | 2023-12-15 | 2024-04-09 | 万华化学集团股份有限公司 | 一种淤浆法生产超高分子量聚乙烯出料线防堵塞的工艺方法 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH11314703A (ja) * | 1998-04-30 | 1999-11-16 | Ebara Corp | 基板保管装置 |
JP2005340330A (ja) * | 2004-05-25 | 2005-12-08 | Matsushita Electric Ind Co Ltd | 半導体基板の保管容器および半導体基板の保管方法 |
JP2008159734A (ja) * | 2006-12-22 | 2008-07-10 | Asyst Technologies Japan Inc | コンテナの搬送システム及び測定用コンテナ |
JP2010182747A (ja) * | 2009-02-03 | 2010-08-19 | Dan Takuma:Kk | 保管システムおよび保管方法 |
JP2013131712A (ja) * | 2011-12-22 | 2013-07-04 | Daifuku Co Ltd | 不活性ガス注入装置 |
JP2013133193A (ja) * | 2011-12-26 | 2013-07-08 | Daifuku Co Ltd | 物品保管設備 |
JP2013142009A (ja) * | 2012-01-06 | 2013-07-22 | Daifuku Co Ltd | 物品保管設備 |
JP2015065259A (ja) * | 2013-09-25 | 2015-04-09 | 村田機械株式会社 | ガス供給装置、自動倉庫、及びガス供給方法 |
JP2015142104A (ja) * | 2014-01-30 | 2015-08-03 | 村田機械株式会社 | パージ装置、パージストッカ、及び容器 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2009022908A (ja) * | 2007-07-20 | 2009-02-05 | Chugoku Electric Power Co Inc:The | 汚水浄化システム |
JP5598729B2 (ja) | 2011-12-26 | 2014-10-01 | 株式会社ダイフク | 物品保管設備 |
JP5888288B2 (ja) * | 2013-06-26 | 2016-03-16 | 株式会社ダイフク | 物品保管設備の検査装置 |
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2016
- 2016-06-09 CN CN201680045256.1A patent/CN107851596A/zh active Pending
- 2016-06-09 JP JP2017532414A patent/JP6468358B2/ja active Active
- 2016-06-09 WO PCT/JP2016/067203 patent/WO2017022330A1/ja active Application Filing
- 2016-06-09 US US15/749,803 patent/US10766056B2/en active Active
- 2016-08-04 TW TW105124757A patent/TWI693660B/zh active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11314703A (ja) * | 1998-04-30 | 1999-11-16 | Ebara Corp | 基板保管装置 |
JP2005340330A (ja) * | 2004-05-25 | 2005-12-08 | Matsushita Electric Ind Co Ltd | 半導体基板の保管容器および半導体基板の保管方法 |
JP2008159734A (ja) * | 2006-12-22 | 2008-07-10 | Asyst Technologies Japan Inc | コンテナの搬送システム及び測定用コンテナ |
JP2010182747A (ja) * | 2009-02-03 | 2010-08-19 | Dan Takuma:Kk | 保管システムおよび保管方法 |
JP2013131712A (ja) * | 2011-12-22 | 2013-07-04 | Daifuku Co Ltd | 不活性ガス注入装置 |
JP2013133193A (ja) * | 2011-12-26 | 2013-07-08 | Daifuku Co Ltd | 物品保管設備 |
JP2013142009A (ja) * | 2012-01-06 | 2013-07-22 | Daifuku Co Ltd | 物品保管設備 |
JP2015065259A (ja) * | 2013-09-25 | 2015-04-09 | 村田機械株式会社 | ガス供給装置、自動倉庫、及びガス供給方法 |
JP2015142104A (ja) * | 2014-01-30 | 2015-08-03 | 村田機械株式会社 | パージ装置、パージストッカ、及び容器 |
Also Published As
Publication number | Publication date |
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TWI693660B (zh) | 2020-05-11 |
WO2017022330A1 (ja) | 2017-02-09 |
JP6468358B2 (ja) | 2019-02-13 |
CN107851596A (zh) | 2018-03-27 |
TW201714241A (zh) | 2017-04-16 |
US10766056B2 (en) | 2020-09-08 |
US20180229277A1 (en) | 2018-08-16 |
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