JPWO2017018393A1 - 銀反射鏡並びにその製造方法及び検査方法 - Google Patents
銀反射鏡並びにその製造方法及び検査方法 Download PDFInfo
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Abstract
Description
図面を参照して、本発明の一実施形態に係る銀反射鏡及びその製造方法等について説明する。
σ=(Es×D2)/[6d(1−v)R]
ただし、Esは、基板20のヤング率であり、vは、基板20のポアソン比である。
σ≒(Es×D2)/[6d(1−v)L/(2sinθ)]
と近似することができる。
σ≒(Es×D2)/[6d(1−v)L/(2sinΔθ)]
以下、本発明に係る銀反射鏡の具体的な実施例について説明する。
[表1]
上記表1において、「材料条件」欄は、反射膜を構成する膜材料を意味し、「Al2O3−A」〜「Al2O3−F」は、成膜条件が異なる酸化アルミニウム膜を意味する。「H4」は、Merck社製のLaTiO3(Substance H4)を意味し、「SiO2」は、酸化シリコン膜又はシリカ膜を意味し、「Ag」は、主銀層を意味する。「Method」欄において、「EB」は電子ビーム蒸着による成膜を意味し、「EB+IAD」は、イオンアシストタイプの電子ビーム蒸着を意味し、「RH」は、抵抗加熱による成膜を意味する。「O2−APC(Pa)」欄は、成膜中における酸素分圧の調整値を意味し、例えばAl2O3−Aの場合、酸素分圧が2.00×10−2Paに設定されたことが示されている。「rate(オングストローム/sec)」欄は、成膜速度を意味する。なお、表1には記載していないが、成膜開始時の真空度は2.0×10−3Paであり、成膜に際して基板の加熱は行わなかった。
[表2]
[表3]
表2及び表3において、層番号は、基板からの層の順番を意味する。なお、基板は、基本的にポリカーボネート(PC)製であるが、膜応力測定用の測定基板(テストピース)の場合、硝材D263製となる場合もある。
[表4]
表4において、「85℃DRY−1000H」は、雰囲気温度85℃で湿度略ゼロの高温乾燥環境に1000時間保持されたことを意味し、「110℃DRY−1000H」は、雰囲気温度110℃で湿度略ゼロの高温乾燥環境に1000時間保持されたことを意味し、「85度85%−1000H」は、雰囲気温度85℃で相対湿度85%RHの高温多湿環境に1000時間保持されたことを意味する。
[表6]
表5において、第1欄は、密着層を構成する第1層のAl2O3を基板上に単層で作製した場合について、膜応力(単位「MPa」)の環境変化を試験した結果を示す。まず、第1工程(「一週間」)では、テストピースを室温で一週間放置して膜状態を安定させた。次に、第2工程(「110℃24H」)では、テストピースを雰囲気温度110℃で湿度略ゼロの高温乾燥環境に24時間保持して反射膜を一旦乾燥させた。最後に、第3工程(「85℃85%24H」)では、テストピースを雰囲気温度85℃で湿度85%の高温高湿環境に24時間保持して反射膜に加湿を行った。「差分」欄は、「110℃24H」の処理後の膜応力から「85℃85%24H」の処理後の膜応力を引いた値である。この差分は、膜応力の変化量の符号を反転させたものとなっている。つまり、実施例1の場合、24時間の高温乾燥環境から24時間の高温高湿環境への切り替えによって、密着層第1層の膜応力が137MPaだけ減少し、膜応力の変化量は、負(圧縮応力)方向に相当するものとなっている。
Claims (16)
- 下地の密着層と、前記密着層上に形成される主銀層と、前記主銀層上に形成される増反射層とを反射膜として備える銀反射鏡であって、
前記主銀層は、銀及び銀を主とする合金のいずれかで形成され、
前記反射膜の成膜後の膜応力が、+100MPaから−100MPaまでの範囲にあり、
前記反射膜を110℃の高温乾燥環境に24時間投入した後の膜応力が、+100MPaから−100MPaまでの範囲にあり、
前記110℃の高温乾燥環境に投入後の前記反射膜を85℃85%RHの高温多湿環境に24時間投入した後の膜応力が、+100MPaから−100MPaまでの範囲にあり、かつ、
前記110℃の高温乾燥環境に24時間投入後の膜応力値と、前記85℃85%RHの高温多湿環境に24時間投入した後の膜応力値との間の変化量の絶対値が、40MPa以下である銀反射鏡。 - 前記密着層は、酸化アルミニウムを主とする層を少なくとも1層含み、当該酸化アルミニウムを主とする層は、イオンアシスト法を用いて成膜されており、当該酸化アルミニウムを主とする層の膜応力は、圧縮応力である、請求項1に記載の銀反射鏡。
- 前記密着層及び前記増反射層のいずれかは、少なくとも1層の調整層を含み、当該調整層は、単層の状態において、110℃の高温乾燥環境に24時間投入後の膜応力に対して、85℃85%RHの高温多湿環境に24時間投入した後の膜応力が、負方向に変化する、請求項1及び2のいずれか一項に記載の銀反射鏡。
- 前記密着層及び前記増反射層のいずれかは、少なくとも1層の調整層を含み、当該調整層は、単層の状態において、110℃の高温乾燥環境に24時間投入後の膜応力に対して、85℃85%RHの高温多湿環境に24時間投入した後の膜応力が、正方向に変化する、請求項1〜3のいずれか一項に記載の銀反射鏡。
- 前記銀を主とする合金の添加材料は、Bi、Pd、Cu、Au、Ge、Nd、及びAlのいずれかである、請求項1〜4のいずれか一項に記載の銀反射鏡。
- 前記密着層は、少なくとも2層以上を含み、前記密着層を構成する各層の材料は、酸化アルミニウムを主とする材料、LaTiO3、CeO2、Y2O3及びSnO2のうち少なくとも一種から選ばれる、請求項1〜5のいずれか一項に記載の銀反射鏡。
- 前記密着層のうち、前記主銀層と直接密着する層の材料が、LaTiO3、CeO2、Y2O3及びSnO2のうち少なくとも一種から選ばれる、請求項6に記載の銀反射鏡。
- 前記増反射層は、少なくとも3層以上を含み、前記増反射層のうち、前記主銀層と直接密着する層が、酸化アルミニウムを主とする材料で形成されている、請求項1〜7のいずれか一項に記載の銀反射鏡。
- 前記増反射層の膜応力が、−50MPaよりも負に大きい、請求項1〜8のいずれか一項に記載の銀反射鏡。
- 前記酸化アルミニウムを主とする層の屈折率が、1.55〜1.65である、請求項2に記載の銀反射鏡。
- 前記増反射層は、3層以上を含み、酸化アルミニウムを主とする材料で形成され前記主銀層と密着する層の上に、高屈折率材料の層と低屈折率材料の層とを交互に積層した構造を有し、前記高屈折率材料は、TiO2、Nb2O5、Ta2O5、LaTiO3、ZrO2、及びこれらの材料の混合材料のうち少なくとも一種から選ばれ、前記低屈折率材料は、SiO2及びSiO2に酸化アルミニウムを混ぜた混合材料のうち少なくとも一種から選ばれる、請求項1〜10のいずれか一項に記載の銀反射鏡。
- 下地の密着層と、前記密着層上に形成される主銀層と、前記主銀層上に形成される増反射層とを反射膜として備える銀反射鏡の検査方法であって、
前記主銀層は、銀及び銀を主とする合金のいずれかで形成され、
前記反射膜の成膜後の膜応力が、+100MPaから−100MPaまでの範囲にあるか否かを判定するとともに、
前記反射膜を110℃の高温乾燥環境に24時間投入した後の膜応力値と、前記反射膜を110℃の高温乾燥環境に24時間投入した後に前記反射膜を85℃85%RHの高温多湿環境に24時間投入した後の膜応力値との間の変化量の絶対値が、40MPa以下であるか否かを判定する銀反射鏡の検査方法。 - 前記反射膜を110℃の高温乾燥環境に24時間投入した後の膜応力が、+100MPaから−100MPaまでの範囲にあるか否かを判定し、
前記110℃の高温乾燥環境に投入後の前記反射膜を85℃85%RHの高温多湿環境に24時間投入した後の膜応力が、+100MPaから−100MPaまでの範囲にあるか否かを判定する、請求項12に記載の銀反射鏡の検査方法。 - 前記密着層がイオンアシスト法を用いて成膜された酸化アルミニウムを主とする層を含む場合に、当該酸化アルミニウムを主とする層の膜応力が圧縮応力であるか否かを判定する、請求項13に記載の銀反射鏡の検査方法。
- 下地の密着層と、前記密着層上に形成される主銀層と、前記主銀層上に形成される増反射層とを反射膜として備える銀反射鏡の製造方法であって、
前記主銀層は、銀及び銀を主とする合金のいずれかで形成され、
前記反射膜の成膜後の膜応力を、+100MPaから−100MPaまでの範囲にするとともに、
前記反射膜を110℃の高温乾燥環境に24時間投入した後の膜応力値と、前記反射膜を110℃の高温乾燥環境に24時間投入した後に前記反射膜を85℃85%RHの高温多湿環境に24時間投入した後の膜応力値との間の変化量の絶対値を、40MPa以下する銀反射鏡の製造方法。 - 前記銀反射鏡と同一の構造を有するテストピースを作製して、膜応力の計測を行う、請求項15に記載の銀反射鏡の製造方法。
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