JPWO2016181256A1 - 半導体装置、電子部品および電子機器 - Google Patents
半導体装置、電子部品および電子機器 Download PDFInfo
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- JPWO2016181256A1 JPWO2016181256A1 JP2017517443A JP2017517443A JPWO2016181256A1 JP WO2016181256 A1 JPWO2016181256 A1 JP WO2016181256A1 JP 2017517443 A JP2017517443 A JP 2017517443A JP 2017517443 A JP2017517443 A JP 2017517443A JP WO2016181256 A1 JPWO2016181256 A1 JP WO2016181256A1
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- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
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- G—PHYSICS
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- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
- G11C11/34—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
- G11C11/40—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
- G11C11/401—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
- G11C11/4063—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing
- G11C11/407—Auxiliary circuits, e.g. for addressing, decoding, driving, writing, sensing or timing for memory cells of the field-effect type
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
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- Dram (AREA)
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JP2015097023 | 2015-05-12 | ||
JP2015097023 | 2015-05-12 | ||
PCT/IB2016/052526 WO2016181256A1 (fr) | 2015-05-12 | 2016-05-04 | Dispositif à semi-conducteur, composant électronique et dispositif électronique |
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Families Citing this family (8)
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WO2017055967A1 (fr) | 2015-09-30 | 2017-04-06 | Semiconductor Energy Laboratory Co., Ltd. | Dispositif semi-conducteur et dispositif électronique |
US10622059B2 (en) | 2016-03-18 | 2020-04-14 | Semiconductor Energy Laboratory Co., Ltd. | Oxide semiconductor based memory device |
US10210915B2 (en) | 2016-06-10 | 2019-02-19 | Semiconductor Energy Laboratory Co., Ltd. | Memory device and semiconductor device including the same |
KR102421300B1 (ko) * | 2017-01-13 | 2022-07-15 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 기억 장치, 반도체 장치, 전자 부품, 및 전자 기기 |
CN117355134A (zh) * | 2017-01-27 | 2024-01-05 | 株式会社半导体能源研究所 | 电容器、半导体装置及半导体装置的制造方法 |
CN106952827A (zh) * | 2017-03-16 | 2017-07-14 | 深圳市华星光电技术有限公司 | 薄膜晶体管及其制造方法、显示面板 |
CN113454718A (zh) * | 2019-02-22 | 2021-09-28 | 株式会社半导体能源研究所 | 半导体装置以及具有该半导体装置的电器设备 |
WO2021009607A1 (fr) * | 2019-07-12 | 2021-01-21 | 株式会社半導体エネルギー研究所 | Dispositif de stockage, dispositif à semi-conducteur, et dispositif électronique |
Citations (5)
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US20010017798A1 (en) * | 2000-01-18 | 2001-08-30 | Tomoyuki Ishii | Semiconductor integrated circuit device and data processor device |
JP2004153700A (ja) * | 2002-10-31 | 2004-05-27 | Seiko Epson Corp | フィールド・プログラマブル・ゲート・アレイおよびその使用方法 |
US20120112257A1 (en) * | 2010-11-05 | 2012-05-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
US20120294102A1 (en) * | 2011-05-20 | 2012-11-22 | Semiconductor Energy Laboratory Co., Ltd. | Memory device and signal processing circuit |
US20130247057A1 (en) * | 2012-03-13 | 2013-09-19 | Rohm Co., Ltd. | Multi-task processing apparatus |
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US9076505B2 (en) * | 2011-12-09 | 2015-07-07 | Semiconductor Energy Laboratory Co., Ltd. | Memory device |
JP6105266B2 (ja) * | 2011-12-15 | 2017-03-29 | 株式会社半導体エネルギー研究所 | 記憶装置 |
TWI618058B (zh) * | 2013-05-16 | 2018-03-11 | 半導體能源研究所股份有限公司 | 半導體裝置 |
US20150294991A1 (en) * | 2014-04-10 | 2015-10-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic component, and electronic device |
TWI735206B (zh) * | 2014-04-10 | 2021-08-01 | 日商半導體能源研究所股份有限公司 | 記憶體裝置及半導體裝置 |
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2016
- 2016-05-04 JP JP2017517443A patent/JPWO2016181256A1/ja not_active Withdrawn
- 2016-05-04 WO PCT/IB2016/052526 patent/WO2016181256A1/fr active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010017798A1 (en) * | 2000-01-18 | 2001-08-30 | Tomoyuki Ishii | Semiconductor integrated circuit device and data processor device |
JP2001274355A (ja) * | 2000-01-18 | 2001-10-05 | Hitachi Ltd | 半導体記憶装置及びデータ処理装置 |
JP2004153700A (ja) * | 2002-10-31 | 2004-05-27 | Seiko Epson Corp | フィールド・プログラマブル・ゲート・アレイおよびその使用方法 |
US20120112257A1 (en) * | 2010-11-05 | 2012-05-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device |
JP2013008937A (ja) * | 2010-11-05 | 2013-01-10 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
US20120294102A1 (en) * | 2011-05-20 | 2012-11-22 | Semiconductor Energy Laboratory Co., Ltd. | Memory device and signal processing circuit |
JP2013008437A (ja) * | 2011-05-20 | 2013-01-10 | Semiconductor Energy Lab Co Ltd | 記憶装置及び信号処理回路 |
US20130247057A1 (en) * | 2012-03-13 | 2013-09-19 | Rohm Co., Ltd. | Multi-task processing apparatus |
JP2013190893A (ja) * | 2012-03-13 | 2013-09-26 | Rohm Co Ltd | マルチタスク処理装置 |
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