JPWO2011121738A1 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JPWO2011121738A1 JPWO2011121738A1 JP2012507963A JP2012507963A JPWO2011121738A1 JP WO2011121738 A1 JPWO2011121738 A1 JP WO2011121738A1 JP 2012507963 A JP2012507963 A JP 2012507963A JP 2012507963 A JP2012507963 A JP 2012507963A JP WO2011121738 A1 JPWO2011121738 A1 JP WO2011121738A1
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Abstract
Description
Claims (16)
- 半導体基板の主面に形成された酸素原子を含む絶縁膜からなる素子分離部と、
前記半導体基板の主面に形成され、前記素子分離部に隣接する活性領域と、
前記活性領域および前記素子分離部の上に形成され、LaとHfとを含む第1絶縁膜と、
前記素子分離部の上で前記第1絶縁膜と繋がり、前記第1絶縁膜よりもLaの含有量が少ないHfを含む第2絶縁膜と、
前記第1絶縁膜および前記第2絶縁膜の上に形成されたゲート電極と、
を有することを特徴とする半導体装置。 - 請求項1記載の半導体装置において、さらに、
前記ゲート電極の下の前記活性領域に形成されたチャネル領域と、
前記チャネル領域を挟んで、前記ゲート電極の両側の前記活性領域に形成されたソース領域およびドレイン領域と、
を有することを特徴とする半導体装置。 - 請求項1記載の半導体装置において、前記活性領域と前記第1絶縁膜との間には、酸化膜が形成されていることを特徴とする半導体装置。
- 半導体基板の主面に形成された酸素原子を含む絶縁膜からなる素子分離部と、
前記半導体基板の主面の第1領域に形成され、前記素子分離部に囲まれた第1導電型の第1活性領域と、
前記半導体基板の主面の前記第1領域とは異なる第2領域に形成され、前記素子分離部に囲まれた前記第1導電型とは異なる第2導電型の第2活性領域と、
前記第1活性領域の上に形成されたLaとHfとを含む第1絶縁膜と、
前記第2活性領域の上に形成された、前記第1絶縁膜よりもLaの含有量が少ないHfを含む第2絶縁膜と、
を有し、
前記第1活性領域と前記第2活性領域との間に前記素子分離部を挟み、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上で、前記第1絶縁膜と前記第2絶縁膜とが繋がり、
前記第1絶縁膜および前記第2絶縁膜の上に共有のゲート電極が形成された半導体装置であって、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上では、前記第1絶縁膜の長さが前記第2絶縁膜の長さよりも短いことを特徴とする半導体装置。 - 請求項4記載の半導体装置において、さらに、
前記ゲート電極の下の前記第1活性領域に形成された第1チャネル領域と、
前記第1チャネル領域を挟んで、前記ゲート電極の両側の前記第1活性領域に形成された前記第2導電型の第1ソース領域および第1ドレイン領域と、
前記ゲート電極の下の前記第2活性領域に形成された第2チャネル領域と、
前記第2チャネル領域を挟んで、前記ゲート電極の両側の前記第2活性領域に形成された前記第1導電型の第1ソース領域および第2ドレイン領域と、
を有することを特徴とする半導体装置。 - 請求項4記載の半導体装置において、前記第1活性領域と前記第1絶縁膜との間および前記第2活性領域と前記第2絶縁膜との間には、酸化膜が形成されていることを特徴とする半導体装置。
- 請求項4記載の半導体装置において、前記第2絶縁膜は、Alを含むことを特徴とする半導体装置。
- 請求項4記載の半導体装置において、前記第1絶縁膜および前記第2絶縁膜は、SiO2よりも比誘電率が高い絶縁膜であることを特徴とする半導体装置。
- 請求項4記載の半導体装置において、前記ゲート電極は、金属膜および多結晶Si膜を下から順に積層した導電体膜であることを特徴とする半導体装置。
- 半導体基板の主面に形成された酸素原子を含む絶縁膜からなる素子分離部と、
前記半導体基板の主面に形成され、前記素子分離部に隣接する活性領域と、
前記活性領域および前記素子分離部の上に形成され、LaとHfとを含む第1絶縁膜と、
前記素子分離部の上で前記第1絶縁膜と繋がり、前記第1絶縁膜よりもLaの含有量が少ないHfを含む第2絶縁膜と、
前記第1絶縁膜および前記第2絶縁膜の上に形成されたゲート電極と、
前記ゲート電極の両側の前記活性領域に形成されたソース領域およびドレイン領域と、
を有し、
前記ゲート電極のゲート幅は、0.4μm以下であることを特徴とする半導体装置。 - (a)半導体基板の主面の第1領域および第2領域を囲んで、酸素原子を含む絶縁膜からなる素子分離部を形成する工程と、
(b)前記第1領域に第1導電型の第1活性領域を形成する工程と、
(c)前記第2領域に前記第1導電型とは異なる第2導電型の第2活性領域を形成する工程と、
(d)前記第1活性領域および前記第2活性領域の表面に第1酸化膜を形成する工程と、
(e)前記第1酸化膜上にHfを含む第3絶縁膜を形成する工程と、
(f)前記第1領域の前記第3絶縁膜上にLaを含む第1キャップ膜を形成する工程と、
(g)前記第2領域の前記第3絶縁膜上にAlを含む第2キャップ膜を形成する工程と、
(h)熱処理を行い、前記第1キャップ膜に含まれるLaを前記第1領域の前記第3絶縁膜に拡散させて、LaとHfとを含む第1絶縁膜を形成し、前記第2キャップ膜に含まれるAlを前記第2領域の前記第3絶縁膜に拡散させて、AlとHfとを含む第2絶縁膜を形成する工程と、
(i)前記第1絶縁膜および前記第2絶縁膜の上に金属膜および多結晶Si膜を順次形成する工程と、
(j)エッチングにより、前記第1領域に、前記多結晶Si膜と前記金属膜とからなる第1ゲート電極および前記第1絶縁膜と前記第1酸化膜からなる第1ゲート絶縁膜を形成し、前記第2領域に、前記多結晶Si膜と前記金属膜とからなる第1ゲート電極および前記第2絶縁膜と前記第1酸化膜からなる第2ゲート絶縁膜を形成する工程と、
(k)前記第1領域の前記第1ゲート電極の両側の前記第1活性領域に、前記第2導電型の第1ソース領域および第1ドレイン領域を形成し、前記第2領域の前記第2ゲート電極の両側の前記第2活性領域に、前記第1導電型の第2ソース領域および第2ドレイン領域を形成する工程と、
を有する半導体装置の製造方法において、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上で、前記第1絶縁膜と前記第2絶縁膜とが繋がり、前記第1絶縁膜の長さが前記第2絶縁膜の長さよりも短いことを特徴とする半導体装置の製造方法。 - 請求項11記載の半導体装置の製造方法において、さらに、
前記(a)工程で、前記半導体基板の主面の第3領域および第4領域を囲んで前記素子分離部を形成する工程と、
前記(b)工程で、前記第3領域に前記第1導電型の第3活性領域を形成する工程と、
前記(c)工程で、前記第4領域に前記第2導電型の第4活性領域を形成する工程と、
前記(d)工程で、前記第3活性領域および前記第4活性領域の表面に前記第1酸化膜よりも厚い第2酸化膜を形成する工程と、
前記(e)工程で、前記第2酸化膜上に前記第3絶縁膜を形成する工程と、
前記(f)工程で、前記第3領域の前記第3絶縁膜上に前記第1キャップ膜を形成する工程と、
前記(g)工程で、前記第4領域の前記第3絶縁膜上に前記第2キャップ膜を形成する工程と、
前記(h)で、前記第1キャップ膜に含まれるLaを前記第3領域の前記第3絶縁膜に拡散させて、前記第1絶縁膜を形成し、前記第2キャップ膜に含まれるAlを前記第4領域の前記第3絶縁膜に拡散させて、前記第2絶縁膜を形成する工程と、
前記(i)工程で、前記第3領域および前記第4領域の前記第1絶縁膜および前記第2絶縁膜の上に前記金属膜および前記多結晶Si膜を順次形成する工程と、
前記(j)工程で、エッチングにより、前記第3領域に、前記多結晶Si膜と前記金属膜とからなる第3ゲート電極および前記第1絶縁膜と前記第2酸化膜からなる第3ゲート絶縁膜を形成し、前記第4領域に、前記多結晶Si膜と前記金属膜とからなる第4ゲート電極および前記第2絶縁膜と前記第2酸化膜からなる第4ゲート絶縁膜を形成する工程と、
前記(k)工程で、前記第3領域の前記第3ゲート電極の両側の前記第3活性領域に、前記第2導電型の第3ソース領域および第3ドレイン領域を形成し、前記第4領域の前記第4ゲート電極の両側の前記第4活性領域に、前記第1導電型の第4ソース領域および第4ドレイン領域を形成する工程と、
を有し、
前記第3活性領域と前記第4活性領域との間に挟まれた前記素子分離部の上で、前記第1絶縁膜と前記第2絶縁膜とが繋がり、前記第1絶縁膜の長さが前記第2絶縁膜の長さよりも短いことを特徴とする半導体装置の製造方法。 - (a)半導体基板の主面の第1領域および第2領域を囲んで、酸素原子を含む絶縁膜からなる素子分離部を形成する工程と、
(b)前記第1領域に第1導電型の第1活性領域を形成する工程と、
(c)前記第2領域に前記第1導電型とは異なる第2導電型の第2活性領域を形成する工程と、
(d)前記第1活性領域および前記第2活性領域の表面に酸化膜を形成する工程と、
(e)前記第1領域に、Hfを含む第3絶縁膜、Laを含む第1キャップ膜、第1金属膜、および第1多結晶Si膜からなる積層膜を形成し、
前記第2領域に、前記第3絶縁膜および第2多結晶Si膜からなる積層膜を形成する工程と、
(f)エッチングにより、前記第1領域に、前記第1多結晶Si膜と前記第1金属膜とからなるダミー第1ゲート電極および前記第3絶縁膜と前記酸化膜とからなる第1ゲート絶縁膜を形成し、前記第2領域に、前記第2多結晶Siからなる第2ゲート電極および前記第3絶縁膜および前記酸化膜とからなるダミー第2ゲート絶縁膜を形成する工程と、
(g)前記第1領域の前記ダミー第1ゲート電極の両側の前記第1活性領域に、前記第2導電型の第1ソース領域および第1ドレイン領域を形成し、前記第2領域の前記ダミー第2ゲート電極の両側の前記第2活性領域に、前記第1導電型の第2ソース領域および第2ドレイン領域を形成する工程と、
(h)前記半導体基板の主面上に、前記第1ダミーゲート電極および前記第2ダミーゲート電極を覆う層間絶縁膜を形成した後、前記第1ダミーゲート電極および前記第2ダミーゲート電極が露出するまで、前記層間絶縁膜を研磨する工程と、
(i)前記第1領域の前記第1多結晶Si膜を除去して、底面に前記第1金属膜が露出する第1凹部を形成し、前記第2領域の前記第2多結晶Si膜を除去して、底面に前記第3絶縁膜が露出する第2凹部を形成する工程と、
(j)前記第1凹部および前記第2凹部のそれぞれの内部に、第2金属膜を埋めみ、前記第1領域に、前記第1金属膜と前記第2金属膜とからなる第1ゲート電極を形成し、前記第2領域に、前記第2金属膜からなる第2ゲート電極を形成する工程と、
を有する半導体装置の製造方法において、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上で、前記第1絶縁膜と前記第2絶縁膜とが繋がり、前記第1絶縁膜の長さが前記第2絶縁膜の長さよりも短いことを特徴とする半導体装置の製造方法。 - 請求項13記載の半導体装置の製造方法において、さらに、
前記(a)工程で、前記半導体基板の主面の第3領域および第4領域を囲んで、前記素子分離部を形成する工程と、
前記(b)工程で、前記第3領域に前記第1導電型の第3活性領域を形成する工程と、
前記(c)工程で、前記第4領域に前記第2導電型の第4活性領域を形成する工程と、
前記(d)工程で、前記第3活性領域および前記第4活性領域の表面に前記酸化膜を形成する工程と、
前記(e)工程で、前記第3領域および前記第4領域に、前記第3絶縁膜および前記第2多結晶Si膜からなる積層膜を形成する工程と、
前記(f)工程で、エッチングにより、前記第3領域に、前記第2多結晶Si膜からなる第3ゲート電極および前記第3絶縁膜と前記酸化膜とからなる第3ゲート絶縁膜を形成し、前記第4領域に、前記第2多結晶Siからなる第4ゲート電極および前記第3絶縁膜と前記酸化膜とからなる第4ゲート絶縁膜を形成する工程と、
前記(g)工程で、前記第3領域の前記第3ゲート電極の両側の前記第3活性領域に、前記第2導電型の第3ソース領域および第3ドレイン領域を形成し、前記第4領域の前記第4ゲート電極の両側の前記第4活性領域に、前記第1導電型の第4ソース領域および第4ドレイン領域を形成する工程と、
を有することを特徴とする半導体装置の製造方法。 - 半導体基板の主面に、駆動用電界効果トランジスタおよび負荷用電界効果トランジスタからなる一対のCMOSインバータで構成されたフリップフロップ回路と、前記フリップフロップ回路の一対の入出力端子に接続された一対の転送用電界効果トランジスタとでメモリセルを構成したSRAMを有し、
前記駆動用電界効果トランジスタおよび前記転送用電界効果トランジスタは、前記半導体基板の主面に形成された酸素原子を含む絶縁膜からなる素子分離部に囲まれた第1導電型の第1活性領域に形成され、
前記負荷用電界効果トランジスタは、前記素子分離部に囲まれた第2導電型の第2活性領域に形成され、
前記駆動用電界効果トランジスタおよび前記負荷用電界効果トランジスタは、同じ導電体膜からなる共有のゲート電極を有する半導体装置であって、
前記第1活性領域の上にLaとHfとを含む第1絶縁膜が形成され、
前記第2活性領域の上に、前記第1絶縁膜よりもLaの含有量が少ないHfを含む第2絶縁膜が形成され、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上で、前記第1絶縁膜と前記第2絶縁膜とが繋がり、
前記第1活性領域と前記第2活性領域との間に挟まれた前記素子分離部の上では、前記第1絶縁膜の長さが前記第2絶縁膜の長さよりも短いことを特徴とする半導体装置。 - 半導体基板の主面に、駆動用電界効果トランジスタおよび負荷用電界効果トランジスタからなる一対のCMOSインバータで構成されたフリップフロップ回路と、前記フリップフロップ回路の一対の入出力端子に接続された一対の転送用電界効果トランジスタとでメモリセルを構成したSRAMを有し、
前記駆動用電界効果トランジスタおよび前記転送用電界効果トランジスタは、前記半導体基板の主面に形成された酸素原子を含む絶縁膜からなる素子分離部に囲まれた第1導電型の第1活性領域に形成され、
前記負荷用電界効果トランジスタは、前記素子分離部に囲まれた第2導電型の第2活性領域に形成され、
隣接する2つのメモリセルにそれぞれ形成された転送用電界効果トランジスタが、同じ導電体膜からなる共有のゲート電極を有する半導体装置であって、
前記第1活性領域の上にLaとHfとを含む第1絶縁膜が形成され、
前記第2活性領域の上に、前記第1絶縁膜よりもLaの含有量が少ないHfを含む第2絶縁膜が形成され、
一方のメモリセルの前記転送用電界効果トランジスタが形成された一方の前記第1活性領域と他方のメモリセルの前記転送用電界効果トランジスタが形成された他方の前記第1活性領域との間に挟まれた前記素子分離部の上に、第2絶縁膜が形成され、
前記素子分離部の上に形成された前記第2絶縁膜を介して、前記一方の前記第1活性領域に形成された前記第1絶縁膜と、前記他方の前記第1活性領域に形成された前記第1絶縁膜とが繋がっていることを特徴とする半導体装置。
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