JPWO2011033550A1 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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Abstract
Description
本発明に係る半導体装置が具備する主要な部分及び領域は、第1の実施形態においては、次のようになる。すなわち、本実施形態の半導体装置は、素材としてSiCを使用して形成したMOSFETとショットキーバリアダイオードからなる単位セルとして、これら複数の単位セルからなる半導体装置である。さらに第1の導電型の半導体基板とはn型SiC基板であり、前記の半導体基板よりもより低濃度の第1の導電型の半導体堆積層とはSiCからなりn型不純物を含むn型ドリフト層である。また、第2の導電型のウェル領域とはp型ウェル領域である。またトレンチ型ソース電極の側面と接する第1導電型の第1ソース領域とは、n型不純物濃度が高いn+ソース領域であり、第2の導電型の第2ソース領域とはさらにp型不純物濃度をさらに高濃度にドーピングしてp型となっているp+ソース領域をいうものとする。また、JFET領域とは、p型ウェルの間又はp型ウェルの内側にあるn型不純物を含むn型ドリフト層の一部である。JFET領域は、ゲート電圧印加によりp型ウェル領域表面に形成されるチャネル領域に隣接する領域を指し、n+ソース領域からチャネルを通ってこのJFET領域、n型ドリフト層、n型SiC基板、さらにドレイン電極へと流れる電子の導電パスの一部を構成する領域をいう。
実施形態2では、p型ウェルの内部にショットキー界面9を有するSBDの逆方向の耐圧をさらに上昇させるため、トレンチ型ソース電極3に接触してショットキー接合9を形成するn型ドリフト層の表面に予めp型不純物をドーピングしてp型層をショットキー界面9とn型ドリフト層8の間に設けたものである。具体的には、n型ドリフト層8のn型不純物濃度を5×1015/cm3 とした時、ショットキー界面9直下のp型層16の厚さを200nm程度、p型不純物濃度を1×1016/cm程度とすることにより、熱平衡状態においてp型層16の全領域を空乏化することができる。図8(a)は、トレンチ型ソース電極3に接触してショットキー接合9を形成するn型ドリフト層6の表面に予めp型不純物をドーピングして薄いp型層をショットキー接合界面9とn型ドリフト層8との間に設けた本発明の本実施形態に係る半導体装置のショットキー接合界面の断面の一部分を示す図である。図8(b)は、図8(a)に示したダイオードの熱平衡状態におけるエネルギーバンド構造を示すバンドダイヤグラムである。図8(b)に示すように、熱平衡状態のとき、フェルミレベルは一定であるから、n型ドリフト層8とp型層16とのPN接合界面17付近にはポテンシャルの勾配がある領域(遷移領域)が形成され、この遷移領域においてn型ドリフト層8およびp型層16には、キャリアが存在しない空乏層が形成される。すなわち、PN接合界面17付近のポテンシャルの勾配と、ショットキー接合界面9付近のポテンシャルの勾配により、p型層16を中心とした領域に、n型ドリフト層8の電子から見たポテンシャルの障壁(ポテンシャルバリア)が形成される。電子から見たポテンシャルバリアの高さ(VBH)22は、n型ドリフト層8とp型層16間のビルトイン・ポテンシャルよりも低く抑えることができる。なお、n型ドリフト層8とp型層16間のビルトイン・ポテンシャルとは、n型ドリフト層8とp型層16とのPN接合を形成し、p型層16とショットキー金属電極3とのショットキー接合を形成しない場合におけるn型ドリフト層8とp型層16間のポテンシャルの差を示す。これは、ショットキー接合9によるp型層16のポテンシャル勾配により、ポテンシャル障壁の高さ(VBH)22が、n型ドリフト層8とp型層16間のビルトイン・ポテンシャルよりも低く押さえ込まれた為である。また、p型層16のp型不純物濃度と厚さを制御することにより、ポテンシャル障壁の高さ(VBH)22を、ショットキー接合界面9のバリアハイト(φBn)からPN接合のビルトイン・ポテンシャルの間で自由に設定できる。
図9は、第3の実施形態に係る半導体装置のSBD内蔵のMOSFETの平面図である。p型ウェル領域10を最密充填が可能な六角形とし、その内側にp型ウェル領域10と相似形のn+ソース領域6とp+ソース領域7が形成され、p+ソース領域7はトレンチ型ソース電極3から面内方向に放射状に形成されている。本実施形態では、トレンチ型ソース電極3はp型ウェル10内の中心部にやはり六角形に形成されている。ここでゲート電極1は図中の四角形の枠内の位置にゲート絶縁膜を介して形成される。ゲート絶縁膜は図示されていない。なおチャネル領域12及びJFET領域13はゲート電極1の下にあり、ゲート電極1に閾値以上の電圧を印加したとき、n+ソース6から流れ出た電子は、チャネル領域12を通り、JFET領域13に至って、紙面に垂直に下方へ移動し、図示しないドレイン電極へ達する。本実施形態の形状的特徴からトレンチ型ソース電極3の位置が多少ずれても、MOSFET及びSBDの特性に大きく影響を及ぼすことが無いことが予想できるため、よりロバストな設計が可能となる。
2・・・ ゲート絶縁膜
3・・・ トレンチ型ソース電極
4・・・ ドレイン電極
5・・・ n型SiC基板
6・・・ n+ソース領域
7・・・ p+ソース領域
8・・・ n型ドリフト層
9・・・ ショットキー接合部(ショットキー接合界面)
10・・・ p型ウェル
11・・・ トレンチ(溝)
12・・・ チャネル領域
13・・・ JFET領域
14・・・ トレンチ(溝)の底部
15・・・ ショットキーバリアダイオード
16・・・ p型層
17・・・ PN接合界面
18・・・ 第1空乏層
19・・・ 第2空乏層
20・・・ フェルミレベル
21・・・ ショットキーバリアハイトφBN
22・・・ ポテンシャルバリアVBH
23・・・ 単位セル
31・・・ ショットキー金属層
Claims (8)
- 第1の導電型の半導体基板と、
前記半導体基板上に形成され、前記半導体基板より低濃度の第1の導電型の半導体堆積層と、
前記半導体堆積層の主面に略垂直に互いに離間して形成され、その底部が前記半導体堆積層となるように形成された複数のトレンチ(溝)と、
前記トレンチ周辺の前記半導体堆積層の表面から深さ方向にそれぞれ形成され、前記トレンチの底部に前記半導体堆積層を残して前記トレンチを取り囲む第2の導電型のウェル領域と、
前記複数のウェル領域を隔てる領域であって、前記半導体堆積層からなるJFET領域と、
前記ウェル領域内にそれぞれ形成され、前記トレンチの側面と接する複数の第1導電型の第1ソース領域と、
前記第1ソース領域内にそれぞれ形成され、前記トレンチの側面と接し、かつ互いに離間して形成され、前記ウェル領域に達する複数の第2の導電型の第2ソース領域と、
前記トレンチ内にそれぞれ形成され、前記第1ソース領域及び前記第2ソース領域と接し、かつ前記半導体堆積層と接し、かつ前記半導体堆積層とショットキー接合を形成するトレンチ型ソース電極と、
互いに隣接する前記ウェル領域の表面及び前記JFET領域に跨って形成されたゲート絶縁膜と、
前記ゲート絶縁膜上に設けられたゲート電極と、前記半導体基板の裏面に設けたドレイン電極と
を具備する半導体装置。
- 前記ソース電極と前記第1の導電型の半導体堆積層のショットキー接合において、前記ソース電極と前記第1の導電型の半導体堆積層の間に第2の導電型の不純物を含有する領域を有することを特徴とする請求項1記載の半導体装置。
- 前記半導体を構成する材料がSiCからなることを特徴とする請求項1記載の半導体装置。
- 前記トレンチ型ソース電極において、
前記第1の導電型の半導体堆積層と接続する前記トレンチ型ソース電極の部分と、
前記第1ソース領域及び前記第2ソース領域と接続する前記トレンチ型ソース電極の部分と、
がそれぞれ異なる材料で構成されていることを特徴とする請求項1記載の半導体装置。
- 互いに隣接する前記第2の導電型のウェル領域の間にある前記JFET領域に対して前記第2の導電型のウェル領域の底部より下方まで第2のトレンチを形成し、前記互いに隣接する前記第2の導電型のウェル領域表面と前記第2のトレンチ表面からなる表面領域にゲート絶縁膜を形成し、さらに前記ゲート絶縁膜上にゲート電極を形成することによって、前記ゲート電極に電圧を印加することにより、前記第2のトレンチに接する第2の導電型のウェル領域に前記電圧により第1導電型に反転する反転領域(チャネル領域)を形成することを可能とし、前記第1導電型のソース領域から前記反転領域(チャネル領域)を通して、電子を流すことを特徴とする請求項1記載の半導体装置。
- 前記第2ソース領域の底部が前記トレンチ型ソース電極の底部よりも下方に位置していることを特徴とする請求項1記載の半導体装置。
- 前記トレンチ型ソース電極が前記第2の導電型のウェル領域を横断していることを特徴とする請求項1に記載の半導体装置。
- 前記トレンチ型ソース電極が前記第2の導電型のウェル領域の内側に位置していることを特徴とする請求項1に記載の半導体装置。
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JP5997426B2 (ja) | 2011-08-19 | 2016-09-28 | 株式会社日立製作所 | 半導体装置および半導体装置の製造方法 |
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JP6229541B2 (ja) * | 2014-02-27 | 2017-11-15 | 住友電気工業株式会社 | ワイドバンドギャップ半導体装置およびその製造方法 |
US10483389B2 (en) * | 2014-07-02 | 2019-11-19 | Hestia Power Inc. | Silicon carbide semiconductor device |
TWI528565B (zh) * | 2014-07-02 | 2016-04-01 | Hestia Power Inc | Silicon carbide semiconductor components |
US10418476B2 (en) | 2014-07-02 | 2019-09-17 | Hestia Power Inc. | Silicon carbide semiconductor device |
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JP6523887B2 (ja) | 2015-09-11 | 2019-06-05 | 株式会社東芝 | 半導体装置 |
US9780088B1 (en) | 2016-03-31 | 2017-10-03 | International Business Machines Corporation | Co-fabrication of vertical diodes and fin field effect transistors on the same substrate |
JP6649183B2 (ja) | 2016-05-30 | 2020-02-19 | 株式会社東芝 | 半導体装置 |
DE112018000517T5 (de) | 2017-01-25 | 2019-10-10 | Rohm Co., Ltd. | Halbleitervorrichtung |
JP6730237B2 (ja) | 2017-09-19 | 2020-07-29 | 株式会社東芝 | 半導体装置 |
JP6972382B2 (ja) | 2018-11-30 | 2021-11-24 | 三菱電機株式会社 | 半導体装置 |
JP7214508B2 (ja) | 2019-03-01 | 2023-01-30 | 株式会社東芝 | 半導体装置 |
CN111341850A (zh) * | 2020-03-16 | 2020-06-26 | 电子科技大学 | 一种GaN纵向逆导结场效应管 |
CN116072732A (zh) * | 2021-02-25 | 2023-05-05 | 湖南三安半导体有限责任公司 | 集成肖特基二极管的碳化硅mosfet器件 |
CN114784109B (zh) * | 2022-04-21 | 2023-04-25 | 电子科技大学 | 一种平面栅SiC MOSFET及其制作方法 |
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US20120223339A1 (en) | 2012-09-06 |
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