JPWO2010021264A1 - 微細流路チップ製造方法及び微細流路チップ - Google Patents
微細流路チップ製造方法及び微細流路チップ Download PDFInfo
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- JPWO2010021264A1 JPWO2010021264A1 JP2010525663A JP2010525663A JPWO2010021264A1 JP WO2010021264 A1 JPWO2010021264 A1 JP WO2010021264A1 JP 2010525663 A JP2010525663 A JP 2010525663A JP 2010525663 A JP2010525663 A JP 2010525663A JP WO2010021264 A1 JPWO2010021264 A1 JP WO2010021264A1
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- resin film
- deflection
- resin
- film
- temperature
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Abstract
そのための微細流路チップの製造方法は、流路用溝011が形成された樹脂製基板010の、流路用溝011が形成された面に樹脂製フィルム020を接合する微細流路チップ製造方法であって、樹脂製基板010の荷重たわみ温度Ts(℃)と樹脂製フィルム020の荷重たわみ温度Tf(℃)とはTs>Tfを満たし、接合温度をT(℃)とした場合に、樹脂製基板010と樹脂製フィルム020とを、Tf−5(℃)<T<Tf+5(℃)の接合温度で、且つ、10kgf/cm2〜60kgf/cm2の範囲のプレス圧で圧着するプレス段階、を有する。
Description
以下、この発明の第1の実施形態に係る微細流路チップの製造方法について説明する。図1はこの発明の実施形態に係る微細流路チップの製造方法で使用される樹脂製基板を説明するための図である。図2は、微細流路チップの断面図である。
(接着性の測定方法)
次に接着性の測定方法について説明する。接着性の測定にはオリンパス社製・蛍光観察顕微鏡装置BX51を用いて樹脂製フィルム020の浮きの状態を調べた。図3における接着性の評価としては、×:フィルムの浮き等の接着不良が発生、△:フィルムの浮き等の接着不良は発生するが×よりは改善されている、○:ほとんど浮き等は発生せず実害性はない、◎:フィルムの浮きは全くなし、という4つの基準で評価を行っている。
(外観の測定方法)
次に外観の測定方法について説明する。外観とは基板の変形など微細流路チップにおける全体的な歪みの有無を指す。外観の測定には、オリンパス社製の顕微鏡で樹脂製基板010の変形を調べた。図3における外観の評価としては、×:基板の変形が発生、△:基板のエッジ部分などが変形、○:ほとんど変形なし、◎:全く変形なし、という4つの基準で評価を行っている。
次に樹脂製フィルム020の撓み測定方法について説明する。樹脂製フィルム020の測定には、Veeco社製 白色干渉計Wyko3300を用いて、VSIモードで樹脂製フィルム020の撓みを測定した。樹脂製フィルム020の撓みは、図2に示すように、接合面から流路底辺方向への撓み量tの流路深さdに対する割合としてt/dで表現する。樹脂製フィルム020の撓みの測定は微細流路011又は貫通孔012上から任意に10箇所を抽出して測定し、各箇所の撓み(t/d)を算出しそれらの平均を樹脂製フィルム020の撓み量とし、それらの標準偏差を樹脂製フィルム020の撓みのばらつきとした。図4は樹脂製フィルム020の撓みの測定を説明するための図である。
実施例1では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度はTs>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは10kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。
実施例2では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度はTs>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは20kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。
実施例3では、樹脂製基板010の荷重たわみ温度Tsが100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度はTs>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは60kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。
比較例1では、樹脂製基板010の荷重たわみ温度Ts(℃)が80℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度Ts=Tfであり、Ts>Tfを満たさない構成である。また、接合温度T(℃)は80℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは1kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例1は、荷重たわみ温度の関係及びプレス圧Pが本発明の構成要件を満たさない場合である。
比較例2では、樹脂製基板010の荷重たわみ温度Ts(℃)が80℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度Ts=Tfであり、Ts>Tfを満たさない構成である。また、接合温度T(℃)は75℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たさない構成である。さらに、プレス圧Pは1kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例2は、荷重たわみ温度の関係、接合温度T、及びプレス圧Pが本発明の構成要件を満たさない場合である。
比較例3では、樹脂製基板010の荷重たわみ温度Ts(℃)が80℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度Ts=Tfであり、Ts>Tfを満たさない構成である。また、接合温度T(℃)は75℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たさない構成である。さらに、プレス圧Pは10kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は60秒である。すなわち、比較例3は、荷重たわみ温度の関係、及び接合温度Tが本発明の構成要件を満たさない場合である。
比較例4では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は104℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たさない構成である。さらに、プレス圧Pは1kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例4は、接合温度T、及びプレス圧Pが本発明の構成要件を満たさない場合である。
比較例5では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は90℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たさない構成である。さらに、プレス圧Pは1kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例5は、接合温度T、及びプレス圧Pが本発明の構成要件を満たさない場合である。
比較例6では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは1kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例6は、プレス圧Pのみが本発明の構成要件を満たさない場合である。
比較例7では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは5kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は60秒である。すなわち、比較例7は、プレス圧Pのみが本発明の構成要件を満たさない場合である。
比較例8では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は75℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)という条件の下限を下回っており、該条件を満たさない構成である。さらに、プレス圧Pは20kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。すなわち、比較例8は、接合温度Tが本発明の接合温度Tの条件の下限を下回っており、本発明の構成要件を満たさない場合である。
比較例9では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度T(℃)は90℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)という条件の上限を上回っており、該条件を満たさない構成である。さらに、プレス圧Pは20kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。すなわち、比較例9は、接合温度Tが本発明の接合温度Tの条件の上限を上回っており、本発明の構成要件を満たさない場合である。
比較例10では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たす。また、接合温度Tは82℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは80kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たさない構成である。そして、接合時間は30秒である。すなわち、比較例10は、プレス圧Pのみが本発明の構成要件を満たさない場合である。
比較例11では、樹脂製基板010の荷重たわみ温度Ts(℃)が80℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度は、Ts>Tfを満たさない構成である。また、接合温度Tは80℃である。この温度は、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、プレス圧Pは10kgf/cm2であり、10kgf/cm2≦P≦60kgf/cm2を満たす。そして、接合時間は30秒である。すなわち、比較例11は、荷重たわみ温度の関係のみが本発明の構成要件を満たさない場合である。
〔第2の実施形態〕
次に、この発明の第2の実施形態に係る微細流路チップの製造方法について説明する。本実施形態に係る微細流路チップの製造方法は、段階的にプレス圧を変更することが第1の実施形態と異なるものである。そこで、以下では、プレス圧について主に説明する。
実施例4では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度はTs>Tfを満たす。また、接合温度Tは82℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、1段階目のプレス圧Pは40kgf/cm2であり、30kgf/cm2<P≦60kgf/cm2を満たす。そして、接合時間は2秒である。また、2段階目のプレス圧Pは10kgf/cm2であり、10kgf/cm2≦P≦30kgf/cm2を満たす。そして、接合時間は28秒である。すなわち、1段階目のプレス時間のほうが2段階目のプレス時間よりも短い。
実施例5では、樹脂製基板010の荷重たわみ温度Ts(℃)が100℃、樹脂製フィルム020の荷重たわみ温度Tf(℃)が80℃、である。この荷重たわみ温度はTs>Tfを満たす。また、接合温度T(℃)は82℃である。この温度は、T=Tf+2であり、Tf−5(℃)<T<Tf+5(℃)を満たす。さらに、1段階目のプレス圧Pは60kgf/cm2であり、30kgf/cm2<P≦60kgf/cm2を満たす。そして、接合時間は2秒である。また、2段階目のプレス圧Pは10kgf/cm2であり、10kgf/cm2≦P≦30kgf/cm2を満たす。そして、接合時間は28秒である。すなわち、1段階目のプレス時間のほうが2段階目のプレス時間よりも短い。
次に、この発明の第3の実施形態に係る微細流路チップの製造方法について説明する。本実施形態に係る微細流路チップの製造方法は、第1実施形態又は第2実施形態の後に熱アニール(「アニール処理」ともいう。)を行う段階を有する構成である。ここで、アニール処理とは、一定温度で一定時間熱処理又は湿熱処理を行うことを指す。以下では、1例として第1実施形態の接合(1段階のみのプレス)の後に熱アニールを行う場合について説明する。
実施例6は、図3における実施例1で製造された微細流路チップに対し熱アニールを行ったものである。そのため、樹脂製基板010の荷重たわみ温度、樹脂製フィルム020の荷重たわみ温度、接合温度T、プレス圧P、接合時間は、実施例1と同様である。
実施例7は、図3における実施例2で製造された微細流路チップに対し熱アニールを行ったものである。そのため、樹脂製基板010の荷重たわみ温度、樹脂製フィルム020の荷重たわみ温度、接合温度T、プレス圧P、接合時間は、実施例2と同様である。
実施例8は、図3における実施例3で製造された微細流路チップに対し熱アニールを行ったものである。そのため、樹脂製基板010の荷重たわみ温度、樹脂製フィルム020の荷重たわみ温度、接合温度T、プレス圧P、接合時間は、実施例3と同様である。
比較例12は、図3における比較例5で製造された微細流路チップに対し熱アニールを行ったものである。そのため、樹脂製基板010の荷重たわみ温度、樹脂製フィルム020の荷重たわみ温度、接合温度T、プレス圧P、接合時間は、比較例5と同様である。ここで、比較例5に対し熱アニールを行った理由は、樹脂製フィルム020の撓みや撓みのばらつきに問題がありその他の結果には問題がない微細流路チップに対し熱アニールを行って樹脂製フィルム020の撓みや撓みのばらつきを軽減することで、本実施形態に対応する実施例と変わらない評価になるか否かを判断するためである。
011 微細流路
012 貫通孔
020 樹脂製フィルム
Claims (6)
- 流路用溝が形成された樹脂製基板の、前記流路用溝が形成された面に樹脂製フィルムを接合する微細流路チップ製造方法であって、
前記樹脂製基板の荷重たわみ温度Ts(℃)と前記樹脂製フィルムの荷重たわみ温度Tf(℃)とはTs>Tfを満たし、
接合温度をT(℃)とした場合に、前記樹脂製基板と前記樹脂製フィルムとを、Tf−5(℃)<T<Tf+5(℃)の接合温度で、且つ、10kgf/cm2〜60kgf/cm2の範囲のプレス圧で圧着するプレス段階、
を有することを特徴とする微細流路チップ製造方法。 - 前記プレス段階が、
前記樹脂製基板と前記樹脂製フィルムとを、10kgf/cm2を超え60kgf/cm2以下の範囲の特定のプレス圧で圧着する第1プレス段階と、
前記第1プレス段階の後に、前記樹脂製基板と前記樹脂製フィルムとを、前記第1プレス段階の前記特定のプレス圧よりも小さいプレス圧で圧着する第2プレス段階と、
を有することを特徴とする請求項1に記載の微細流路チップ製造方法。 - 前記プレス段階が、
前記樹脂製基板と前記樹脂製フィルムとを、30kgf/cm2を超え60kgf/cm2以下の範囲の特定のプレス圧で圧着する第1プレス段階と、
前記第1プレス段階の後に、前記樹脂製基板と前記樹脂製フィルムとを、10kgf/cm2〜30kgf/cm2の範囲の特定のプレス圧で圧着する第2プレス段階と、
を有することを特徴とする請求項1に記載の微細流路チップ製造方法。 - 前記第1プレス段階において圧力をかける時間は前記第2プレス段階において圧力をかける時間よりも短いことを特徴とする請求項2又は請求項3に記載の微細流路チップ製造方法。
- 前記プレス段階後に、前記樹脂製基板と前記樹脂製フィルムとを熱アニールする段階をさらに有することを特徴とする請求項1乃至請求項4のいずれか一つに記載の微細流路チップ製造方法。
- 請求項1乃至請求項5のいずれか一つに記載の微細流路チップ製造方法により製造されたことを特徴とする微細流路チップ。
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