JPWO2008032543A1 - 薄膜圧電共振器とその製造方法 - Google Patents
薄膜圧電共振器とその製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 106
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- 238000010438 heat treatment Methods 0.000 claims abstract description 13
- 230000001590 oxidative effect Effects 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 42
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- 239000010703 silicon Substances 0.000 claims description 17
- 239000013078 crystal Substances 0.000 claims description 14
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 8
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 8
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 4
- 239000012212 insulator Substances 0.000 claims description 3
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- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
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- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
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- 238000000347 anisotropic wet etching Methods 0.000 description 1
- -1 as shown in FIG. 7B Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
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- 239000007772 electrode material Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
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- 238000003780 insertion Methods 0.000 description 1
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- 238000009413 insulation Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
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- 239000011733 molybdenum Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/173—Air-gaps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02149—Means for compensation or elimination of undesirable effects of ageing changes of characteristics, e.g. electro-acousto-migration
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/132—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials characterized by a particular shape
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/021—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the air-gap type
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
半導体基板と、該半導体基板の表面上に該半導体基板に接するように形成された絶縁層と、該絶縁層の上方に形成され、絶縁層側から順に下部電極と圧電層と上部電極とを有する圧電共振器スタックと、を有する薄膜圧電共振器において、前記絶縁層中の固定電荷密度が1×1011cm−2以下であることを特徴とする薄膜圧電共振器、
が提供される。
4 振動空間
6 絶縁層
8 半導体基板
8A シリコン単結晶基板
8B ノンドープ多結晶シリコン層
10 下部電極
10A 下部電極主体部
10B 下部電極接続端子部
12 上部電極
12A 上部電極主体部
12B 上部電極接続端子部
14 圧電共振器スタック
18 犠牲層エッチング用貫通孔
22 下部誘電体層
24 上部誘電体層
26 音響反射層
ΔV:理論的C−V曲線からのフラットバンド電圧のシフト量
Qf:固定電荷密度
Cins:絶縁層容量
振動領域の直径を200μmとした図1A及び図1Bの形態の薄膜圧電共振器を作製した。本実施例での各構成層の材質及び厚みは次のように設定した。絶縁層6をSiO2からなる厚み1μmのものとし、下部電極10をMoからなる厚み300nmのものとし、圧電層2をAlNからなる厚み1200nmのものとし、上部電極12をMoからなる厚み150nmの層とAlからなる厚み150nmの層との積層電極とした。また、本実施例で使用した半導体基板8としては、電気抵抗率が2000Ω・cmで結晶方位(100)の表面を持つn型Si基板を用いた。本実施例では、製造工程の最終段階で、N2/H2混合ガス雰囲気下、400℃の条件で熱処理を行った。図8Aに関して説明したように、下部電極10とSi基板8との間のC−V特性を測定し、固定電荷密度を求めたところ、3×1010cm−2であった。図9に作製した薄膜圧電共振器の周波数(Frequency)―インピーダンス(Z)の関係を示す。反共振周波数におけるインピーダンスが2700Ωで、Q値が980であり、良好な共振器特性を示している。
N2/H2混合ガス雰囲気下での熱処理を行わないこと以外は実施例1と同様にして薄膜圧電共振器を作製した。固定電荷密度を求めたところ、5×1011cm−2であった。図11に作製した薄膜圧電共振器の周波数―インピーダンスの関係を示す。反共振周波数におけるインピーダンスが1200Ωであり実施例1に比較して低下するとともに、Q値が600であり実施例1に比較して劣化している。
Claims (9)
- 半導体基板と、該半導体基板の表面上に該半導体基板に接するように形成された絶縁層と、該絶縁層の上方に形成され、絶縁層側から順に下部電極と圧電層と上部電極とを有する圧電共振器スタックと、を有する薄膜圧電共振器において、前記絶縁層中の固定電荷密度が1×1011cm−2以下であることを特徴とする薄膜圧電共振器。
- 前記絶縁層が二酸化ケイ素、窒化ケイ素、酸窒化ケイ素、窒化アルミニウム、酸窒化アルミニウム、酸化アルミニウム、酸化ジルコニウムおよび酸化タンタルからなる群から選ばれる少なくとも一種の材質を主成分とする絶縁体で形成されていることを特徴とする、請求項1に記載の薄膜圧電共振器。
- 前記絶縁層の厚さが0.01乃至3.0μmであることを特徴とする、請求項1記載の薄膜圧電共振器。
- 前記半導体基板が結晶方位(100)の表面を持つシリコン単結晶基板であることを特徴とする、請求項1記載の薄膜圧電共振器。
- 前記半導体基板がシリコン単結晶基板の表面上にノンドープ多結晶シリコン層を形成した基板であり、前記絶縁層が前記ノンドープ多結晶シリコン層上に形成されていることを特徴とする、請求項1記載の薄膜圧電共振器。
- 前記半導体基板の電気抵抗率が2000Ω・cm以上であることを特徴とする、請求項1記載の薄膜圧電共振器。
- 前記圧電共振器スタックが、前記上部電極の上、および/又は前記下部電極の下に、窒化アルミニウム、酸窒化アルミニウム、窒化ケイ素、およびサイアロンからなる群より選択される少なくとも一種の材質を主成分とする誘電体層を有することを特徴とする、請求項1記載の薄膜圧電共振器。
- 請求項1に記載の薄膜圧電共振器を製造する方法であって、半導体基板に接して絶縁層を形成した後、非酸化性ガス雰囲気下、300℃以上の熱処理をすることを特徴とする薄膜圧電共振器の製造方法。
- 請求項1に記載の薄膜圧電共振器を製造する方法であって、半導体基板に接して絶縁層を形成した後、紫外光照射処理をすることを特徴とする薄膜圧電共振器の製造方法。
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JP2008534281A JP4924993B2 (ja) | 2006-08-25 | 2007-08-24 | 薄膜圧電共振器とその製造方法 |
PCT/JP2007/066425 WO2008032543A1 (fr) | 2006-08-25 | 2007-08-24 | Résonateur piézoélectrique à couche mince et son procédé de fabrication |
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US (1) | US7965017B2 (ja) |
EP (1) | EP2066027B1 (ja) |
JP (1) | JP4924993B2 (ja) |
WO (1) | WO2008032543A1 (ja) |
Families Citing this family (15)
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JP5220503B2 (ja) * | 2008-07-23 | 2013-06-26 | 太陽誘電株式会社 | 弾性波デバイス |
JP4567775B2 (ja) * | 2008-08-26 | 2010-10-20 | 富士通メディアデバイス株式会社 | 弾性表面波デバイスおよびその製造方法 |
WO2011099381A1 (ja) | 2010-02-09 | 2011-08-18 | 株式会社村田製作所 | 圧電デバイス、圧電デバイスの製造方法 |
JP2011211347A (ja) * | 2010-03-29 | 2011-10-20 | Ube Industries Ltd | 圧電デバイスおよびこれを用いた集積化分波器、集積化フィルタ |
WO2011129723A1 (en) * | 2010-04-15 | 2011-10-20 | G&M Norden Ab | Method for detecting gas and a gas detector therefor |
JP5735099B2 (ja) * | 2011-04-01 | 2015-06-17 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法ならびに携帯電話機 |
WO2016114172A1 (ja) * | 2015-01-13 | 2016-07-21 | 株式会社村田製作所 | 圧電デバイスの製造方法 |
WO2017179300A1 (ja) * | 2016-04-14 | 2017-10-19 | 株式会社村田製作所 | 弾性波装置及びその製造方法 |
JP7039994B2 (ja) * | 2017-12-25 | 2022-03-23 | セイコーエプソン株式会社 | 圧電素子及びその製造方法並びに液体吐出ヘッド |
JP7298991B2 (ja) | 2018-01-22 | 2023-06-27 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびマルチプレクサ |
JP7167626B2 (ja) * | 2018-03-09 | 2022-11-09 | 株式会社リコー | アクチュエータ、液体吐出ヘッド、液体吐出ユニット及び液体を吐出する装置 |
CN109167585B (zh) * | 2018-07-26 | 2022-10-28 | 开元通信技术(厦门)有限公司 | 体声波谐振器及其制作方法、滤波器 |
US20210367582A1 (en) * | 2020-05-25 | 2021-11-25 | Samsung Electro-Mechanics Co., Ltd | Bulk-acoustic wave resonator and method for fabricating bulk-acoustic wave resonator |
JP7485027B2 (ja) | 2020-06-04 | 2024-05-16 | 株式会社村田製作所 | 圧電デバイス |
CN112087209B (zh) * | 2020-09-27 | 2024-02-23 | 苏州汉天下电子有限公司 | 谐振器制造方法 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6473079A (en) * | 1987-09-11 | 1989-03-17 | Sony Corp | Cvd device |
JPH07335880A (ja) * | 1994-06-09 | 1995-12-22 | Sony Corp | 絶縁膜の形成方法、並びに半導体装置の作製方法及び半導体装置 |
JP2001177101A (ja) * | 1999-12-20 | 2001-06-29 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2001345320A (ja) * | 2000-06-02 | 2001-12-14 | Natl Inst Of Advanced Industrial Science & Technology Meti | 半導体装置の製造方法 |
JP2003347883A (ja) * | 2002-05-27 | 2003-12-05 | Mitsubishi Electric Corp | 圧電薄膜素子及びその製造方法 |
JP2005198233A (ja) * | 2003-12-26 | 2005-07-21 | Samsung Electro Mech Co Ltd | Fbar素子及びその製造方法 |
JP2005236338A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 圧電薄膜共振子 |
JP2006013839A (ja) * | 2004-06-25 | 2006-01-12 | Ube Ind Ltd | 薄膜圧電共振器と薄膜圧電フィルタ |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58175314A (ja) * | 1982-03-11 | 1983-10-14 | Nec Corp | 薄膜圧電振動子 |
JPS59215732A (ja) * | 1983-05-24 | 1984-12-05 | Semiconductor Energy Lab Co Ltd | 窒化珪素被膜作製方法 |
JPS60189307A (ja) * | 1984-03-09 | 1985-09-26 | Toshiba Corp | 圧電薄膜共振器およびその製造方法 |
JP4016583B2 (ja) * | 2000-08-31 | 2007-12-05 | 株式会社村田製作所 | 圧電薄膜共振子、フィルタおよび電子機器 |
JP2005236337A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 薄膜音響共振器及びその製造方法 |
WO2002093740A1 (fr) * | 2001-05-11 | 2002-11-21 | Ube Electronics, Ltd. | Resonateur d'onde acoustique en volume a couche mince |
KR100616508B1 (ko) | 2002-04-11 | 2006-08-29 | 삼성전기주식회사 | Fbar 소자 및 그 제조방법 |
JP4534158B2 (ja) * | 2003-12-19 | 2010-09-01 | 宇部興産株式会社 | 圧電薄膜デバイスの製造方法 |
WO2006067949A1 (ja) * | 2004-12-24 | 2006-06-29 | Murata Manufacturing Co., Ltd. | 圧電薄膜共振子およびその製造方法 |
-
2007
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- 2007-08-24 US US12/438,794 patent/US7965017B2/en active Active
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Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6473079A (en) * | 1987-09-11 | 1989-03-17 | Sony Corp | Cvd device |
JPH07335880A (ja) * | 1994-06-09 | 1995-12-22 | Sony Corp | 絶縁膜の形成方法、並びに半導体装置の作製方法及び半導体装置 |
JP2001177101A (ja) * | 1999-12-20 | 2001-06-29 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその作製方法 |
JP2001345320A (ja) * | 2000-06-02 | 2001-12-14 | Natl Inst Of Advanced Industrial Science & Technology Meti | 半導体装置の製造方法 |
JP2005236338A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 圧電薄膜共振子 |
JP2003347883A (ja) * | 2002-05-27 | 2003-12-05 | Mitsubishi Electric Corp | 圧電薄膜素子及びその製造方法 |
JP2005198233A (ja) * | 2003-12-26 | 2005-07-21 | Samsung Electro Mech Co Ltd | Fbar素子及びその製造方法 |
JP2006013839A (ja) * | 2004-06-25 | 2006-01-12 | Ube Ind Ltd | 薄膜圧電共振器と薄膜圧電フィルタ |
Also Published As
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US20090322186A1 (en) | 2009-12-31 |
US7965017B2 (en) | 2011-06-21 |
EP2066027A1 (en) | 2009-06-03 |
EP2066027B1 (en) | 2012-09-05 |
EP2066027A4 (en) | 2010-02-17 |
WO2008032543A1 (fr) | 2008-03-20 |
JP4924993B2 (ja) | 2012-04-25 |
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