JPS649737B2 - - Google Patents
Info
- Publication number
- JPS649737B2 JPS649737B2 JP56042213A JP4221381A JPS649737B2 JP S649737 B2 JPS649737 B2 JP S649737B2 JP 56042213 A JP56042213 A JP 56042213A JP 4221381 A JP4221381 A JP 4221381A JP S649737 B2 JPS649737 B2 JP S649737B2
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- potential source
- conductivity type
- channel
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56042213A JPS57157558A (en) | 1981-03-23 | 1981-03-23 | Complementary mis integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56042213A JPS57157558A (en) | 1981-03-23 | 1981-03-23 | Complementary mis integrated circuit device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57157558A JPS57157558A (en) | 1982-09-29 |
JPS649737B2 true JPS649737B2 (enrdf_load_stackoverflow) | 1989-02-20 |
Family
ID=12629749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56042213A Granted JPS57157558A (en) | 1981-03-23 | 1981-03-23 | Complementary mis integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57157558A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5925261A (ja) * | 1982-08-02 | 1984-02-09 | Hitachi Ltd | Cmos集積回路装置 |
JPH0770612B2 (ja) * | 1987-12-14 | 1995-07-31 | 株式会社日立製作所 | 半導体集積回路 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51146188A (en) * | 1975-06-11 | 1976-12-15 | Fujitsu Ltd | Diode device |
JPS5499584A (en) * | 1977-12-20 | 1979-08-06 | Citizen Watch Co Ltd | Silicon gate complementary mos integrated circuit |
JPS5587391A (en) * | 1978-12-22 | 1980-07-02 | Hitachi Ltd | Semiconductor memory circuit device |
-
1981
- 1981-03-23 JP JP56042213A patent/JPS57157558A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57157558A (en) | 1982-09-29 |
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