JPS649737B2 - - Google Patents

Info

Publication number
JPS649737B2
JPS649737B2 JP56042213A JP4221381A JPS649737B2 JP S649737 B2 JPS649737 B2 JP S649737B2 JP 56042213 A JP56042213 A JP 56042213A JP 4221381 A JP4221381 A JP 4221381A JP S649737 B2 JPS649737 B2 JP S649737B2
Authority
JP
Japan
Prior art keywords
voltage
potential source
conductivity type
channel
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56042213A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57157558A (en
Inventor
Kensaku Wada
Koichi Fujita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56042213A priority Critical patent/JPS57157558A/ja
Publication of JPS57157558A publication Critical patent/JPS57157558A/ja
Publication of JPS649737B2 publication Critical patent/JPS649737B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/854Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP56042213A 1981-03-23 1981-03-23 Complementary mis integrated circuit device Granted JPS57157558A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56042213A JPS57157558A (en) 1981-03-23 1981-03-23 Complementary mis integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56042213A JPS57157558A (en) 1981-03-23 1981-03-23 Complementary mis integrated circuit device

Publications (2)

Publication Number Publication Date
JPS57157558A JPS57157558A (en) 1982-09-29
JPS649737B2 true JPS649737B2 (enrdf_load_stackoverflow) 1989-02-20

Family

ID=12629749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56042213A Granted JPS57157558A (en) 1981-03-23 1981-03-23 Complementary mis integrated circuit device

Country Status (1)

Country Link
JP (1) JPS57157558A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5925261A (ja) * 1982-08-02 1984-02-09 Hitachi Ltd Cmos集積回路装置
JPH0770612B2 (ja) * 1987-12-14 1995-07-31 株式会社日立製作所 半導体集積回路

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51146188A (en) * 1975-06-11 1976-12-15 Fujitsu Ltd Diode device
JPS5499584A (en) * 1977-12-20 1979-08-06 Citizen Watch Co Ltd Silicon gate complementary mos integrated circuit
JPS5587391A (en) * 1978-12-22 1980-07-02 Hitachi Ltd Semiconductor memory circuit device

Also Published As

Publication number Publication date
JPS57157558A (en) 1982-09-29

Similar Documents

Publication Publication Date Title
US4672584A (en) CMOS integrated circuit
US5235201A (en) Semiconductor device with input protection circuit
US5191244A (en) N-channel pull-up transistor with reduced body effect
US4616243A (en) Gate protection for a MOSFET
US4851721A (en) Semiconductor integrated circuit
US4791317A (en) Latch-up protection circuit for integrated circuits using complementary mos circuit technology
JPH0697684B2 (ja) プッシュプル出力バッファ
US4791316A (en) Latch-up protection circuit for integrated circuits using complementary MOS circuit technology
JPH0144021B2 (enrdf_load_stackoverflow)
US5504361A (en) Polarity-reversal protection for integrated electronic circuits in CMOS technology
US4689653A (en) Complementary MOS integrated circuit including lock-up prevention parasitic transistors
JPH07193195A (ja) Cmos集積回路装置
US6218881B1 (en) Semiconductor integrated circuit device
KR930006943Y1 (ko) 반도체 칩의 보호회로
JP3499578B2 (ja) 半導体集積回路
JPS649737B2 (enrdf_load_stackoverflow)
JP2978346B2 (ja) 半導体集積回路装置の入力回路
US6043968A (en) ESD protection circuit
JP2957181B2 (ja) 半導体集積回路
KR100554328B1 (ko) 반도체 장치
JPH0532908B2 (enrdf_load_stackoverflow)
KR100248341B1 (ko) Cmos의 배열방법
US5115297A (en) Complementary type semiconductor integrated circuit device
KR960000050Y1 (ko) 출력버퍼회로
JPS63316475A (ja) 入力保護回路