JPS6483656A - Method and vacuum painting machine for applying film to base layer - Google Patents
Method and vacuum painting machine for applying film to base layerInfo
- Publication number
- JPS6483656A JPS6483656A JP63203972A JP20397288A JPS6483656A JP S6483656 A JPS6483656 A JP S6483656A JP 63203972 A JP63203972 A JP 63203972A JP 20397288 A JP20397288 A JP 20397288A JP S6483656 A JPS6483656 A JP S6483656A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- electric arc
- arc discharge
- base layer
- vaporization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH327587 | 1987-08-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6483656A true JPS6483656A (en) | 1989-03-29 |
Family
ID=4252468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63203972A Pending JPS6483656A (en) | 1987-08-26 | 1988-08-18 | Method and vacuum painting machine for applying film to base layer |
Country Status (6)
Country | Link |
---|---|
US (1) | US4877505A (ja) |
EP (1) | EP0306612B2 (ja) |
JP (1) | JPS6483656A (ja) |
AT (1) | ATE65265T1 (ja) |
DE (1) | DE3863725D1 (ja) |
ES (1) | ES2022946T5 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11124668A (ja) * | 1997-06-16 | 1999-05-11 | Dr Eberhard Moll Gmbh | 低電圧アーク放電からのイオンを用いて基体を処理するための方法および装置 |
DE19857698C2 (de) * | 1998-04-01 | 2002-01-31 | Jean Chin Chu Lee | Radiale Pendelbewegungen ausführendes Reinigungsgerät für Compactdiscs |
JP2002105629A (ja) * | 2000-09-05 | 2002-04-10 | Unaxis Balzer Ag | 連結可能な工作物キャリヤを備える真空装置 |
US7354640B2 (en) | 2004-06-18 | 2008-04-08 | Hitachi Tool Engineering, Ltd. | Hard coating and its production method |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0403552B1 (en) * | 1988-08-25 | 1994-12-14 | Hauzer Industries Bv | Physical vapor deposition dual coating apparatus and process |
US5234561A (en) * | 1988-08-25 | 1993-08-10 | Hauzer Industries Bv | Physical vapor deposition dual coating process |
EP0361265A1 (de) * | 1988-09-29 | 1990-04-04 | Siemens Aktiengesellschaft | Herstellung von dünnen Schichten eines Hochtemperatur-Supraleiters (HTSL) durch ein plasmaaktiviertes PVD-Verfahren |
US4992153A (en) * | 1989-04-26 | 1991-02-12 | Balzers Aktiengesellschaft | Sputter-CVD process for at least partially coating a workpiece |
ATE101661T1 (de) * | 1989-06-27 | 1994-03-15 | Hauzer Holding | Verfahren und vorrichtung zur beschichtung von substraten. |
EP0404973A1 (de) * | 1989-06-27 | 1991-01-02 | Hauzer Holding B.V. | Verfahren und Vorrichtung zur Beschichtung von Substraten |
EP0413853B1 (de) * | 1989-08-21 | 1996-01-31 | Balzers Aktiengesellschaft | Beschichtetes Werkstück mit einer Mischkristallbeschichtung, Verfahren zu dessen Herstellung, sowie Vorrichtung zur Durchführung des Verfahrens |
US5250779A (en) * | 1990-11-05 | 1993-10-05 | Balzers Aktiengesellschaft | Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field |
EP0496053B1 (de) * | 1991-01-21 | 1995-07-26 | Balzers Aktiengesellschaft | Beschichtetes hochverschleissfestes Werkzeug und physikalisches Beschichtungsverfahren zur Beschichtung von hochverschleissfesten Werkzeugen |
JPH04326725A (ja) * | 1991-04-26 | 1992-11-16 | Tokyo Electron Ltd | プラズマ装置 |
JPH0673538A (ja) * | 1992-05-26 | 1994-03-15 | Kobe Steel Ltd | アークイオンプレーティング装置 |
CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
EP0647352A1 (en) | 1992-06-26 | 1995-04-12 | Materials Research Corporation | Transport system for wafer processing line |
CH686253A5 (de) * | 1992-08-28 | 1996-02-15 | Balzers Hochvakuum | Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage. |
US5690796A (en) * | 1992-12-23 | 1997-11-25 | Balzers Aktiengesellschaft | Method and apparatus for layer depositions |
DE4396720C1 (de) * | 1992-12-23 | 2003-07-17 | Unaxis Balzers Ag | Verfahren und Anlage zur Schichtabscheidung und Verwendung der Anlage |
DE59403689D1 (de) * | 1993-03-16 | 1997-09-18 | Balzers Hochvakuum | Verfahren zur Standzeiterhöhung von Werkzeugen und Verschleissschutz-beschichtetes Werkzeug |
DE19505258C2 (de) * | 1995-02-16 | 1998-08-06 | Samsung Electronics Co Ltd | Beschichtungsvorrichtung |
CH690857A5 (de) * | 1995-07-04 | 2001-02-15 | Erich Bergmann | Anlage zur plasmaunterstützten physikalischen Hochvakuumbedampfung von Werkstücken mit verschleissfesten Schichten und Verfahren zur Durchführung in dieser Anlage |
CH689558A5 (de) | 1995-07-11 | 1999-06-15 | Erich Bergmann | Bedampfungsanlage und Verdampfereinheit. |
US6040613A (en) * | 1996-01-19 | 2000-03-21 | Micron Technology, Inc. | Antireflective coating and wiring line stack |
WO1997028290A1 (en) * | 1996-01-31 | 1997-08-07 | Optical Coating Laboratory, Inc. | Multi-chamber continuous sputter coating system |
US5961798A (en) * | 1996-02-13 | 1999-10-05 | Diamond Black Technologies, Inc. | System and method for vacuum coating of articles having precise and reproducible positioning of articles |
FR2744805B1 (fr) * | 1996-02-13 | 1998-03-20 | Pechiney Aluminium | Cibles de pulverisation cathodique selectionnees par controle ultrasons pour leur faible taux d'emissions de particules |
DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz Gmbh | Anlage zur Beschichtung von Werkstücken |
US5760474A (en) * | 1996-07-09 | 1998-06-02 | Micron Technology, Inc. | Capacitor, integrated circuitry, diffusion barriers, and method for forming an electrically conductive diffusion barrier |
US5865699A (en) * | 1996-10-03 | 1999-02-02 | Sandvik Ab | Coated chain saw nose sprocket |
US6027619A (en) * | 1996-12-19 | 2000-02-22 | Micron Technology, Inc. | Fabrication of field emission array with filtered vacuum cathodic arc deposition |
WO1999014392A1 (en) * | 1997-09-12 | 1999-03-25 | Balzers Aktiengesellschaft | Tool having a protective layer system |
US6090457A (en) * | 1997-10-21 | 2000-07-18 | Sanyo Vaccum Industries Co. Ltd. | Process of making a thin film |
JPH11241158A (ja) * | 1998-02-27 | 1999-09-07 | Applied Materials Inc | 電子線を用いた真空蒸着装置 |
US6365016B1 (en) * | 1999-03-17 | 2002-04-02 | General Electric Company | Method and apparatus for arc plasma deposition with evaporation of reagents |
US6485616B1 (en) * | 1999-12-29 | 2002-11-26 | Deposition Sciences, Inc. | System and method for coating substrates with improved capacity and uniformity |
DE10005612A1 (de) * | 2000-02-09 | 2001-08-16 | Hauzer Techno Coating Europ B | Verfahren zur Herstellung eines Gegenstandes und Gegenstand |
US7300559B2 (en) * | 2000-04-10 | 2007-11-27 | G & H Technologies Llc | Filtered cathodic arc deposition method and apparatus |
CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
DE10018143C5 (de) † | 2000-04-12 | 2012-09-06 | Oerlikon Trading Ag, Trübbach | DLC-Schichtsystem sowie Verfahren und Vorrichtung zur Herstellung eines derartigen Schichtsystems |
US20020110700A1 (en) * | 2001-02-12 | 2002-08-15 | Hein Gerald F. | Process for forming decorative films and resulting products |
GB0127251D0 (en) * | 2001-11-13 | 2002-01-02 | Nordiko Ltd | Apparatus |
DE10159907B4 (de) * | 2001-12-06 | 2008-04-24 | Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co. | Beschichtungsverfahren |
AU2002236383A1 (en) * | 2002-02-27 | 2003-09-16 | Philippine Council For Advanced Science And Technology Research And Development | Method for formation of titanium nitride films |
CN100465330C (zh) * | 2003-06-30 | 2009-03-04 | 株式会社不二越 | 多组分膜的生产装置和方法和涂布该多组分膜的工具 |
JP2005025275A (ja) * | 2003-06-30 | 2005-01-27 | Ntt Power & Building Facilities Inc | 土地建物資産評価システム |
EP1524329A1 (de) * | 2003-10-17 | 2005-04-20 | Platit AG | Modulare Vorrichtung zur Beschichtung von Oberflächen |
US7364772B2 (en) * | 2004-03-22 | 2008-04-29 | Eastman Kodak Company | Method for coating an organic layer onto a substrate in a vacuum chamber |
ES2380699T3 (es) * | 2004-06-08 | 2012-05-17 | Dichroic Cell S.R.L. | Sistema para la deposición química en fase de vapor asistida por plasma de baja energía |
SE0402865L (sv) * | 2004-11-04 | 2006-05-05 | Sandvik Intellectual Property | Belagd produkt och framställningsmetod för denna |
US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
US20070148457A1 (en) * | 2005-09-14 | 2007-06-28 | Naturalnano, Inc. | Radiation absorptive composites and methods for production |
US20070138003A1 (en) * | 2005-12-21 | 2007-06-21 | Annaqin Llc | Lamination and conversion process and apparatus |
EP2190591A4 (en) * | 2007-06-05 | 2012-04-04 | Deposition Sciences Inc | METHOD AND APPARATUS FOR HIGH SPEED AND LOW COST DEPOSITION TOOLS |
CN101368260A (zh) * | 2007-09-14 | 2009-02-18 | 山特维克知识产权股份有限公司 | 用于在基底上沉积涂层的方法和设备 |
WO2009079358A1 (en) * | 2007-12-14 | 2009-06-25 | The Regents Of The University Of California | Very low pressure high power impulse triggered magnetron sputtering |
DE102008019202A1 (de) * | 2008-04-17 | 2009-10-22 | Kennametal Inc. | Beschichtungsverfahren , Werkstück oder Werkzeug und dessen Verwendung |
US8021768B2 (en) * | 2009-04-07 | 2011-09-20 | National Material, L.P. | Plain copper foodware and metal articles with durable and tarnish free multiplayer ceramic coating and method of making |
CN101994090B (zh) * | 2009-08-14 | 2013-06-05 | 鸿富锦精密工业(深圳)有限公司 | 溅镀载具及包括该溅镀载具的溅镀装置 |
CN102031493B (zh) * | 2009-09-30 | 2013-08-21 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置 |
CN102127740B (zh) * | 2010-01-19 | 2013-12-11 | 鸿富锦精密工业(深圳)有限公司 | 溅镀装置 |
TW201134972A (en) * | 2010-04-14 | 2011-10-16 | Hon Hai Prec Ind Co Ltd | Coating device |
DE102010028558A1 (de) | 2010-05-04 | 2011-11-10 | Walter Ag | PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten |
TWI468538B (zh) * | 2011-10-14 | 2015-01-11 | Chenming Mold Ind Corp | 屏蔽層製造方法 |
US8968529B2 (en) * | 2012-03-29 | 2015-03-03 | Ever Brite Technology Products Inc. | Production method for forming an antibacterial film on the surface of an object |
US9793098B2 (en) | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
US9412569B2 (en) | 2012-09-14 | 2016-08-09 | Vapor Technologies, Inc. | Remote arc discharge plasma assisted processes |
US10056237B2 (en) | 2012-09-14 | 2018-08-21 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
RU2662912C2 (ru) * | 2013-03-15 | 2018-07-31 | Вейпор Текнолоджиз Инк. | Осаждение из паровой фазы для нанесения покрытия с погружением в дуговую плазму низкого давления и ионная обработка |
DE102013110100A1 (de) * | 2013-06-05 | 2014-12-11 | Von Ardenne Gmbh | Beschichtungsanordnung und Beschichtungsverfahren |
CA2867451C (en) * | 2013-10-28 | 2021-06-29 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
EP3117907B1 (de) * | 2015-07-13 | 2017-10-25 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate |
CN105154819A (zh) * | 2015-09-11 | 2015-12-16 | 兰州空间技术物理研究所 | 超轻反射镜表面制备反射膜的方法 |
CN105132863A (zh) * | 2015-09-11 | 2015-12-09 | 兰州空间技术物理研究所 | 一种缓解复合材料表面金属涂层微裂纹扩展的方法 |
EP3228727A3 (de) | 2016-03-30 | 2018-01-24 | HEC High End Coating GmbH | Verfahren zur herstellung beschichteter substrate, beschichtete substrate und deren verwendung |
SG11202109137XA (en) | 2019-03-15 | 2021-09-29 | Nanofilm Tech International Limited | Improved coating processes |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4966577A (ja) * | 1972-08-31 | 1974-06-27 | ||
JPS49111880A (ja) * | 1973-02-26 | 1974-10-24 | ||
JPS5214690A (en) * | 1975-07-25 | 1977-02-03 | Dai Ichi Kogyo Seiyaku Co Ltd | Method to dissolve the polyurethane resin |
JPS58153776A (ja) * | 1982-03-05 | 1983-09-12 | Citizen Watch Co Ltd | 装飾部品の製造方法およびそれに用いるイオンプレ−テイング装置 |
JPS5940226A (ja) * | 1982-08-31 | 1984-03-05 | Matsushita Electric Ind Co Ltd | 圧力センサ |
JPS59200760A (ja) * | 1983-04-21 | 1984-11-14 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 電気ア−ク蒸気蒸着コ−ティングシステムのためのア−ク開始トリガ装置および方法 |
JPS6011103A (ja) * | 1983-06-30 | 1985-01-21 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 遠隔計測装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4166018A (en) * | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
CH640886A5 (de) * | 1979-08-02 | 1984-01-31 | Balzers Hochvakuum | Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen. |
US4294678A (en) * | 1979-11-28 | 1981-10-13 | Coulter Systems Corporation | Apparatus and method for preventing contamination of sputtering targets |
AT376460B (de) * | 1982-09-17 | 1984-11-26 | Kljuchko Gennady V | Plasmalichtbogeneinrichtung zum auftragen von ueberzuegen |
US4655893A (en) * | 1983-02-07 | 1987-04-07 | Battelle Development Corporation | Cubic boron nitride preparation utilizing a boron and nitrogen bearing gas |
CH662188A5 (de) * | 1983-03-16 | 1987-09-15 | Satis Vacuum Ag | Verfahren und einrichtung zur beschichtung optischer substrate mit reversiblen photochromischen eigenschaften. |
CH664163A5 (de) * | 1985-03-01 | 1988-02-15 | Balzers Hochvakuum | Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden. |
DE3641718A1 (de) * | 1986-12-06 | 1988-06-16 | Leybold Ag | Verfahren zum herstellen von wickeln aus im vakuum leitfaehig beschichteten isolierstoff-folien |
-
1988
- 1988-04-23 ES ES88106546T patent/ES2022946T5/es not_active Expired - Lifetime
- 1988-04-23 DE DE8888106546T patent/DE3863725D1/de not_active Expired - Lifetime
- 1988-04-23 EP EP88106546A patent/EP0306612B2/de not_active Expired - Lifetime
- 1988-04-23 AT AT88106546T patent/ATE65265T1/de not_active IP Right Cessation
- 1988-06-22 US US07/209,866 patent/US4877505A/en not_active Expired - Lifetime
- 1988-08-18 JP JP63203972A patent/JPS6483656A/ja active Pending
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4966577A (ja) * | 1972-08-31 | 1974-06-27 | ||
JPS49111880A (ja) * | 1973-02-26 | 1974-10-24 | ||
JPS5214690A (en) * | 1975-07-25 | 1977-02-03 | Dai Ichi Kogyo Seiyaku Co Ltd | Method to dissolve the polyurethane resin |
JPS58153776A (ja) * | 1982-03-05 | 1983-09-12 | Citizen Watch Co Ltd | 装飾部品の製造方法およびそれに用いるイオンプレ−テイング装置 |
JPS5940226A (ja) * | 1982-08-31 | 1984-03-05 | Matsushita Electric Ind Co Ltd | 圧力センサ |
JPS59200760A (ja) * | 1983-04-21 | 1984-11-14 | マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド | 電気ア−ク蒸気蒸着コ−ティングシステムのためのア−ク開始トリガ装置および方法 |
JPS6011103A (ja) * | 1983-06-30 | 1985-01-21 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | 遠隔計測装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11124668A (ja) * | 1997-06-16 | 1999-05-11 | Dr Eberhard Moll Gmbh | 低電圧アーク放電からのイオンを用いて基体を処理するための方法および装置 |
DE19857698C2 (de) * | 1998-04-01 | 2002-01-31 | Jean Chin Chu Lee | Radiale Pendelbewegungen ausführendes Reinigungsgerät für Compactdiscs |
JP2002105629A (ja) * | 2000-09-05 | 2002-04-10 | Unaxis Balzer Ag | 連結可能な工作物キャリヤを備える真空装置 |
US7354640B2 (en) | 2004-06-18 | 2008-04-08 | Hitachi Tool Engineering, Ltd. | Hard coating and its production method |
Also Published As
Publication number | Publication date |
---|---|
DE3863725D1 (de) | 1991-08-22 |
ATE65265T1 (de) | 1991-08-15 |
EP0306612B1 (de) | 1991-07-17 |
ES2022946T5 (es) | 1996-04-16 |
EP0306612A1 (de) | 1989-03-15 |
ES2022946B3 (es) | 1991-12-16 |
EP0306612B2 (de) | 1996-02-28 |
US4877505A (en) | 1989-10-31 |
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