JPS647492B2 - - Google Patents

Info

Publication number
JPS647492B2
JPS647492B2 JP54060181A JP6018179A JPS647492B2 JP S647492 B2 JPS647492 B2 JP S647492B2 JP 54060181 A JP54060181 A JP 54060181A JP 6018179 A JP6018179 A JP 6018179A JP S647492 B2 JPS647492 B2 JP S647492B2
Authority
JP
Japan
Prior art keywords
film
resist
pattern
mask
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54060181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55151338A (en
Inventor
Masanori Fukumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP6018179A priority Critical patent/JPS55151338A/ja
Publication of JPS55151338A publication Critical patent/JPS55151338A/ja
Publication of JPS647492B2 publication Critical patent/JPS647492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP6018179A 1979-05-16 1979-05-16 Fabricating method of semiconductor device Granted JPS55151338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6018179A JPS55151338A (en) 1979-05-16 1979-05-16 Fabricating method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6018179A JPS55151338A (en) 1979-05-16 1979-05-16 Fabricating method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS55151338A JPS55151338A (en) 1980-11-25
JPS647492B2 true JPS647492B2 (en:Method) 1989-02-09

Family

ID=13134724

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6018179A Granted JPS55151338A (en) 1979-05-16 1979-05-16 Fabricating method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS55151338A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023039270A2 (en) 2021-09-13 2023-03-16 Danisco Us Inc. Bioactive-containing granules

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583232A (ja) * 1981-06-30 1983-01-10 Fujitsu Ltd パタ−ン形成方法
EP0098318B1 (de) * 1982-07-03 1987-02-11 Ibm Deutschland Gmbh Verfahren zum Herstellen von Gräben mit im wesentlichen vertikalen Seitenwänden in Silicium durch reaktives Ionenätzen

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5851412B2 (ja) * 1975-03-19 1983-11-16 株式会社日立製作所 半導体装置の微細加工方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023039270A2 (en) 2021-09-13 2023-03-16 Danisco Us Inc. Bioactive-containing granules

Also Published As

Publication number Publication date
JPS55151338A (en) 1980-11-25

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