JPS6471152A - Formation of insulating film - Google Patents
Formation of insulating filmInfo
- Publication number
- JPS6471152A JPS6471152A JP22642887A JP22642887A JPS6471152A JP S6471152 A JPS6471152 A JP S6471152A JP 22642887 A JP22642887 A JP 22642887A JP 22642887 A JP22642887 A JP 22642887A JP S6471152 A JPS6471152 A JP S6471152A
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- via hole
- shaped
- onto
- layer conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE:To remove pinholes, and to shorten workhours by forming a via hole through etching, thermally treating an insulating film and burying pinholes in the insulating film with an insulating film material. CONSTITUTION:A via hole 16 is shaped to an inter-layer insulating film 13 between a first layer conductor 12 formed onto a substrate 11 and a second layer conductor 18 shaped onto the first layer conductor 12. An insulating organic material having the melting point or the softening point different from a thermosetting temperature is used as the insulating film 13. The via hole 16 is shaped through etching by employing a photolithographic technique after spin coating and thermosetting onto the substrate 11. The insulating film 13 is thermally treated at a temperature equal to or higher than the melting point or the softening point, and a pinhole 17 in the insulating film 13 is buried with an insulating film 13 material. Accordingly, the pinhole is removed, thus shortening workhours.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22642887A JPS6471152A (en) | 1987-09-11 | 1987-09-11 | Formation of insulating film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22642887A JPS6471152A (en) | 1987-09-11 | 1987-09-11 | Formation of insulating film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6471152A true JPS6471152A (en) | 1989-03-16 |
Family
ID=16844962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22642887A Pending JPS6471152A (en) | 1987-09-11 | 1987-09-11 | Formation of insulating film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6471152A (en) |
-
1987
- 1987-09-11 JP JP22642887A patent/JPS6471152A/en active Pending
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