JPS6461082A - Semiconductor laser element - Google Patents

Semiconductor laser element

Info

Publication number
JPS6461082A
JPS6461082A JP21865587A JP21865587A JPS6461082A JP S6461082 A JPS6461082 A JP S6461082A JP 21865587 A JP21865587 A JP 21865587A JP 21865587 A JP21865587 A JP 21865587A JP S6461082 A JPS6461082 A JP S6461082A
Authority
JP
Japan
Prior art keywords
layer
type
laser radiation
active layer
moves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21865587A
Other languages
Japanese (ja)
Inventor
Toshio Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP21865587A priority Critical patent/JPS6461082A/en
Publication of JPS6461082A publication Critical patent/JPS6461082A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To decrease the absorption loss of laser radiation, by determining the amount of impurities under the condition so that absorbing coefficient for laser radiation, which moves from an oscillating region to a non-current-injection region depending on the conductivity of an active layer, is made small. CONSTITUTION:On a P-type GaAs substrate, a P-type AlGaAs clad layer 12, a GaAs layer 13, an N-type AlGaAs clad layer 14 and an N-type GaAs cap layer are laminated. At this time, the amount of impurities in the active layer 13 is selected under the following condition: absorption coefficient for laser radiation, which moves from an oscillating region 13b to a non-current-injection region 13a depending on the conductivity type of the active layer 13, is made small.
JP21865587A 1987-09-01 1987-09-01 Semiconductor laser element Pending JPS6461082A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21865587A JPS6461082A (en) 1987-09-01 1987-09-01 Semiconductor laser element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21865587A JPS6461082A (en) 1987-09-01 1987-09-01 Semiconductor laser element

Publications (1)

Publication Number Publication Date
JPS6461082A true JPS6461082A (en) 1989-03-08

Family

ID=16723348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21865587A Pending JPS6461082A (en) 1987-09-01 1987-09-01 Semiconductor laser element

Country Status (1)

Country Link
JP (1) JPS6461082A (en)

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