JPS6439021A - X-ray mask - Google Patents
X-ray maskInfo
- Publication number
- JPS6439021A JPS6439021A JP19570687A JP19570687A JPS6439021A JP S6439021 A JPS6439021 A JP S6439021A JP 19570687 A JP19570687 A JP 19570687A JP 19570687 A JP19570687 A JP 19570687A JP S6439021 A JPS6439021 A JP S6439021A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- transparent conductive
- supporting section
- conductive thin
- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 abstract 12
- 238000010894 electron beam technology Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/167—X-ray
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19570687A JPH0682604B2 (ja) | 1987-08-04 | 1987-08-04 | X線マスク |
DE3820421A DE3820421A1 (de) | 1987-08-04 | 1988-06-15 | Maske zur roentgenlithographie und verfahren zur herstellung einer solchen |
US07/405,583 US5023156A (en) | 1987-08-04 | 1989-09-11 | Mask for X-ray lityhography and method of manufacturing the same |
US07/678,423 US5132186A (en) | 1987-08-04 | 1991-04-01 | Mask for x-ray lithography and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19570687A JPH0682604B2 (ja) | 1987-08-04 | 1987-08-04 | X線マスク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6439021A true JPS6439021A (en) | 1989-02-09 |
JPH0682604B2 JPH0682604B2 (ja) | 1994-10-19 |
Family
ID=16345621
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19570687A Expired - Lifetime JPH0682604B2 (ja) | 1987-08-04 | 1987-08-04 | X線マスク |
Country Status (3)
Country | Link |
---|---|
US (2) | US5023156A (ja) |
JP (1) | JPH0682604B2 (ja) |
DE (1) | DE3820421A1 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02260413A (ja) * | 1989-03-31 | 1990-10-23 | Canon Inc | X線露光装置及びx線露光方法 |
JPH04142023A (ja) * | 1990-10-02 | 1992-05-15 | Canon Inc | X線露光装置およびx線露光方法 |
KR100244458B1 (ko) * | 1997-03-26 | 2000-03-02 | 김영환 | 마스크 및 그 제조방법 |
JP2007194406A (ja) * | 2006-01-19 | 2007-08-02 | Nikon Corp | 多層膜反射鏡、及びeuv露光装置 |
JP2010027743A (ja) * | 2008-07-16 | 2010-02-04 | Ebara Corp | インプリント用ガラス基板、レジストパターン形成方法、インプリント用ガラス基板の検査方法及び検査装置 |
JP2023011647A (ja) * | 2014-07-11 | 2023-01-24 | アプライド マテリアルズ インコーポレイテッド | 薄い吸収体を有する極紫外線マスクブランク作製システム及びその製造システム |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0682604B2 (ja) * | 1987-08-04 | 1994-10-19 | 三菱電機株式会社 | X線マスク |
EP0653679B1 (en) * | 1989-04-28 | 2002-08-21 | Fujitsu Limited | Mask, mask producing method and pattern forming method using mask |
JPH03228053A (ja) * | 1990-02-01 | 1991-10-09 | Fujitsu Ltd | 光露光レチクル |
US5217829A (en) * | 1990-02-22 | 1993-06-08 | Presstek, Inc. | Method for producing photomasks |
EP0542265B1 (en) * | 1991-11-15 | 1999-09-15 | Canon Kabushiki Kaisha | X-ray mask structure and x-ray exposing method, and semiconductor device manufactured by use of x-ray mask structure, and method for manufacturing x-ray mask structure |
JPH05343299A (ja) * | 1992-06-08 | 1993-12-24 | Mitsubishi Electric Corp | X線マスク及びx線マスクの製造方法 |
JPH0611376A (ja) * | 1992-06-26 | 1994-01-21 | Komatsu Ltd | 油圧回路の金属粉量検出装置 |
US5354633A (en) * | 1993-09-22 | 1994-10-11 | Presstek, Inc. | Laser imageable photomask constructions |
US5538151A (en) * | 1995-01-20 | 1996-07-23 | International Business Machines Corp. | Recovery of an anodically bonded glass device from a susstrate by use of a metal interlayer |
KR0138278B1 (ko) * | 1995-01-24 | 1998-04-27 | 김광호 | 엑스레이 리소그래피용 마스크 및 그의 제조방법 |
US5677090A (en) * | 1995-02-23 | 1997-10-14 | Mitsubishi Denki Kabushiki Kaisha | Method of making X-ray mask having reduced stress |
JP3578872B2 (ja) * | 1995-10-26 | 2004-10-20 | 三菱電機株式会社 | X線マスクの製造方法および加熱装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873824A (en) * | 1973-10-01 | 1975-03-25 | Texas Instruments Inc | X-ray lithography mask |
US3892973A (en) * | 1974-02-15 | 1975-07-01 | Bell Telephone Labor Inc | Mask structure for X-ray lithography |
DE3119682A1 (de) * | 1981-05-18 | 1982-12-02 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "verfahren zur herstellung einer maske fuer die mustererzeugung in lackschichten mittels strahlungslithographie" |
US4453086A (en) * | 1981-12-31 | 1984-06-05 | International Business Machines Corporation | Electron beam system with reduced charge buildup |
JPH0812839B2 (ja) * | 1985-03-20 | 1996-02-07 | 株式会社日立製作所 | X線露光用マスク |
US4595649A (en) * | 1985-02-19 | 1986-06-17 | Allied Corporation | Glassy TiO2 polymer films as electron beam charge dissipation layers |
JPS61200415A (ja) * | 1985-03-01 | 1986-09-05 | Mitsubishi Electric Corp | 微細パタ−ン検査装置 |
US4680243A (en) * | 1985-08-02 | 1987-07-14 | Micronix Corporation | Method for producing a mask for use in X-ray photolithography and resulting structure |
JPS6240146A (ja) * | 1985-08-14 | 1987-02-21 | Mitsubishi Electric Corp | 荷電ビ−ムパタ−ン欠陥検査装置 |
JPS62202518A (ja) * | 1986-02-03 | 1987-09-07 | Fujitsu Ltd | X線露光用マスク |
DE3605916A1 (de) * | 1986-02-25 | 1987-09-10 | Licentia Gmbh | Verfahren zur kontrasterhoehung bei der roentgenstrahl-lithographie und anordnung zur durchfuehrung des verfahrens |
JPH0682604B2 (ja) * | 1987-08-04 | 1994-10-19 | 三菱電機株式会社 | X線マスク |
-
1987
- 1987-08-04 JP JP19570687A patent/JPH0682604B2/ja not_active Expired - Lifetime
-
1988
- 1988-06-15 DE DE3820421A patent/DE3820421A1/de active Granted
-
1989
- 1989-09-11 US US07/405,583 patent/US5023156A/en not_active Expired - Fee Related
-
1991
- 1991-04-01 US US07/678,423 patent/US5132186A/en not_active Expired - Fee Related
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02260413A (ja) * | 1989-03-31 | 1990-10-23 | Canon Inc | X線露光装置及びx線露光方法 |
JPH04142023A (ja) * | 1990-10-02 | 1992-05-15 | Canon Inc | X線露光装置およびx線露光方法 |
KR100244458B1 (ko) * | 1997-03-26 | 2000-03-02 | 김영환 | 마스크 및 그 제조방법 |
JP2007194406A (ja) * | 2006-01-19 | 2007-08-02 | Nikon Corp | 多層膜反射鏡、及びeuv露光装置 |
JP2010027743A (ja) * | 2008-07-16 | 2010-02-04 | Ebara Corp | インプリント用ガラス基板、レジストパターン形成方法、インプリント用ガラス基板の検査方法及び検査装置 |
US9074994B2 (en) | 2008-07-16 | 2015-07-07 | Ebara Corporation | Inspection method and apparatus of a glass substrate for imprint |
JP2023011647A (ja) * | 2014-07-11 | 2023-01-24 | アプライド マテリアルズ インコーポレイテッド | 薄い吸収体を有する極紫外線マスクブランク作製システム及びその製造システム |
Also Published As
Publication number | Publication date |
---|---|
JPH0682604B2 (ja) | 1994-10-19 |
DE3820421A1 (de) | 1989-02-16 |
US5132186A (en) | 1992-07-21 |
US5023156A (en) | 1991-06-11 |
DE3820421C2 (ja) | 1992-08-13 |
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