JPS643347B2 - - Google Patents
Info
- Publication number
- JPS643347B2 JPS643347B2 JP55034066A JP3406680A JPS643347B2 JP S643347 B2 JPS643347 B2 JP S643347B2 JP 55034066 A JP55034066 A JP 55034066A JP 3406680 A JP3406680 A JP 3406680A JP S643347 B2 JPS643347 B2 JP S643347B2
- Authority
- JP
- Japan
- Prior art keywords
- collector
- base
- semiconductor
- semiconductor region
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 25
- 238000002161 passivation Methods 0.000 claims description 11
- 239000012535 impurity Substances 0.000 claims 2
- 239000012528 membrane Substances 0.000 claims 1
- 230000003321 amplification Effects 0.000 description 12
- 238000003199 nucleic acid amplification method Methods 0.000 description 12
- 230000015556 catabolic process Effects 0.000 description 7
- 230000005684 electric field Effects 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000001259 photo etching Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/111—Field plates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/60—Lateral BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/137—Collector regions of BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/231—Emitter or collector electrodes for bipolar transistors
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3406680A JPS56131954A (en) | 1980-03-19 | 1980-03-19 | Semiconductor device |
CA000372858A CA1145062A (en) | 1980-03-19 | 1981-03-12 | Semiconductor device |
DE8181301084T DE3161615D1 (en) | 1980-03-19 | 1981-03-16 | Semiconductor device |
EP81301084A EP0036319B1 (en) | 1980-03-19 | 1981-03-16 | Semiconductor device |
US06/245,510 US4419685A (en) | 1980-03-19 | 1981-03-19 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3406680A JPS56131954A (en) | 1980-03-19 | 1980-03-19 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56131954A JPS56131954A (en) | 1981-10-15 |
JPS643347B2 true JPS643347B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1989-01-20 |
Family
ID=12403880
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3406680A Granted JPS56131954A (en) | 1980-03-19 | 1980-03-19 | Semiconductor device |
Country Status (5)
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4804634A (en) * | 1981-04-24 | 1989-02-14 | National Semiconductor Corporation | Integrated circuit lateral transistor structure |
US4544940A (en) * | 1983-01-14 | 1985-10-01 | General Motors Corporation | Method for more uniformly spacing features in a lateral bipolar transistor |
US4586243A (en) * | 1983-01-14 | 1986-05-06 | General Motors Corporation | Method for more uniformly spacing features in a semiconductor monolithic integrated circuit |
GB2143082B (en) * | 1983-07-06 | 1987-06-17 | Standard Telephones Cables Ltd | Bipolar lateral transistor |
GB2148589B (en) * | 1983-10-18 | 1987-04-23 | Standard Telephones Cables Ltd | Improvements in intergrated circuits |
US4510676A (en) * | 1983-12-06 | 1985-04-16 | International Business Machines, Corporation | Method of fabricating a lateral PNP transistor |
DE3618166A1 (de) * | 1986-05-30 | 1987-12-03 | Telefunken Electronic Gmbh | Lateraltransistor |
JPS63312674A (ja) * | 1987-06-16 | 1988-12-21 | Nissan Motor Co Ltd | 薄膜半導体装置 |
JPH0812865B2 (ja) * | 1989-06-06 | 1996-02-07 | 株式会社東芝 | バイポーラトランジスタとその製造方法 |
FR2649830B1 (fr) * | 1989-07-13 | 1994-05-27 | Sgs Thomson Microelectronics | Structure de circuit integre cmos protege contre les decharges electrostatiques |
FR2650122B1 (fr) * | 1989-07-21 | 1991-11-08 | Motorola Semiconducteurs | Dispositif semi-conducteur a haute tension et son procede de fabrication |
JP2507632B2 (ja) * | 1989-10-18 | 1996-06-12 | 株式会社日立製作所 | 半導体装置 |
US5994739A (en) * | 1990-07-02 | 1999-11-30 | Kabushiki Kaisha Toshiba | Integrated circuit device |
EP0485648B1 (de) * | 1990-11-12 | 1995-05-24 | Siemens Aktiengesellschaft | Halbleiterbauelement für hohe Sperrspannung |
JP2741434B2 (ja) * | 1990-11-26 | 1998-04-15 | 太平洋精工株式会社 | ブロアモータ用抵抗器 |
US5646055A (en) * | 1996-05-01 | 1997-07-08 | Motorola, Inc. | Method for making bipolar transistor |
CN107946356B (zh) * | 2017-03-02 | 2024-04-09 | 重庆中科渝芯电子有限公司 | 一种横向高压功率双极结型晶体管及其制造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3302076A (en) * | 1963-06-06 | 1967-01-31 | Motorola Inc | Semiconductor device with passivated junction |
JPS516509B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1970-07-02 | 1976-02-28 | ||
JPS5218073B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-08-15 | 1977-05-19 | ||
JPS4979480A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-12-06 | 1974-07-31 | ||
JPS5522946B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1973-02-07 | 1980-06-19 | ||
US3873989A (en) * | 1973-05-07 | 1975-03-25 | Fairchild Camera Instr Co | Double-diffused, lateral transistor structure |
US3919005A (en) * | 1973-05-07 | 1975-11-11 | Fairchild Camera Instr Co | Method for fabricating double-diffused, lateral transistor |
JPS5240077A (en) * | 1975-09-26 | 1977-03-28 | Hitachi Ltd | Process for production of lateral transistor |
JPS5359376U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1976-10-20 | 1978-05-20 | ||
US4283236A (en) * | 1979-09-19 | 1981-08-11 | Harris Corporation | Method of fabricating lateral PNP transistors utilizing selective diffusion and counter doping |
-
1980
- 1980-03-19 JP JP3406680A patent/JPS56131954A/ja active Granted
-
1981
- 1981-03-12 CA CA000372858A patent/CA1145062A/en not_active Expired
- 1981-03-16 DE DE8181301084T patent/DE3161615D1/de not_active Expired
- 1981-03-16 EP EP81301084A patent/EP0036319B1/en not_active Expired
- 1981-03-19 US US06/245,510 patent/US4419685A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3161615D1 (en) | 1984-01-19 |
JPS56131954A (en) | 1981-10-15 |
EP0036319B1 (en) | 1983-12-14 |
EP0036319A1 (en) | 1981-09-23 |
CA1145062A (en) | 1983-04-19 |
US4419685A (en) | 1983-12-06 |