JPS6432255A - Image forming layer - Google Patents

Image forming layer

Info

Publication number
JPS6432255A
JPS6432255A JP62188453A JP18845387A JPS6432255A JP S6432255 A JPS6432255 A JP S6432255A JP 62188453 A JP62188453 A JP 62188453A JP 18845387 A JP18845387 A JP 18845387A JP S6432255 A JPS6432255 A JP S6432255A
Authority
JP
Japan
Prior art keywords
polymer
image forming
forming layer
formula
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62188453A
Other languages
English (en)
Other versions
JPH07117749B2 (ja
Inventor
Kazuo Maemoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62188453A priority Critical patent/JPH07117749B2/ja
Priority to US07/224,376 priority patent/US4946761A/en
Priority to DE3825738A priority patent/DE3825738C5/de
Publication of JPS6432255A publication Critical patent/JPS6432255A/ja
Publication of JPH07117749B2 publication Critical patent/JPH07117749B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP62188453A 1987-07-28 1987-07-28 非光重合性の画像形成層 Expired - Fee Related JPH07117749B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP62188453A JPH07117749B2 (ja) 1987-07-28 1987-07-28 非光重合性の画像形成層
US07/224,376 US4946761A (en) 1987-07-28 1988-07-26 Image-forming layer
DE3825738A DE3825738C5 (de) 1987-07-28 1988-07-28 Lichtempfindliches Gemisch

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62188453A JPH07117749B2 (ja) 1987-07-28 1987-07-28 非光重合性の画像形成層

Publications (2)

Publication Number Publication Date
JPS6432255A true JPS6432255A (en) 1989-02-02
JPH07117749B2 JPH07117749B2 (ja) 1995-12-18

Family

ID=16223964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62188453A Expired - Fee Related JPH07117749B2 (ja) 1987-07-28 1987-07-28 非光重合性の画像形成層

Country Status (3)

Country Link
US (1) US4946761A (ja)
JP (1) JPH07117749B2 (ja)
DE (1) DE3825738C5 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02238002A (ja) * 1989-03-10 1990-09-20 Nippon Paint Co Ltd 感光性組成物
JPH0419748A (ja) * 1990-05-15 1992-01-23 Fuji Photo Film Co Ltd 画像形成層
JP2000122272A (ja) * 1998-08-14 2000-04-28 Fuji Photo Film Co Ltd 平版印刷版の製造方法および感光性樹脂組成物
JP2002526303A (ja) * 1998-09-18 2002-08-20 コダック ポリクロム グラフィックス カンパニーリミテッド 感熱性のポリマー性画像記録物質
WO2007125685A1 (ja) * 2006-04-27 2007-11-08 Nitto Denko Corporation 複屈折フィルム及びその製造方法
KR20240128081A (ko) 2022-01-31 2024-08-23 후지필름 가부시키가이샤 감광성 조성물, 전사 필름, 경화막, 반도체 패키지, 패턴 형성 방법, 반도체 패키지의 제조 방법

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3927629A1 (de) * 1989-08-22 1991-02-28 Basf Ag Strahlungsempfindliches, positiv arbeitendes gemisch
DE3927631A1 (de) * 1989-08-22 1991-02-28 Basf Ag Umsetzungsprodukt, verfahren zu dessen herstellung und damit herstellbares strahlungsempfindliches gemisch
DE4022740A1 (de) * 1990-07-18 1992-01-23 Basf Ag Mit carbonylamino-n-alkancarbonsaeure-gruppen substituierte vinylaromaten und ihre verwendung
US5348841A (en) * 1990-11-19 1994-09-20 Industrial Technology Research Institute Organic dye-in-polymer (DIP) medium for write-once-read-many (WORM) optical discs
DE4120172A1 (de) * 1991-06-19 1992-12-24 Hoechst Ag Strahlungsempfindliches gemisch, das als bindemittel neue polymere mit einheiten aus amiden von (alpha),(beta)-ungesaettigten carbonsaeuren enthaelt
JPH08123026A (ja) * 1994-10-28 1996-05-17 Fuji Photo Film Co Ltd 感光性樹脂組成物及びこれを用いたカラーフィルター及びその製造方法
EP0980754B1 (en) * 1998-08-14 2005-10-05 Fuji Photo Film Co., Ltd. Photopolymer composition, lithographic printing plate precursor and method of making lithographic printing plate
EP1153173A1 (en) 1999-02-12 2001-11-14 Shaw Technologies Inc. Interlocking segmental retaining wall
CN1445248A (zh) * 2002-02-15 2003-10-01 希普雷公司 官能化聚合物

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216221A (en) * 1975-07-29 1977-02-07 Kuraray Co Ltd Composition for resinous printing plate
JPS60208748A (ja) * 1984-04-02 1985-10-21 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた積層体
JPS6123143A (ja) * 1984-07-12 1986-01-31 Dainippon Ink & Chem Inc 剥離現像可能な画像形成材料
JPS61223073A (ja) * 1985-03-29 1986-10-03 Toyo Ink Mfg Co Ltd 活性エネルギ−線硬化性被覆組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2757932A1 (de) * 1977-12-24 1979-07-05 Licentia Gmbh Strahlungsempfindliche positiv arbeitende materialien
DE2952698A1 (de) * 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
JPS56159640A (en) * 1980-05-13 1981-12-09 Konishiroku Photo Ind Co Ltd Electrophotographic sensitive material
DE3129529A1 (de) * 1981-07-27 1983-04-07 Toyo Boseki K.K., Osaka Lichtempfindliche harzmasse
JPS59195237A (ja) * 1983-04-20 1984-11-06 Fuji Photo Film Co Ltd 熱現像感光材料
DE3404366A1 (de) * 1984-02-08 1985-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JPS6153637A (ja) * 1984-08-24 1986-03-17 Fuji Photo Film Co Ltd 熱現像感光材料
JPS6172232A (ja) * 1984-09-14 1986-04-14 Fuji Photo Film Co Ltd 熱現像写真感光材料
US4693958A (en) * 1985-01-28 1987-09-15 Lehigh University Lithographic plates and production process therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5216221A (en) * 1975-07-29 1977-02-07 Kuraray Co Ltd Composition for resinous printing plate
JPS60208748A (ja) * 1984-04-02 1985-10-21 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いた積層体
JPS6123143A (ja) * 1984-07-12 1986-01-31 Dainippon Ink & Chem Inc 剥離現像可能な画像形成材料
JPS61223073A (ja) * 1985-03-29 1986-10-03 Toyo Ink Mfg Co Ltd 活性エネルギ−線硬化性被覆組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02238002A (ja) * 1989-03-10 1990-09-20 Nippon Paint Co Ltd 感光性組成物
JPH0419748A (ja) * 1990-05-15 1992-01-23 Fuji Photo Film Co Ltd 画像形成層
JP2000122272A (ja) * 1998-08-14 2000-04-28 Fuji Photo Film Co Ltd 平版印刷版の製造方法および感光性樹脂組成物
JP2002526303A (ja) * 1998-09-18 2002-08-20 コダック ポリクロム グラフィックス カンパニーリミテッド 感熱性のポリマー性画像記録物質
WO2007125685A1 (ja) * 2006-04-27 2007-11-08 Nitto Denko Corporation 複屈折フィルム及びその製造方法
KR20240128081A (ko) 2022-01-31 2024-08-23 후지필름 가부시키가이샤 감광성 조성물, 전사 필름, 경화막, 반도체 패키지, 패턴 형성 방법, 반도체 패키지의 제조 방법

Also Published As

Publication number Publication date
JPH07117749B2 (ja) 1995-12-18
DE3825738A1 (de) 1989-03-02
DE3825738C5 (de) 2004-09-09
DE3825738C2 (de) 1995-11-09
US4946761A (en) 1990-08-07

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Legal Events

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