JPS56153338A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS56153338A
JPS56153338A JP5668280A JP5668280A JPS56153338A JP S56153338 A JPS56153338 A JP S56153338A JP 5668280 A JP5668280 A JP 5668280A JP 5668280 A JP5668280 A JP 5668280A JP S56153338 A JPS56153338 A JP S56153338A
Authority
JP
Japan
Prior art keywords
photoresist
occurrence
conjugated diene
diene polymer
cyclized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5668280A
Other languages
Japanese (ja)
Inventor
Toko Harada
Yoshiyuki Harita
Yoichi Kamoshita
Toshiaki Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP5668280A priority Critical patent/JPS56153338A/en
Priority to US06/185,771 priority patent/US4349619A/en
Priority to DE8080303280T priority patent/DE3065699D1/en
Priority to EP80303280A priority patent/EP0026088B1/en
Publication of JPS56153338A publication Critical patent/JPS56153338A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Abstract

PURPOSE:To increase the resolution of a photoresist based on a conjugated diene polymer or its cyclization product and reduce the occurrence of pinholes by adding 4-aminoazobenzene or 4,4'-diaminoazobenzene to the photoresist. CONSTITUTION:Azobenzenes represented by formula I or II are added to a negative type photoresist consisting of a cyclized conjugated diene polymer such as cyclized cis-1,4-polyisoprene and a photocrosslinking agent. Thus, even if said photoresist is applied to the highly reflecting surface of a substrate to form a resist image, the influence of halation is not exerted, and the occurrence of pinholes due to insufficient exposure is prevented.
JP5668280A 1979-09-19 1980-04-28 Photoresist composition Pending JPS56153338A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP5668280A JPS56153338A (en) 1980-04-28 1980-04-28 Photoresist composition
US06/185,771 US4349619A (en) 1979-09-19 1980-09-10 Photoresist composition
DE8080303280T DE3065699D1 (en) 1979-09-19 1980-09-18 Photoresist compositions
EP80303280A EP0026088B1 (en) 1979-09-19 1980-09-18 Photoresist compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5668280A JPS56153338A (en) 1980-04-28 1980-04-28 Photoresist composition

Publications (1)

Publication Number Publication Date
JPS56153338A true JPS56153338A (en) 1981-11-27

Family

ID=13034194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5668280A Pending JPS56153338A (en) 1979-09-19 1980-04-28 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS56153338A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295044A (en) * 1986-06-16 1987-12-22 Tokyo Ohka Kogyo Co Ltd Positive type photosensitive composition
JPH04261540A (en) * 1991-01-16 1992-09-17 Mitsubishi Electric Corp Photoresist
JPH04273903A (en) * 1991-02-28 1992-09-30 Sharp Corp Liquid fuel combustion device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295044A (en) * 1986-06-16 1987-12-22 Tokyo Ohka Kogyo Co Ltd Positive type photosensitive composition
JPH04261540A (en) * 1991-01-16 1992-09-17 Mitsubishi Electric Corp Photoresist
JPH04273903A (en) * 1991-02-28 1992-09-30 Sharp Corp Liquid fuel combustion device

Similar Documents

Publication Publication Date Title
JPS56122031A (en) Positive type photosensitive resin composition
ES401505A1 (en) Polyamide-diazo resin composition
JPS5323277A (en) Photomasking material and photomask
JPS57211145A (en) Photoresist composition
JPS533216A (en) Diazo photosensitive composition
KR970002473A (en) Positive Photoresist Composition
US4415651A (en) Aqueous processable, positive-working photopolymer compositions
JPS6432255A (en) Image forming layer
JPS56153338A (en) Photoresist composition
JPS5735850A (en) Photoresist composition
JPS5310648A (en) Photosensitive resin compositions
KR937000886A (en) Formation method of fine resist pattern
JPS52885A (en) Photo-setting resin composition
JPS5614232A (en) Negative type resist resin
JPS57146247A (en) Water-soluble photoresist
JPS5741636A (en) Photoresist composition
JPS5760327A (en) Image forming material
KR930020227A (en) Resist coating composition
JPS52834A (en) Coating process
JPS5770531A (en) Photoresist composition
JPS5646536A (en) Formation of microminiature electrode
JPS5669628A (en) Developer composition for lithographic plate
JPS5323341A (en) Tack masking film
JPS5711338A (en) Film photoresist having laminate structure
GB709453A (en) Improvements relating to the manufacture of photo-lithographic diazotype printing material