JPS5735850A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS5735850A
JPS5735850A JP11138680A JP11138680A JPS5735850A JP S5735850 A JPS5735850 A JP S5735850A JP 11138680 A JP11138680 A JP 11138680A JP 11138680 A JP11138680 A JP 11138680A JP S5735850 A JPS5735850 A JP S5735850A
Authority
JP
Japan
Prior art keywords
cyclized
org
aryl
solvent
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11138680A
Other languages
Japanese (ja)
Other versions
JPS6315571B2 (en
Inventor
Yoichi Kamoshita
Toshiaki Yoshihara
Yoshiyuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP11138680A priority Critical patent/JPS5735850A/en
Priority to US06/185,771 priority patent/US4349619A/en
Priority to DE8080303280T priority patent/DE3065699D1/en
Priority to EP80303280A priority patent/EP0026088B1/en
Publication of JPS5735850A publication Critical patent/JPS5735850A/en
Publication of JPS6315571B2 publication Critical patent/JPS6315571B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To enhance the adhesion of a photoresist film to a substrate by adding a photocrossliniking agent soluble in an org. solvent and a specified compound to a cyclized conjugated diene polymer. CONSTITUTION:To 100pts.wt. cyclized conjugated diene polymer (A) having 5- 95% residual double bond content such as cyclized cis-1,4-polyisoprene are added 0.1-10pts.wt. photocrosslinking agent (B) soluble in an org. solvent such as 4,4'- diazidostilbene and 0.1-1.0pts.wt. compound (C) represented by formula I or II (where each of R1-4, R6 and R7 is H, aralkyl, alkyl, alkenyl or aryl; R5 is H or aryl; and R8 is H or amino). Using the resulting composition a reduction in the resolution of a photoresist film due to halation on a substrate having a stepped structure and high reflectance can be prevented with high reproducibility independently of the prebaking conditions.
JP11138680A 1979-09-19 1980-08-13 Photoresist composition Granted JPS5735850A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP11138680A JPS5735850A (en) 1980-08-13 1980-08-13 Photoresist composition
US06/185,771 US4349619A (en) 1979-09-19 1980-09-10 Photoresist composition
DE8080303280T DE3065699D1 (en) 1979-09-19 1980-09-18 Photoresist compositions
EP80303280A EP0026088B1 (en) 1979-09-19 1980-09-18 Photoresist compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11138680A JPS5735850A (en) 1980-08-13 1980-08-13 Photoresist composition

Publications (2)

Publication Number Publication Date
JPS5735850A true JPS5735850A (en) 1982-02-26
JPS6315571B2 JPS6315571B2 (en) 1988-04-05

Family

ID=14559858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11138680A Granted JPS5735850A (en) 1979-09-19 1980-08-13 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS5735850A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093427A (en) * 1983-10-28 1985-05-25 Nippon Kayaku Co Ltd Method for hardening photosensitive resin
JPH05245984A (en) * 1992-03-05 1993-09-24 Hitachi Chem Co Ltd Electric laminated sheet
JP2006241086A (en) * 2005-03-04 2006-09-14 Nippon Kagaku Kogyosho:Kk New light-absorbing material
JP2018529659A (en) * 2015-08-21 2018-10-11 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ Compounds for optically active devices
US11702396B2 (en) 2017-02-15 2023-07-18 Johnson & Johnson Surgical Vision, Inc. Hydrophobic compounds for optically active devices
US11753387B2 (en) 2017-02-15 2023-09-12 Johnson & Johnson Surgical Vision, Inc. Compounds for optically active devices

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6093427A (en) * 1983-10-28 1985-05-25 Nippon Kayaku Co Ltd Method for hardening photosensitive resin
JPH05245984A (en) * 1992-03-05 1993-09-24 Hitachi Chem Co Ltd Electric laminated sheet
JP2006241086A (en) * 2005-03-04 2006-09-14 Nippon Kagaku Kogyosho:Kk New light-absorbing material
JP2018529659A (en) * 2015-08-21 2018-10-11 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ Ｇｅｓｅｌｌｓｃｈａｆｔ ｍｉｔ ｂｅｓｃｈｒａｅｎｋｔｅｒ Ｈａｆｔｕｎｇ Compounds for optically active devices
US11078177B2 (en) 2015-08-21 2021-08-03 Merck Patent Gmbh Compounds for optically active devices
US11958819B2 (en) 2015-08-21 2024-04-16 Johnson & Johnson Surgical Vision, Inc. Compounds for optically active devices
US11702396B2 (en) 2017-02-15 2023-07-18 Johnson & Johnson Surgical Vision, Inc. Hydrophobic compounds for optically active devices
US11753387B2 (en) 2017-02-15 2023-09-12 Johnson & Johnson Surgical Vision, Inc. Compounds for optically active devices

Also Published As

Publication number Publication date
JPS6315571B2 (en) 1988-04-05

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