JPH05245984A - Electric laminated sheet - Google Patents
Electric laminated sheetInfo
- Publication number
- JPH05245984A JPH05245984A JP4047388A JP4738892A JPH05245984A JP H05245984 A JPH05245984 A JP H05245984A JP 4047388 A JP4047388 A JP 4047388A JP 4738892 A JP4738892 A JP 4738892A JP H05245984 A JPH05245984 A JP H05245984A
- Authority
- JP
- Japan
- Prior art keywords
- group
- matrix
- pyrazoline
- benzoxazolylthiophene
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、紫外線硬化型レジスト
インクを使用して、プリント配線板を製造するのに適し
ている電気用積層板に関するものである。本発明で積層
板とは、熱硬化性樹脂を基材に含浸し、加熱加圧して得
た積層板すなわち、熱硬化性樹脂をマトリックスとする
積層板をいい、片面又は両面に金属箔を張り付けた金属
箔張り積層板も含む。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric laminate suitable for producing a printed wiring board using a UV curable resist ink. The laminated plate in the present invention refers to a laminated plate obtained by impregnating a base material with a thermosetting resin and applying heat and pressure, that is, a laminated plate having a thermosetting resin as a matrix, and a metal foil attached to one side or both sides. Including metal foil-clad laminates.
【0002】[0002]
【従来の技術】近年、プリント配線板は、配線が高密度
化し、ソルダレジスト印刷においてもスクリーン印刷法
による方法よりも感光性レジストインクによる方法が多
くなっている。2. Description of the Related Art In recent years, the wiring density of printed wiring boards has increased, and the number of methods using a photosensitive resist ink has increased in the solder resist printing as well as the method using a screen printing method.
【0003】紫外線硬化型感光性レジストインクは、紫
外線を照射することによって硬化する。ところが、照射
した紫外線が積層板を透過してしまうことがあり、両面
にレジストインクを塗布してある場合、反対面のレジス
トインクも照射した面と同じように感光し、反対面に所
定のパターンを形成できなくなる。The ultraviolet curable photosensitive resist ink is cured by irradiating it with ultraviolet rays. However, the irradiated ultraviolet rays may pass through the laminated plate, and when resist ink is applied to both surfaces, the resist ink on the opposite surface is also exposed in the same manner as the irradiated surface, and the predetermined pattern is formed on the opposite surface. Cannot be formed.
【0004】照射量を減少すると、レジストインクの硬
化が不充分となり、耐摩耗性、耐溶剤性、耐湿性を損な
う。そこで、従来は、ベンゾフェノン系、ベンゾトリア
ゾール系、クマリン系等の添加型紫外線吸収剤を樹脂中
に配合していた。When the irradiation dose is reduced, the resist ink is insufficiently cured, and the abrasion resistance, solvent resistance and moisture resistance are impaired. Therefore, conventionally, an addition type ultraviolet absorber such as a benzophenone type, a benzotriazole type, or a coumarin type has been compounded in the resin.
【0005】これらの紫外線吸収剤は波長380nm以
下の紫外線しか吸収しない。例えば、ベンゾフェノン系
紫外線吸収剤は270〜290nm付近に吸収のピーク
があるものがほとんどであり、ベンゾトリアゾール系紫
外線吸収剤、クマリン系紫外線吸収剤いずれも340〜
360nm付近に吸収のピークがある。従来の紫外線硬
化型感光性レジストインクは、100〜380nmの紫
外線を照射して硬化させるものであったので(プリント
回路技術便覧、765ページ)これで充分であった。These ultraviolet absorbers absorb only ultraviolet rays having a wavelength of 380 nm or less. For example, most benzophenone-based UV absorbers have an absorption peak near 270 to 290 nm, and both benzotriazole-based UV absorbers and coumarin-based UV absorbers have 340 to 340 nm.
There is an absorption peak near 360 nm. Since the conventional UV-curable photosensitive resist ink is one that cures by irradiating with ultraviolet rays of 100 to 380 nm (Printed Circuit Technical Handbook, page 765), this is sufficient.
【0006】[0006]
【発明が解決しょうとする課題】ところが、紫外線硬化
型ソルダレジストインクは、その後改良され、可視光に
近い波長で硬化するようになった。このため、電気用積
層板に波長380〜420nmの紫外線を吸収する性能
をもたせる必要を生じた。However, the UV-curable solder resist ink has since been improved so that it cures at a wavelength close to visible light. For this reason, it has become necessary to provide the electrical laminate with the ability to absorb ultraviolet rays having a wavelength of 380 to 420 nm.
【0007】本発明は、波長380〜420nmの紫外
線を透過しない電気用積層板を提供することを目的とす
る。An object of the present invention is to provide an electrical laminate which does not transmit ultraviolet rays having a wavelength of 380 to 420 nm.
【0008】[0008]
【課題を解決するための手段】本発明者らは、種々検討
した結果、一般式化3で表されるベンゾオキサゾリルチ
オフェン化合物及び一般式化4で表されるピラゾリン化
合物が前記本発明の目的を達成するために有効であるこ
とを見出した。As a result of various studies, the present inventors have found that the benzoxazolylthiophene compound represented by the general formula 3 and the pyrazoline compound represented by the general formula 4 are the same as those of the present invention. It was found to be effective for achieving the purpose.
【0009】[0009]
【化3】 置換基R1及びR2は水素、ハロゲン又は炭素数1〜6の
アルキル基を表す。[Chemical 3] The substituents R 1 and R 2 represent hydrogen, halogen or an alkyl group having 1 to 6 carbon atoms.
【0010】[0010]
【化4】 置換基R1、R2及びR4は水素、炭素数1〜6のアルキ
ル基又はフェニル基(ハロゲン又はアルキル核置換体を
含む)を表し、置換基R3はメチレン基、エチレン基、
プロピレン基、カルボニル基又はフェニルエチレン基を
表す。[Chemical 4] The substituents R 1 , R 2 and R 4 represent hydrogen, an alkyl group having 1 to 6 carbon atoms or a phenyl group (including a halogen or an alkyl nucleus substituent), the substituent R 3 is a methylene group, an ethylene group,
It represents a propylene group, a carbonyl group or a phenylethylene group.
【0011】一般式化3で表されるベンゾオキサゾリル
チオフェン化合物として一例を示すと、2,5ビス(タ
ーシャリブチルベンゾオキサゾリル(2)チオフェンが
ある。An example of the benzoxazolylthiophene compound represented by the general formula 3 is 2,5bis (tertiarybutylbenzoxazolyl (2) thiophene.
【0012】また、一般式化4で表されるピラゾリン化
合物として一例を示すと、1−(フェニル)−3−(4
−ターシャリブチル−スチリル)−5−(4−ターシャ
リブチルフェニル)−ピラゾリンがある。An example of the pyrazoline compound represented by the general formula 4 is 1- (phenyl) -3- (4
-Tert-butyl-styryl) -5- (4-tert-butylphenyl) -pyrazoline.
【0013】一般式化3で表されるベンゾオキサゾリル
チオフェン化合物及び一般式化4で表されるピラゾリン
化合物の両者を併用すること、ベンゾオキサゾリル化合
物、ピラゾリン化合物をそれぞれ1種又は2種以上用い
ることも、もちろん差し支えない。The benzoxazolylthiophene compound represented by the general formula 3 and the pyrazoline compound represented by the general formula 4 are used in combination, and one or two kinds of the benzoxazolyl compound and the pyrazoline compound are used, respectively. Of course, there is no problem in using the above.
【0014】一般式化3で表されるベンゾオキサゾリル
チオフェン化合物及び一般式化4で表されるピラゾリン
化合物に、さらに、340〜360nmの吸収ピークを
持つクマリン系の化合物を配合すると、380〜420
nmにおける吸収能が向上し、さらに340〜360n
mの紫外線も吸収するので好ましい。When the benzoxazolylthiophene compound represented by the general formula 3 and the pyrazoline compound represented by the general formula 4 are further compounded with a coumarin-based compound having an absorption peak at 340 to 360 nm, 420
absorptivity in nm is improved and further 340 to 360 n
m is also preferable because it also absorbs ultraviolet rays.
【0015】熱硬化性樹脂としては、各種の電気用積層
板に用いられているものであれば使用できるが、特にエ
ポキシ樹脂のように光透過性のよい樹脂の場合に有効で
ある。As the thermosetting resin, any of those used in various electrical laminates can be used, but it is particularly effective in the case of a resin having a good light transmittance such as an epoxy resin.
【0016】基材も同様に各種の電気用積層板に用いら
れているものであれば特に限定のないものであるが、通
常ガラス織布、ガラス不織布、ガラス繊維と他の繊維と
の混合織布や不織布が用いられる。The base material is not particularly limited as long as it is also used in various electrical laminates, but it is usually a glass woven cloth, a glass non-woven cloth, or a mixed weave of glass fibers and other fibers. Cloth or non-woven fabric is used.
【0017】ベンゾオキサゾリルチオフェン化合物又は
ピラゾリン化合物の配合量は、積層板の厚みによって異
なる。積層板の厚みが大きいときは少量でよく、薄い場
合は多くする。例えば厚さ0.1mmのガラス布に熱硬
化性樹脂(エポキシ樹脂)を含浸乾燥して樹脂分43重
量%として得たプリプレグを2枚重ね成形して成る積層
板においては、熱硬化性樹脂(エポキシ樹脂)に対して
0.2%とする。配合量が多すぎると積層板の色調が変
化するので、1%以下とするのが好ましい。The blending amount of the benzoxazolylthiophene compound or the pyrazoline compound varies depending on the thickness of the laminate. If the thickness of the laminate is large, a small amount is sufficient, and if it is thin, it is increased. For example, in a laminated plate formed by stacking two prepregs obtained by impregnating and drying a glass cloth having a thickness of 0.1 mm with a thermosetting resin (epoxy resin) to obtain a resin content of 43% by weight, the thermosetting resin ( 0.2% to epoxy resin). If the blending amount is too large, the color tone of the laminated plate changes, so it is preferably set to 1% or less.
【0018】ピラゾリン化合物とベンゾオキサゾリルチ
オフェン化合物又はクマリン系化合物とを併用する場合
の配合割合は等量とするのが好ましい。また配合量は両
者合わせて1%以下とするのが好ましい。When the pyrazoline compound and the benzoxazolylthiophene compound or the coumarin compound are used in combination, the mixing ratio is preferably equal. In addition, it is preferable that the combined amount of both is 1% or less.
【0019】[0019]
【作用】ベンゾオキサゾリルチオフェン化合物又はピラ
ゾリン化合物を配合した熱硬化性樹脂を基材に含浸し、
加熱加圧して得た積層板すなわち、熱硬化性樹脂をマト
リックスとする積層板は、380〜420nmの光を照
射してもこれらの化合物によって吸収され、反対側に塗
布されたレジストインクに影響しなくなる。[Function] A base material is impregnated with a thermosetting resin containing a benzoxazolylthiophene compound or a pyrazoline compound,
A laminate obtained by heating and pressing, that is, a laminate having a thermosetting resin as a matrix, is absorbed by these compounds even when irradiated with light of 380 to 420 nm, and affects the resist ink applied on the opposite side. Disappear.
【実施例】 実施例1 1−(フェニル)−3−(4−ターシャリブチルスチリ
ル)−5−(4−ターシャリブチルフェニル)−ピラゾ
リンをエポキシ樹脂100に対して0.2(重量比、以
下同じ)添加してワニスとし、厚み0.1mmのガラス
布に含浸乾燥して樹脂分43重量%のプリプレグとし
た。このプリプレグを2枚重ね、その上下に厚さ70μ
mの銅箔を重ね、170℃、5.0MPaで90分間加
熱加圧して積層板を得た。両面の銅箔をエッチングによ
って除去し、色相を1−(フェニル)−3−(4−ター
シャリブチルスチリル)−5−(4−ターシャリブチル
フェニル)−ピラゾリンを配合しない積層板と比較し
た。さらに紫外線照射機(オーク製作所製)で700m
J/cm2の紫外線を照射し、透過照度計UV−MOI
で2種のセンサー、UV−35(330〜370nmの
紫外線を検知する)及びUV−42(400〜440n
mの紫外線を検知する)を用いて測定し、透過率を求め
た。Example 1 1- (phenyl) -3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) -pyrazoline was added to epoxy resin 100 at 0.2 (weight ratio, The same applies hereinafter) to form a varnish, which is impregnated into a glass cloth having a thickness of 0.1 mm and dried to form a prepreg having a resin content of 43% by weight. Two sheets of this prepreg are stacked, and the thickness is 70μ above and below it.
m copper foils were stacked and heated and pressed at 170 ° C. and 5.0 MPa for 90 minutes to obtain a laminated plate. The copper foil on both sides was removed by etching and the hue was compared to a laminate without 1- (phenyl) -3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) -pyrazolin. Furthermore, it is 700m with an ultraviolet irradiator (Oak Seisakusho)
Irradiate with UV of J / cm 2 and transmit illuminance meter UV-MOI
With two types of sensors, UV-35 (detects ultraviolet rays of 330 to 370 nm) and UV-42 (400 to 440n).
m ultraviolet ray is detected) to determine the transmittance.
【0020】次に積層板の両面に液状レジストPSR−
1000(太陽インキ製)をスクリーン印刷によって塗
布し80℃で15分間乾燥した。片面にネガフィルムを
置き、ネガフィルム面側に紫外線を照射し、トリクロロ
メタンで現像し、露光しなかった面にレジストが残って
いるか否かを調べた。Next, liquid resist PSR-
1000 (made by Taiyo Ink) was applied by screen printing and dried at 80 ° C. for 15 minutes. A negative film was placed on one side, the side of the negative film was irradiated with ultraviolet rays and developed with trichloromethane, and it was examined whether or not the resist remained on the side not exposed.
【0021】実施例2 1−(フェニル)−3−(4−ターシャリブチルスチリ
ル)−5−(4−ターシャリブチルフェニル)−ピラゾ
リンと4−メチル−7−N,Nジエチルアミノクマリン
をエポキシ樹脂100に対してそれぞれ0.1添加して
ワニスとし、以下実施例1と同様にして積層板を得、こ
の積層板についても実施例1と同じ試験を行った。Example 2 1- (Phenyl) -3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) -pyrazoline and 4-methyl-7-N, N diethylaminocoumarin were combined with an epoxy resin. 0.1 was added to 100 to form a varnish, and a laminated plate was obtained in the same manner as in Example 1, and this laminated plate was also subjected to the same test as in Example 1.
【0022】実施例3 1−(フェニル)−3−(4−ターシャリブチルスチリ
ル)−5−(4−ターシャリブチルフェニル)−ピラゾ
リンと2,5ビス(ターシャリブチルベンゾオキサゾリ
ル(2)チオフェンとをエポキシ樹脂100に対してそ
れぞれ0.1添加してワニスとし、以下実施例1と同様
にして積層板を得、この積層板についても実施例1と同
じ試験を行った。Example 3 1- (Phenyl) -3- (4-tert-butylstyryl) -5- (4-tert-butylphenyl) -pyrazoline and 2,5bis (tert-butylbenzoxazolyl (2 ) 0.1% of thiophene was added to each epoxy resin 100 to form a varnish, and a laminated plate was obtained in the same manner as in Example 1. This laminated plate was also subjected to the same test as in Example 1.
【0023】比較例1 2ハイドロキシ4メトキシベンゾフェノンをエポキシ樹
脂100に対し1.0添加し、以下実施例1と同様にし
て積層板を得、この積層板についても実施例1と同じ試
験を行った。Comparative Example 1 2 Hydroxy-4-methoxybenzophenone was added to epoxy resin 100 in an amount of 1.0, and a laminated plate was obtained in the same manner as in Example 1. This laminated plate was also subjected to the same test as in Example 1. ..
【0024】比較例2 2−(2´−ハイドロキシ5´メチルフェニル)ベンゾ
チアゾールをエポキシ樹脂100に対して1.0添加
し、以下実施例1と同様にして積層板を得、この積層板
についても実施例1と同じ試験を行った。以上の試験結
果を表1に示す。Comparative Example 2 1.0% of 2- (2'-hydroxy 5'methylphenyl) benzothiazole was added to epoxy resin 100, and a laminated plate was obtained in the same manner as in Example 1 below. The same test as in Example 1 was performed. The above test results are shown in Table 1.
【0025】[0025]
【表1】 [Table 1]
【0026】[0026]
【発明の効果】本発明によれば、380〜420nmの
比較的長波長で紫外線を露光する場合に反対側に塗布し
たレジストインクを感光させることなく、また、積層板
の色調変化もないという効果を奏する。EFFECTS OF THE INVENTION According to the present invention, when the ultraviolet ray is exposed at a relatively long wavelength of 380 to 420 nm, the resist ink coated on the opposite side is not exposed and the color tone of the laminated plate is not changed. Play.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H05K 1/05 8727−4E (72)発明者 枝 鉄夫 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内 (72)発明者 武田 良幸 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館工場内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI Technical indication location H05K 1/05 8727-4E (72) Inventor Tetsuo Eda 1500 Ogawa, Shimodate-shi, Ibaraki Hitachi Chemical Co., Ltd. Shimodate Factory (72) Inventor Yoshiyuki Takeda 1500 Ogawa, Shimodate City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Shimodate Factory
Claims (4)
ルチオフェン化合物を配合した樹脂をマトリックスとし
た電気用積層板。 【化1】 置換基R1及びR2は水素、ハロゲン又は炭素数1〜6の
アルキル基を表す。1. An electrical laminate using a resin containing a benzoxazolylthiophene compound represented by the general formula 1 as a matrix. [Chemical 1] The substituents R 1 and R 2 represent hydrogen, halogen or an alkyl group having 1 to 6 carbon atoms.
を配合した樹脂をマトリックスとした電気用積層板。 【化2】 置換基R1、R2及びR4は水素、炭素数1〜6のアルキ
ル基又はフェニル基(ハロゲン又はアルキル核置換体を
含む)を表し、置換基R3はメチレン基、エチレン基、
プロピレン基、カルボニル基又はフェニルエチレン基を
表す。2. An electrical laminate using a resin containing a pyrazoline compound represented by the general formula 2 as a matrix. [Chemical 2] The substituents R 1 , R 2 and R 4 represent hydrogen, an alkyl group having 1 to 6 carbon atoms or a phenyl group (including a halogen or an alkyl nucleus substituent), the substituent R 3 is a methylene group, an ethylene group,
It represents a propylene group, a carbonyl group or a phenylethylene group.
化合物を配合した樹脂をマトリックスとした請求項2記
載の電気用積層板。3. The electrical laminate according to claim 2, wherein a resin containing a coumarin-based compound in addition to the pyrazoline compound is used as a matrix.
ルチオフェン化合物及び一般式化2で表されるピラゾリ
ン化合物を配合した樹脂をマトリックスとした電気用積
層板。4. An electrical laminate using a resin containing a benzoxazolylthiophene compound represented by the general formula 1 and a pyrazoline compound represented by the general formula 2 as a matrix.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4738892A JP2946919B2 (en) | 1992-03-05 | 1992-03-05 | Electric laminate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4738892A JP2946919B2 (en) | 1992-03-05 | 1992-03-05 | Electric laminate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05245984A true JPH05245984A (en) | 1993-09-24 |
JP2946919B2 JP2946919B2 (en) | 1999-09-13 |
Family
ID=12773726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4738892A Expired - Fee Related JP2946919B2 (en) | 1992-03-05 | 1992-03-05 | Electric laminate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2946919B2 (en) |
Citations (6)
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---|---|---|---|---|
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JPS5575405A (en) * | 1978-11-30 | 1980-06-06 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS5735850A (en) * | 1980-08-13 | 1982-02-26 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
JPS62162535A (en) * | 1986-01-13 | 1987-07-18 | 松下電工株式会社 | Electric laminated board |
JPS62262052A (en) * | 1986-05-07 | 1987-11-14 | Minolta Camera Co Ltd | Photosensitive body |
JPH03262185A (en) * | 1990-03-13 | 1991-11-21 | Sumitomo Bakelite Co Ltd | Manufacture of ultraviolet shielding circuit board |
-
1992
- 1992-03-05 JP JP4738892A patent/JP2946919B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3135762A (en) * | 1961-01-19 | 1964-06-02 | Ciba Ltd | Bis(benzoxazolyl)thiophene compounds |
JPS5575405A (en) * | 1978-11-30 | 1980-06-06 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
JPS5735850A (en) * | 1980-08-13 | 1982-02-26 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
JPS62162535A (en) * | 1986-01-13 | 1987-07-18 | 松下電工株式会社 | Electric laminated board |
JPS62262052A (en) * | 1986-05-07 | 1987-11-14 | Minolta Camera Co Ltd | Photosensitive body |
JPH03262185A (en) * | 1990-03-13 | 1991-11-21 | Sumitomo Bakelite Co Ltd | Manufacture of ultraviolet shielding circuit board |
Also Published As
Publication number | Publication date |
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JP2946919B2 (en) | 1999-09-13 |
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Legal Events
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LAPS | Cancellation because of no payment of annual fees |