JPS643046B2 - - Google Patents

Info

Publication number
JPS643046B2
JPS643046B2 JP57087878A JP8787882A JPS643046B2 JP S643046 B2 JPS643046 B2 JP S643046B2 JP 57087878 A JP57087878 A JP 57087878A JP 8787882 A JP8787882 A JP 8787882A JP S643046 B2 JPS643046 B2 JP S643046B2
Authority
JP
Japan
Prior art keywords
single crystal
film
substrate
semiconductor film
exposed portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57087878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5825221A (ja
Inventor
Hiroyuki Tango
Yoshihisa Mizutani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57087878A priority Critical patent/JPS5825221A/ja
Publication of JPS5825221A publication Critical patent/JPS5825221A/ja
Publication of JPS643046B2 publication Critical patent/JPS643046B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/3238—
    • H10P14/2921—
    • H10P14/3411—
    • H10P14/3458—
    • H10P14/3808—
    • H10P14/382—

Landscapes

  • Recrystallisation Techniques (AREA)
JP57087878A 1982-05-26 1982-05-26 半導体装置の製造方法 Granted JPS5825221A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57087878A JPS5825221A (ja) 1982-05-26 1982-05-26 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57087878A JPS5825221A (ja) 1982-05-26 1982-05-26 半導体装置の製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP14327079A Division JPS5667923A (en) 1979-11-07 1979-11-07 Preparation method of semiconductor system

Publications (2)

Publication Number Publication Date
JPS5825221A JPS5825221A (ja) 1983-02-15
JPS643046B2 true JPS643046B2 (member.php) 1989-01-19

Family

ID=13927117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57087878A Granted JPS5825221A (ja) 1982-05-26 1982-05-26 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5825221A (member.php)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6156956A (ja) * 1984-08-28 1986-03-22 Seiko Instr & Electronics Ltd 基準電極
JPS6163049A (ja) * 1984-09-04 1986-04-01 Agency Of Ind Science & Technol Ｓｏｉ形成方法
JPS6476760A (en) * 1987-09-18 1989-03-22 Toshiba Corp Manufacture of semiconductor device
US5011589A (en) * 1988-09-30 1991-04-30 Kabushiki Kaisha Toshiba Solution component sensor device
JP2009224727A (ja) 2008-03-18 2009-10-01 Semiconductor Technology Academic Research Center 半導体装置とその製造方法
JP5373718B2 (ja) * 2010-08-17 2013-12-18 株式会社半導体理工学研究センター 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS5825221A (ja) 1983-02-15

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