JPS6412529A - Development of wafer - Google Patents

Development of wafer

Info

Publication number
JPS6412529A
JPS6412529A JP16932887A JP16932887A JPS6412529A JP S6412529 A JPS6412529 A JP S6412529A JP 16932887 A JP16932887 A JP 16932887A JP 16932887 A JP16932887 A JP 16932887A JP S6412529 A JPS6412529 A JP S6412529A
Authority
JP
Japan
Prior art keywords
developing
time
decided
cpt
tdt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16932887A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0330284B2 (enExample
Inventor
Yoichi Minami
Atsushi Sekiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUMITOMO G C EE KK
SUMITOMO GCA KK
Original Assignee
SUMITOMO G C EE KK
SUMITOMO GCA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUMITOMO G C EE KK, SUMITOMO GCA KK filed Critical SUMITOMO G C EE KK
Priority to JP16932887A priority Critical patent/JPS6412529A/ja
Publication of JPS6412529A publication Critical patent/JPS6412529A/ja
Publication of JPH0330284B2 publication Critical patent/JPH0330284B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP16932887A 1987-07-07 1987-07-07 Development of wafer Granted JPS6412529A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16932887A JPS6412529A (en) 1987-07-07 1987-07-07 Development of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16932887A JPS6412529A (en) 1987-07-07 1987-07-07 Development of wafer

Publications (2)

Publication Number Publication Date
JPS6412529A true JPS6412529A (en) 1989-01-17
JPH0330284B2 JPH0330284B2 (enExample) 1991-04-26

Family

ID=15884513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16932887A Granted JPS6412529A (en) 1987-07-07 1987-07-07 Development of wafer

Country Status (1)

Country Link
JP (1) JPS6412529A (enExample)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5158971A (ja) * 1974-11-20 1976-05-22 Nippon Naitoronikusu Kk Atsumikei
JPS57192954A (en) * 1981-05-23 1982-11-27 Dainippon Screen Mfg Co Ltd Surface processing method
JPS6263431A (ja) * 1985-09-13 1987-03-20 Mitsubishi Cable Ind Ltd 終点検出方法
JPS6249233U (enExample) * 1985-09-13 1987-03-26
JPS62193247A (ja) * 1986-02-20 1987-08-25 Fujitsu Ltd 現像終点決定方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5158971A (ja) * 1974-11-20 1976-05-22 Nippon Naitoronikusu Kk Atsumikei
JPS57192954A (en) * 1981-05-23 1982-11-27 Dainippon Screen Mfg Co Ltd Surface processing method
JPS6263431A (ja) * 1985-09-13 1987-03-20 Mitsubishi Cable Ind Ltd 終点検出方法
JPS6249233U (enExample) * 1985-09-13 1987-03-26
JPS62193247A (ja) * 1986-02-20 1987-08-25 Fujitsu Ltd 現像終点決定方法

Also Published As

Publication number Publication date
JPH0330284B2 (enExample) 1991-04-26

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