JPS6412529A - Development of wafer - Google Patents
Development of waferInfo
- Publication number
- JPS6412529A JPS6412529A JP16932887A JP16932887A JPS6412529A JP S6412529 A JPS6412529 A JP S6412529A JP 16932887 A JP16932887 A JP 16932887A JP 16932887 A JP16932887 A JP 16932887A JP S6412529 A JPS6412529 A JP S6412529A
- Authority
- JP
- Japan
- Prior art keywords
- developing
- time
- decided
- cpt
- tdt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To always obtain a product having a constant line width by a method wherein the end point of developing is decided. CONSTITUTION:A photo resist 2 exists on a substrate 1. A positive or a negative of a desired pattern is put on the resist 2 to expose. Developing of some sheets of wafers is performed and a time TDT up to reach to the optimum end point by trial and error is decided. At that time, multicolor light is irradiated on the wafers during the developing, the light of a proper wavelength is taken out of the reflected light, a time CPT between a change of a sine-wave form and the arrival to a break-through is decided, and TDT/CPT=A is computed. The CPT is computed during the developing and developing is performed for a time of AXCPT only. Thereby, a pattern having an almost constant line width can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16932887A JPS6412529A (en) | 1987-07-07 | 1987-07-07 | Development of wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16932887A JPS6412529A (en) | 1987-07-07 | 1987-07-07 | Development of wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6412529A true JPS6412529A (en) | 1989-01-17 |
JPH0330284B2 JPH0330284B2 (en) | 1991-04-26 |
Family
ID=15884513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16932887A Granted JPS6412529A (en) | 1987-07-07 | 1987-07-07 | Development of wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6412529A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158971A (en) * | 1974-11-20 | 1976-05-22 | Nippon Naitoronikusu Kk | ATSUMIKEI |
JPS57192954A (en) * | 1981-05-23 | 1982-11-27 | Dainippon Screen Mfg Co Ltd | Surface processing method |
JPS6263431A (en) * | 1985-09-13 | 1987-03-20 | Mitsubishi Cable Ind Ltd | Method for detecting end point |
JPS6249233U (en) * | 1985-09-13 | 1987-03-26 | ||
JPS62193247A (en) * | 1986-02-20 | 1987-08-25 | Fujitsu Ltd | Development endpoint detecting method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5843864A (en) * | 1981-09-10 | 1983-03-14 | Kubota Ltd | Agricultural working vehicle |
-
1987
- 1987-07-07 JP JP16932887A patent/JPS6412529A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5158971A (en) * | 1974-11-20 | 1976-05-22 | Nippon Naitoronikusu Kk | ATSUMIKEI |
JPS57192954A (en) * | 1981-05-23 | 1982-11-27 | Dainippon Screen Mfg Co Ltd | Surface processing method |
JPS6263431A (en) * | 1985-09-13 | 1987-03-20 | Mitsubishi Cable Ind Ltd | Method for detecting end point |
JPS6249233U (en) * | 1985-09-13 | 1987-03-26 | ||
JPS62193247A (en) * | 1986-02-20 | 1987-08-25 | Fujitsu Ltd | Development endpoint detecting method |
Also Published As
Publication number | Publication date |
---|---|
JPH0330284B2 (en) | 1991-04-26 |
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