JPS6410932B2 - - Google Patents

Info

Publication number
JPS6410932B2
JPS6410932B2 JP54112866A JP11286679A JPS6410932B2 JP S6410932 B2 JPS6410932 B2 JP S6410932B2 JP 54112866 A JP54112866 A JP 54112866A JP 11286679 A JP11286679 A JP 11286679A JP S6410932 B2 JPS6410932 B2 JP S6410932B2
Authority
JP
Japan
Prior art keywords
defect
pattern
composition
defective part
defective portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54112866A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5637626A (en
Inventor
Fumio Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP11286679A priority Critical patent/JPS5637626A/ja
Publication of JPS5637626A publication Critical patent/JPS5637626A/ja
Publication of JPS6410932B2 publication Critical patent/JPS6410932B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP11286679A 1979-09-05 1979-09-05 Inspection device for pattern Granted JPS5637626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11286679A JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11286679A JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Publications (2)

Publication Number Publication Date
JPS5637626A JPS5637626A (en) 1981-04-11
JPS6410932B2 true JPS6410932B2 (enrdf_load_stackoverflow) 1989-02-22

Family

ID=14597482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11286679A Granted JPS5637626A (en) 1979-09-05 1979-09-05 Inspection device for pattern

Country Status (1)

Country Link
JP (1) JPS5637626A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7935926B2 (en) * 2005-07-30 2011-05-03 Ho Seob Kim Inspection equipment for fine pattern and morphology using microcolumn

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192182A (enrdf_load_stackoverflow) * 1975-02-10 1976-08-12
JPS5258373A (en) * 1975-11-07 1977-05-13 Fujitsu Ltd Inspection for defects of pattern forming film

Also Published As

Publication number Publication date
JPS5637626A (en) 1981-04-11

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