JPH0545946B2 - - Google Patents
Info
- Publication number
- JPH0545946B2 JPH0545946B2 JP26893486A JP26893486A JPH0545946B2 JP H0545946 B2 JPH0545946 B2 JP H0545946B2 JP 26893486 A JP26893486 A JP 26893486A JP 26893486 A JP26893486 A JP 26893486A JP H0545946 B2 JPH0545946 B2 JP H0545946B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- scanning
- inspected
- dimensional
- data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 27
- 238000001514 detection method Methods 0.000 claims description 16
- 239000002245 particle Substances 0.000 claims description 10
- 238000007689 inspection Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000015654 memory Effects 0.000 description 15
- 238000010894 electron beam technology Methods 0.000 description 11
- 238000013461 design Methods 0.000 description 10
- 230000007547 defect Effects 0.000 description 7
- 238000012545 processing Methods 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61268934A JPS63122217A (ja) | 1986-11-12 | 1986-11-12 | 微細パタ−ン検査方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61268934A JPS63122217A (ja) | 1986-11-12 | 1986-11-12 | 微細パタ−ン検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63122217A JPS63122217A (ja) | 1988-05-26 |
| JPH0545946B2 true JPH0545946B2 (enrdf_load_stackoverflow) | 1993-07-12 |
Family
ID=17465313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61268934A Granted JPS63122217A (ja) | 1986-11-12 | 1986-11-12 | 微細パタ−ン検査方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63122217A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2840801B2 (ja) * | 1992-12-01 | 1998-12-24 | セイコーインスツルメンツ株式会社 | 座標変換係数の自動設定方法 |
| JP4665335B2 (ja) * | 2001-04-26 | 2011-04-06 | 株式会社島津製作所 | 電子線分析装置 |
| WO2006112242A1 (ja) * | 2005-04-14 | 2006-10-26 | Shimadzu Corporation | 基板検査装置 |
| JP4659004B2 (ja) | 2007-08-10 | 2011-03-30 | 株式会社日立ハイテクノロジーズ | 回路パターン検査方法、及び回路パターン検査システム |
-
1986
- 1986-11-12 JP JP61268934A patent/JPS63122217A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63122217A (ja) | 1988-05-26 |
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