JPS6323541B2 - - Google Patents

Info

Publication number
JPS6323541B2
JPS6323541B2 JP59207575A JP20757584A JPS6323541B2 JP S6323541 B2 JPS6323541 B2 JP S6323541B2 JP 59207575 A JP59207575 A JP 59207575A JP 20757584 A JP20757584 A JP 20757584A JP S6323541 B2 JPS6323541 B2 JP S6323541B2
Authority
JP
Japan
Prior art keywords
secondary ions
mask
ion beam
completion
defect
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59207575A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6186753A (ja
Inventor
Kazuo Aida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP59207575A priority Critical patent/JPS6186753A/ja
Publication of JPS6186753A publication Critical patent/JPS6186753A/ja
Publication of JPS6323541B2 publication Critical patent/JPS6323541B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP59207575A 1984-10-03 1984-10-03 マスク欠陥修正終了検出方法 Granted JPS6186753A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59207575A JPS6186753A (ja) 1984-10-03 1984-10-03 マスク欠陥修正終了検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59207575A JPS6186753A (ja) 1984-10-03 1984-10-03 マスク欠陥修正終了検出方法

Publications (2)

Publication Number Publication Date
JPS6186753A JPS6186753A (ja) 1986-05-02
JPS6323541B2 true JPS6323541B2 (enrdf_load_stackoverflow) 1988-05-17

Family

ID=16542020

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59207575A Granted JPS6186753A (ja) 1984-10-03 1984-10-03 マスク欠陥修正終了検出方法

Country Status (1)

Country Link
JP (1) JPS6186753A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63141060A (ja) * 1986-12-03 1988-06-13 Seiko Instr & Electronics Ltd マスク修正方法
JP2519512B2 (ja) * 1988-08-31 1996-07-31 セイコー電子工業株式会社 集束イオンビ―ム装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55150225A (en) * 1979-05-11 1980-11-22 Hitachi Ltd Method of correcting white spot fault of photomask
JPS5856332A (ja) * 1981-09-30 1983-04-04 Hitachi Ltd マスクの欠陥修正方法
JPS58202038A (ja) * 1982-05-21 1983-11-25 Hitachi Ltd イオンビ−ム加工装置

Also Published As

Publication number Publication date
JPS6186753A (ja) 1986-05-02

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