JPS6410103B2 - - Google Patents

Info

Publication number
JPS6410103B2
JPS6410103B2 JP57048673A JP4867382A JPS6410103B2 JP S6410103 B2 JPS6410103 B2 JP S6410103B2 JP 57048673 A JP57048673 A JP 57048673A JP 4867382 A JP4867382 A JP 4867382A JP S6410103 B2 JPS6410103 B2 JP S6410103B2
Authority
JP
Japan
Prior art keywords
film
oxide film
region
conductivity type
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57048673A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58165370A (ja
Inventor
Isami Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57048673A priority Critical patent/JPS58165370A/ja
Publication of JPS58165370A publication Critical patent/JPS58165370A/ja
Publication of JPS6410103B2 publication Critical patent/JPS6410103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe

Landscapes

  • Element Separation (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP57048673A 1982-03-26 1982-03-26 半導体装置の製造方法 Granted JPS58165370A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57048673A JPS58165370A (ja) 1982-03-26 1982-03-26 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57048673A JPS58165370A (ja) 1982-03-26 1982-03-26 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58165370A JPS58165370A (ja) 1983-09-30
JPS6410103B2 true JPS6410103B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-02-21

Family

ID=12809836

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57048673A Granted JPS58165370A (ja) 1982-03-26 1982-03-26 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58165370A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3340560A1 (de) * 1983-11-09 1985-05-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zum gleichzeitigen herstellen von schnellen kurzkanal- und spannungsfesten mos-transistoren in vlsi-schaltungen
JPS6144456A (ja) * 1984-08-09 1986-03-04 Fujitsu Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS58165370A (ja) 1983-09-30

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