JPS639931A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS639931A
JPS639931A JP61154391A JP15439186A JPS639931A JP S639931 A JPS639931 A JP S639931A JP 61154391 A JP61154391 A JP 61154391A JP 15439186 A JP15439186 A JP 15439186A JP S639931 A JPS639931 A JP S639931A
Authority
JP
Japan
Prior art keywords
ray
shutter
exposure
mirror
synchrotron radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61154391A
Other languages
English (en)
Japanese (ja)
Other versions
JPH058855B2 (enExample
Inventor
Kiyoshi Fujii
清 藤井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP61154391A priority Critical patent/JPS639931A/ja
Publication of JPS639931A publication Critical patent/JPS639931A/ja
Publication of JPH058855B2 publication Critical patent/JPH058855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61154391A 1986-06-30 1986-06-30 Ｘ線露光装置 Granted JPS639931A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61154391A JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61154391A JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS639931A true JPS639931A (ja) 1988-01-16
JPH058855B2 JPH058855B2 (enExample) 1993-02-03

Family

ID=15583111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61154391A Granted JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS639931A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63301000A (ja) * 1987-06-01 1988-12-08 Canon Inc 露光装置
JPH0435016A (ja) * 1990-05-31 1992-02-05 Toshiba Corp 放射線露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63301000A (ja) * 1987-06-01 1988-12-08 Canon Inc 露光装置
JPH0435016A (ja) * 1990-05-31 1992-02-05 Toshiba Corp 放射線露光装置

Also Published As

Publication number Publication date
JPH058855B2 (enExample) 1993-02-03

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