JPH058855B2 - - Google Patents

Info

Publication number
JPH058855B2
JPH058855B2 JP61154391A JP15439186A JPH058855B2 JP H058855 B2 JPH058855 B2 JP H058855B2 JP 61154391 A JP61154391 A JP 61154391A JP 15439186 A JP15439186 A JP 15439186A JP H058855 B2 JPH058855 B2 JP H058855B2
Authority
JP
Japan
Prior art keywords
ray
exposure
mirror
synchrotron radiation
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61154391A
Other languages
English (en)
Japanese (ja)
Other versions
JPS639931A (ja
Inventor
Kyoshi Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP61154391A priority Critical patent/JPS639931A/ja
Publication of JPS639931A publication Critical patent/JPS639931A/ja
Publication of JPH058855B2 publication Critical patent/JPH058855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP61154391A 1986-06-30 1986-06-30 Ｘ線露光装置 Granted JPS639931A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61154391A JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61154391A JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS639931A JPS639931A (ja) 1988-01-16
JPH058855B2 true JPH058855B2 (enExample) 1993-02-03

Family

ID=15583111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61154391A Granted JPS639931A (ja) 1986-06-30 1986-06-30 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS639931A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63301000A (ja) * 1987-06-01 1988-12-08 Canon Inc 露光装置
JPH0435016A (ja) * 1990-05-31 1992-02-05 Toshiba Corp 放射線露光装置

Also Published As

Publication number Publication date
JPS639931A (ja) 1988-01-16

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