JPS6138607B2 - - Google Patents
Info
- Publication number
- JPS6138607B2 JPS6138607B2 JP52063059A JP6305977A JPS6138607B2 JP S6138607 B2 JPS6138607 B2 JP S6138607B2 JP 52063059 A JP52063059 A JP 52063059A JP 6305977 A JP6305977 A JP 6305977A JP S6138607 B2 JPS6138607 B2 JP S6138607B2
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- shutter means
- shutter
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6305977A JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6305977A JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53148284A JPS53148284A (en) | 1978-12-23 |
| JPS6138607B2 true JPS6138607B2 (enExample) | 1986-08-30 |
Family
ID=13218382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6305977A Granted JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS53148284A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5618425A (en) * | 1979-07-24 | 1981-02-21 | Jeol Ltd | Apparatus for electron beam lithography |
| JPS5738587U (enExample) * | 1980-08-13 | 1982-03-01 | ||
| JPS63135000A (ja) * | 1986-11-26 | 1988-06-07 | 川崎重工業株式会社 | 電子ビ−ム装置 |
| JP2007258284A (ja) * | 2006-03-22 | 2007-10-04 | Jeol Ltd | 荷電粒子ビーム装置。 |
| JP5403739B2 (ja) * | 2009-05-18 | 2014-01-29 | 株式会社ニューフレアテクノロジー | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
-
1977
- 1977-05-30 JP JP6305977A patent/JPS53148284A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS53148284A (en) | 1978-12-23 |
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