JPS5618425A - Apparatus for electron beam lithography - Google Patents

Apparatus for electron beam lithography

Info

Publication number
JPS5618425A
JPS5618425A JP9413479A JP9413479A JPS5618425A JP S5618425 A JPS5618425 A JP S5618425A JP 9413479 A JP9413479 A JP 9413479A JP 9413479 A JP9413479 A JP 9413479A JP S5618425 A JPS5618425 A JP S5618425A
Authority
JP
Japan
Prior art keywords
electron
electron beam
trapping
boxes
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9413479A
Other languages
Japanese (ja)
Inventor
Nobuo Goto
Teruaki Okino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP9413479A priority Critical patent/JPS5618425A/en
Publication of JPS5618425A publication Critical patent/JPS5618425A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the contamination of the devices in the vicinity of light axis due to electron beam, to eliminate the drift of electron beam at the beginning of pattern drawing, and to reduce the frequency of replacement of trapping boxes, by arranging conductive electron trapping boxes at the positions away from the light axis. CONSTITUTION:When the drawing of a pattern has been finished and the drawing of the next pattern starts, the electron beam Eo projected from an electron gun 1 is deflected by a light deflecting system 7 for blanking depending on the command from an electronic computer 5. The deflected electron beam E1 enters the trapping box 8a through a small hole 9a of said electron beam trapping box 8a. Almost all the electrons which have entered said electron-beam trapping box 8a do not go out through the small hole 9a. Since the frequency of the replacement of the electron- beam trapping boxes 8a, 8b,... can be made remarkably few by sequentially using a plurality of the electron-beam trapping boxes 8a, 8b,..., the time and cost required for cleaning can be saved.
JP9413479A 1979-07-24 1979-07-24 Apparatus for electron beam lithography Pending JPS5618425A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9413479A JPS5618425A (en) 1979-07-24 1979-07-24 Apparatus for electron beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9413479A JPS5618425A (en) 1979-07-24 1979-07-24 Apparatus for electron beam lithography

Publications (1)

Publication Number Publication Date
JPS5618425A true JPS5618425A (en) 1981-02-21

Family

ID=14101922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9413479A Pending JPS5618425A (en) 1979-07-24 1979-07-24 Apparatus for electron beam lithography

Country Status (1)

Country Link
JP (1) JPS5618425A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013197467A (en) * 2012-03-22 2013-09-30 Nuflare Technology Inc Multi-charged particle beam lithography apparatus and multi-charged particle beam lithography method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53148284A (en) * 1977-05-30 1978-12-23 Jeol Ltd Charged particle ray apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53148284A (en) * 1977-05-30 1978-12-23 Jeol Ltd Charged particle ray apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013197467A (en) * 2012-03-22 2013-09-30 Nuflare Technology Inc Multi-charged particle beam lithography apparatus and multi-charged particle beam lithography method

Similar Documents

Publication Publication Date Title
JPS5442972A (en) Electrostatic deflecting device for electron beam tube
DD201954A5 (en) ELECTRON EXPOSURE SYSTEM
DE69207616T2 (en) Fast atom beam source
JPS5618425A (en) Apparatus for electron beam lithography
JPS52143776A (en) Electron beam exposure apparatus
US4710640A (en) Electron beam lithography
GB1394042A (en) Electron collector having means for reducing secondary electron interference in a linear beam microwave tube
JPS5776837A (en) Apparatus for multipile electron beam exposure
GB2020092B (en) High potential low magnification electron gun
GB1249427A (en) Cathode ray tube
JPS5576560A (en) Observation field moving device for electron microscope
JPS5354480A (en) Electron beam exposure apparatus
JPS5772232A (en) Production of shadow mask for color picture tube
JPS5783030A (en) Exposure of electron beam
JPS5694740A (en) Electronic beam exposure device
DE1764366B1 (en) VACUUM TUBE FOR DISPLAYING SYMBOLS ON A SCREEN POSITIONED AT ONE END OF THE TUBE
DE3169503D1 (en) Electron gun for a converging beam
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS5723449A (en) Electron gun for cathode ray tube
JPS5334576A (en) Electrostatic deflection type braun tube
GB1552103A (en) Electron beam producing arrangement for a cathode ray tube
JPS53132269A (en) Electron beam pattern projector
ES8801495A1 (en) Electron-beam external butt welding of tubes
JPS5691423A (en) Electron beam exposure device
IT8024696A0 (en) THREAD-FORM METALLIC CATHODE FOR AN ELECTRONIC BEAM APPARATUS.