JPS53148284A - Charged particle ray apparatus - Google Patents
Charged particle ray apparatusInfo
- Publication number
- JPS53148284A JPS53148284A JP6305977A JP6305977A JPS53148284A JP S53148284 A JPS53148284 A JP S53148284A JP 6305977 A JP6305977 A JP 6305977A JP 6305977 A JP6305977 A JP 6305977A JP S53148284 A JPS53148284 A JP S53148284A
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- ray apparatus
- particle ray
- beams
- cutting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6305977A JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6305977A JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53148284A true JPS53148284A (en) | 1978-12-23 |
JPS6138607B2 JPS6138607B2 (ja) | 1986-08-30 |
Family
ID=13218382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6305977A Granted JPS53148284A (en) | 1977-05-30 | 1977-05-30 | Charged particle ray apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53148284A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5618425A (en) * | 1979-07-24 | 1981-02-21 | Jeol Ltd | Apparatus for electron beam lithography |
JPS5738587U (ja) * | 1980-08-13 | 1982-03-01 | ||
JPS63135000A (ja) * | 1986-11-26 | 1988-06-07 | 川崎重工業株式会社 | 電子ビ−ム装置 |
JP2007258284A (ja) * | 2006-03-22 | 2007-10-04 | Jeol Ltd | 荷電粒子ビーム装置。 |
JP2010267909A (ja) * | 2009-05-18 | 2010-11-25 | Nuflare Technology Inc | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
-
1977
- 1977-05-30 JP JP6305977A patent/JPS53148284A/ja active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5618425A (en) * | 1979-07-24 | 1981-02-21 | Jeol Ltd | Apparatus for electron beam lithography |
JPS5738587U (ja) * | 1980-08-13 | 1982-03-01 | ||
JPS63135000A (ja) * | 1986-11-26 | 1988-06-07 | 川崎重工業株式会社 | 電子ビ−ム装置 |
JPH0569400B2 (ja) * | 1986-11-26 | 1993-09-30 | Kawasaki Heavy Ind Ltd | |
JP2007258284A (ja) * | 2006-03-22 | 2007-10-04 | Jeol Ltd | 荷電粒子ビーム装置。 |
JP2010267909A (ja) * | 2009-05-18 | 2010-11-25 | Nuflare Technology Inc | 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6138607B2 (ja) | 1986-08-30 |
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