JPS6381357A - 画像マスクの上下２枚同時搬送方法 - Google Patents

画像マスクの上下２枚同時搬送方法

Info

Publication number
JPS6381357A
JPS6381357A JP61226686A JP22668686A JPS6381357A JP S6381357 A JPS6381357 A JP S6381357A JP 61226686 A JP61226686 A JP 61226686A JP 22668686 A JP22668686 A JP 22668686A JP S6381357 A JPS6381357 A JP S6381357A
Authority
JP
Japan
Prior art keywords
masks
suction
film
mask
carrying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61226686A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360379B2 (enrdf_load_stackoverflow
Inventor
Kazunari Sakae
栄　一成
Tadao Komata
小俣　忠男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP61226686A priority Critical patent/JPS6381357A/ja
Publication of JPS6381357A publication Critical patent/JPS6381357A/ja
Publication of JPS6360379B2 publication Critical patent/JPS6360379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP61226686A 1986-09-25 1986-09-25 画像マスクの上下２枚同時搬送方法 Granted JPS6381357A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61226686A JPS6381357A (ja) 1986-09-25 1986-09-25 画像マスクの上下２枚同時搬送方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61226686A JPS6381357A (ja) 1986-09-25 1986-09-25 画像マスクの上下２枚同時搬送方法

Publications (2)

Publication Number Publication Date
JPS6381357A true JPS6381357A (ja) 1988-04-12
JPS6360379B2 JPS6360379B2 (enrdf_load_stackoverflow) 1988-11-24

Family

ID=16849063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61226686A Granted JPS6381357A (ja) 1986-09-25 1986-09-25 画像マスクの上下２枚同時搬送方法

Country Status (1)

Country Link
JP (1) JPS6381357A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6360379B2 (enrdf_load_stackoverflow) 1988-11-24

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