JPS6360379B2 - - Google Patents
Info
- Publication number
- JPS6360379B2 JPS6360379B2 JP22668686A JP22668686A JPS6360379B2 JP S6360379 B2 JPS6360379 B2 JP S6360379B2 JP 22668686 A JP22668686 A JP 22668686A JP 22668686 A JP22668686 A JP 22668686A JP S6360379 B2 JPS6360379 B2 JP S6360379B2
- Authority
- JP
- Japan
- Prior art keywords
- masks
- suction
- image
- film
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 13
- 238000005553 drilling Methods 0.000 claims 1
- 230000032258 transport Effects 0.000 description 12
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007666 vacuum forming Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61226686A JPS6381357A (ja) | 1986-09-25 | 1986-09-25 | 画像マスクの上下2枚同時搬送方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61226686A JPS6381357A (ja) | 1986-09-25 | 1986-09-25 | 画像マスクの上下2枚同時搬送方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6381357A JPS6381357A (ja) | 1988-04-12 |
JPS6360379B2 true JPS6360379B2 (enrdf_load_stackoverflow) | 1988-11-24 |
Family
ID=16849063
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61226686A Granted JPS6381357A (ja) | 1986-09-25 | 1986-09-25 | 画像マスクの上下2枚同時搬送方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6381357A (enrdf_load_stackoverflow) |
-
1986
- 1986-09-25 JP JP61226686A patent/JPS6381357A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6381357A (ja) | 1988-04-12 |
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