JPS6366394B2 - - Google Patents

Info

Publication number
JPS6366394B2
JPS6366394B2 JP58166562A JP16656283A JPS6366394B2 JP S6366394 B2 JPS6366394 B2 JP S6366394B2 JP 58166562 A JP58166562 A JP 58166562A JP 16656283 A JP16656283 A JP 16656283A JP S6366394 B2 JPS6366394 B2 JP S6366394B2
Authority
JP
Japan
Prior art keywords
etching
electrode
upper electrode
etching gas
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58166562A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6059078A (ja
Inventor
Seiji Sagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP16656283A priority Critical patent/JPS6059078A/ja
Publication of JPS6059078A publication Critical patent/JPS6059078A/ja
Publication of JPS6366394B2 publication Critical patent/JPS6366394B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP16656283A 1983-09-12 1983-09-12 ドライエツチング装置 Granted JPS6059078A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16656283A JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16656283A JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Publications (2)

Publication Number Publication Date
JPS6059078A JPS6059078A (ja) 1985-04-05
JPS6366394B2 true JPS6366394B2 (enrdf_load_stackoverflow) 1988-12-20

Family

ID=15833560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16656283A Granted JPS6059078A (ja) 1983-09-12 1983-09-12 ドライエツチング装置

Country Status (1)

Country Link
JP (1) JPS6059078A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0810689B2 (ja) * 1986-12-22 1996-01-31 東京エレクトロン株式会社 アッシング処理装置
JPH01108930U (enrdf_load_stackoverflow) * 1988-01-14 1989-07-24
JPH02184022A (ja) * 1989-01-11 1990-07-18 Koujiyundo Kagaku Kenkyusho:Kk Ｃｖｄ電極
JP2832724B2 (ja) * 1989-06-16 1998-12-09 東京エレクトロン株式会社 被処理体処理装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57131372A (en) * 1981-02-05 1982-08-14 Seiko Epson Corp Plasma etching device

Also Published As

Publication number Publication date
JPS6059078A (ja) 1985-04-05

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