JPS6364738B2 - - Google Patents
Info
- Publication number
- JPS6364738B2 JPS6364738B2 JP1438781A JP1438781A JPS6364738B2 JP S6364738 B2 JPS6364738 B2 JP S6364738B2 JP 1438781 A JP1438781 A JP 1438781A JP 1438781 A JP1438781 A JP 1438781A JP S6364738 B2 JPS6364738 B2 JP S6364738B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- inspected
- photoelectric
- signal
- scattered light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000003287 optical effect Effects 0.000 claims description 15
- 230000007547 defect Effects 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 11
- 230000001154 acute effect Effects 0.000 claims description 2
- 238000007689 inspection Methods 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 6
- 230000003321 amplification Effects 0.000 description 5
- 238000003199 nucleic acid amplification method Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1438781A JPS57128834A (en) | 1981-02-04 | 1981-02-04 | Inspecting apparatus of foreign substance |
US06/343,552 US4468120A (en) | 1981-02-04 | 1982-01-28 | Foreign substance inspecting apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1438781A JPS57128834A (en) | 1981-02-04 | 1981-02-04 | Inspecting apparatus of foreign substance |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62249879A Division JPS63171346A (ja) | 1987-10-05 | 1987-10-05 | 欠陥検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57128834A JPS57128834A (en) | 1982-08-10 |
JPS6364738B2 true JPS6364738B2 (de) | 1988-12-13 |
Family
ID=11859641
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1438781A Granted JPS57128834A (en) | 1981-02-04 | 1981-02-04 | Inspecting apparatus of foreign substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57128834A (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5982727A (ja) * | 1982-11-04 | 1984-05-12 | Hitachi Ltd | 異物検出方法及びその装置 |
JPH0621877B2 (ja) * | 1986-02-14 | 1994-03-23 | キヤノン株式会社 | 表面状態測定装置 |
JPH0621876B2 (ja) * | 1986-02-14 | 1994-03-23 | キヤノン株式会社 | 表面状態測定装置 |
JPH0629860B2 (ja) * | 1986-07-28 | 1994-04-20 | キヤノン株式会社 | 表面状態検査装置 |
JPS64452A (en) * | 1988-06-03 | 1989-01-05 | Hitachi Ltd | Detection of foreign matter |
JPH0715441B2 (ja) * | 1989-11-27 | 1995-02-22 | 株式会社日立製作所 | 異物検出方法及びその装置 |
JPH0816651B2 (ja) * | 1991-04-26 | 1996-02-21 | 株式会社日立製作所 | 両面異物検出方法及びその装置 |
Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498292A (de) * | 1972-05-10 | 1974-01-24 | ||
JPS4983470A (de) * | 1972-11-18 | 1974-08-10 | ||
US3879131A (en) * | 1974-02-06 | 1975-04-22 | Bell Telephone Labor Inc | Photomask inspection by real time diffraction pattern analysis |
US3984189A (en) * | 1973-01-19 | 1976-10-05 | Hitachi Electronics, Ltd. | Method and apparatus for detecting defects in a surface regardless of surface finish |
JPS5228594A (en) * | 1975-08-29 | 1977-03-03 | Matsushita Electric Works Ltd | Process for producing modified melamine resins having flexibility |
JPS5385375A (en) * | 1976-12-31 | 1978-07-27 | Fujitsu Ltd | Pattern inspecting device |
JPS54128682A (en) * | 1978-03-30 | 1979-10-05 | Hitachi Ltd | Automatic detector for foreign matters |
JPS5594145A (en) * | 1979-01-12 | 1980-07-17 | Hitachi Ltd | Method of and device for inspecting surface of article |
JPS5599735A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Testing method for foreign material on wafer |
JPS55107942A (en) * | 1979-02-13 | 1980-08-19 | Matsushita Electric Works Ltd | Inspecting method of plate |
JPS55149829A (en) * | 1979-05-11 | 1980-11-21 | Hitachi Ltd | Detector for foreign matter in wafer |
JPS5780546A (en) * | 1980-11-07 | 1982-05-20 | Nippon Kogaku Kk <Nikon> | Detecting device for foreign substance |
-
1981
- 1981-02-04 JP JP1438781A patent/JPS57128834A/ja active Granted
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498292A (de) * | 1972-05-10 | 1974-01-24 | ||
JPS4983470A (de) * | 1972-11-18 | 1974-08-10 | ||
US3984189A (en) * | 1973-01-19 | 1976-10-05 | Hitachi Electronics, Ltd. | Method and apparatus for detecting defects in a surface regardless of surface finish |
US3879131A (en) * | 1974-02-06 | 1975-04-22 | Bell Telephone Labor Inc | Photomask inspection by real time diffraction pattern analysis |
JPS5228594A (en) * | 1975-08-29 | 1977-03-03 | Matsushita Electric Works Ltd | Process for producing modified melamine resins having flexibility |
JPS5385375A (en) * | 1976-12-31 | 1978-07-27 | Fujitsu Ltd | Pattern inspecting device |
JPS54128682A (en) * | 1978-03-30 | 1979-10-05 | Hitachi Ltd | Automatic detector for foreign matters |
JPS5594145A (en) * | 1979-01-12 | 1980-07-17 | Hitachi Ltd | Method of and device for inspecting surface of article |
JPS5599735A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Testing method for foreign material on wafer |
JPS55107942A (en) * | 1979-02-13 | 1980-08-19 | Matsushita Electric Works Ltd | Inspecting method of plate |
JPS55149829A (en) * | 1979-05-11 | 1980-11-21 | Hitachi Ltd | Detector for foreign matter in wafer |
JPS5780546A (en) * | 1980-11-07 | 1982-05-20 | Nippon Kogaku Kk <Nikon> | Detecting device for foreign substance |
Also Published As
Publication number | Publication date |
---|---|
JPS57128834A (en) | 1982-08-10 |
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