JPS6361748U - - Google Patents
Info
- Publication number
- JPS6361748U JPS6361748U JP15578086U JP15578086U JPS6361748U JP S6361748 U JPS6361748 U JP S6361748U JP 15578086 U JP15578086 U JP 15578086U JP 15578086 U JP15578086 U JP 15578086U JP S6361748 U JPS6361748 U JP S6361748U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- extraction electrodes
- beam extraction
- support member
- ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims 3
- 238000000605 extraction Methods 0.000 claims 2
- 150000002500 ions Chemical class 0.000 claims 2
- 238000010292 electrical insulation Methods 0.000 claims 1
- 238000001816 cooling Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
図は本考案の一実施例の縦断面図である。
1…支持部材、2…支持部材、3…電極、4…
電極、5…電極、6…支持部材、7…冷却配管、
8…リード線、9…永久磁石、11…真空容器フ
ランジ、12…イオン源取付フランジ、13…絶
縁フランジ、14…プラズマ室フランジ、15…
プラズマ室内壁、16…プラズマ室外壁、17…
プラズマ室カバー、21…フイラメント、22…
プラズマ室。
The figure is a longitudinal sectional view of an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1...Supporting member, 2...Supporting member, 3...Electrode, 4...
Electrode, 5... Electrode, 6... Support member, 7... Cooling pipe,
8... Lead wire, 9... Permanent magnet, 11... Vacuum vessel flange, 12... Ion source mounting flange, 13... Insulating flange, 14... Plasma chamber flange, 15...
Plasma indoor wall, 16...Plasma room outer wall, 17...
Plasma chamber cover, 21... filament, 22...
plasma chamber.
Claims (1)
オンビーム引き出し電極を有するイオン源におい
て、イオンビーム引き出し電極の支持部材に電気
絶縁性が高く、かつ熱伝導性の高い材料を用いる
ことを特徴とするイオン源。 An ion source having a plurality of ion beam extraction electrodes for extracting ions as an ion beam, characterized in that a material with high electrical insulation and high thermal conductivity is used for a support member of the ion beam extraction electrodes.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15578086U JPS6361748U (en) | 1986-10-13 | 1986-10-13 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15578086U JPS6361748U (en) | 1986-10-13 | 1986-10-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6361748U true JPS6361748U (en) | 1988-04-23 |
Family
ID=31076791
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15578086U Pending JPS6361748U (en) | 1986-10-13 | 1986-10-13 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6361748U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03222241A (en) * | 1990-01-25 | 1991-10-01 | Tokyo Electron Ltd | Ion source device |
-
1986
- 1986-10-13 JP JP15578086U patent/JPS6361748U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03222241A (en) * | 1990-01-25 | 1991-10-01 | Tokyo Electron Ltd | Ion source device |
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