JPH0732851U - Ion source device - Google Patents

Abstract

(57) [Summary] [Purpose] To shorten the length of the support of the ion extraction electrode to make it compact. In an ion source device in which an ion extraction electrode 10 is supported on an electrode support frame 14 via an insulating spacer 24, an upper screw hole 25 is formed on the upper surface of the spacer 24, and an upper screw on the lower surface of the spacer 24 is formed. A lower screw hole 26 is formed at a position deviated from the hole 25, the upper screw 20 inserted into the through hole of the electrode is screwed into the upper screw hole 25, and the lower screw 21 inserted into the through hole of the support frame 14 is lowered. It is screwed into the screw hole 26.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to an ion source device in which an ion extraction electrode is supported by an electrode support frame via an insulating spacer.

[0002]

[Prior art]

 A circuit configuration of a conventional ion source device will be described with reference to FIG. Reference numeral 1 is an arc chamber, 2 is two current introducing terminals penetrating a housing 3 of the arc chamber 1, 4 is a filament connected to both terminals 2 inside the housing 3, and 5 is both terminals 2 outside the housing 3. Is an arc power source in which the + pole is connected to the housing 3 and the − pole is connected to the − pole of the filament electrode 5.

Reference numerals 7, 8 and 9 denote accelerating electrodes, decelerating electrodes, and ground electrodes forming the ion extracting electrode 10, and 11 is an accelerating power source in which a + pole is connected to the accelerating electrode 7 via a resistor 12, and a − pole is It is grounded, and the + pole is connected to the − pole of the arc power supply 6. Reference numeral 13 is a deceleration power supply whose negative electrode is connected to the deceleration electrode 8 and whose positive electrode is grounded.

Then, a heating current is supplied to the filament 4 from the filament power source 5 and an arc voltage is applied from the arc power source 6, whereby the thermoelectrons emitted from the filament 4 are accelerated, and the gas in the arc chamber 1 is accelerated. Is ionized and plasma is generated.

Further, an electric field formed by the acceleration electrode 7, the acceleration power supply 11, the deceleration electrode 8, the deceleration power supply 14, and the ground electrode 9 causes an ion beam to be extracted from the plasma. Next, the support portion of the ion extracting electrode 10 of FIG. 2 will be described with reference to FIG. Reference numeral 14 is an electrode support frame, 15 is a screw hole formed on the upper surface of the inner edge protrusion 16 of the support frame 14, 17 is a screw inserted into the through hole of the ground electrode 9 and screwed into the screw hole 15, and the ground electrode 9 Is supported.

Reference numeral 18 is a cylindrical insulating spacer, 19 is a screw hole penetrating the spacer 18, 20 is an upper screw inserted into the through hole of the deceleration electrode 8 and screwed onto the upper portion of the screw hole 19, 21 Is a lower screw that is inserted into the through hole of the flange portion 22 of the support frame 14 and screwed into the lower portion of the screw hole 19, and supports the deceleration electrode 8. Reference numeral 23 denotes an insulating spacer longer than the spacer 18, and like the deceleration electrode 8, the acceleration electrode 7 is supported by the support frame 14 by the spacer 23, the upper screw 20, and the lower screw 21.

[0007]

[Problems to be solved by the device]

 In the case of the conventional supporting means shown in FIG. 3, one screw hole 19 of the insulating spacer 18 is supported by the upper screw 20 and the lower screw 21 from the top and the bottom, so that the space between the tips of both screws 20, 21 is sufficient. It is necessary to take a proper insulation distance. That is, the length of the insulating spacer 18 is required to be (length of tightening portion of upper and lower screws 20, 21) + (insulating distance) or more, and the spacer 18 becomes long to support the ion extracting electrode 10. The problem is that the parts are long and large. The present invention has been made in consideration of the above points, and an object thereof is to provide an ion source device in which the length of the support portion of the ion extraction electrode is short and the size is small.

[0008]

[Means for Solving the Problems]

 In order to solve the above problems, the present invention provides an ion source device in which an ion extraction electrode is supported on an electrode support frame through an insulating spacer, and an upper screw hole is formed on the upper surface of the spacer, and A lower screw hole is formed on the lower surface of the spacer at a position displaced from the upper screw hole, and the upper screw inserted into the through hole of the electrode is screwed into the upper screw hole and inserted into the through hole of the support frame. A screw is screwed into the lower screw hole.

[0009]

[Action]

 In the ion source device of the present invention configured as described above, since the lower screw hole is formed separately from the upper screw hole of the insulating spacer, the upper spacer and the lower screw are formed as in the conventional case. The tips of the screws do not face each other with the same screw hole, and the length of the spacer is (the length of the tightening part of one screw) + (insulation distance) or more, which is one screw The length of the tightening part can be shortened, the spacer length is short, and the support part is short and compact.

[0010]

【Example】

 One embodiment will be described with reference to FIG. In the figure, the same reference numerals as those in FIG. 3 denote the same or corresponding parts, and the difference from FIG. 3 is the insulating spacer 24, which has a rectangular cross section, and the upper screw hole 25 and the lower screw hole 26 are vertically arranged. The upper screw 20 inserted through the through hole of the deceleration electrode 8 is screwed into the upper part of the upper screw hole 25 on one side and the lower part of the lower screw hole 26 on the other side is provided with the electrode support frame 14 This is the point at which the lower screw 21 inserted into the through hole of the collar portion 22 is screwed and the deceleration electrode 8 is supported.

That is, the upper screw 20 and the lower screw 20 are not screwed into one screw hole from above and below, but the respective screws 20, 21 are screwed into the respective screw holes 25, 26, and The tips of 20 and 21 do not face each other with one screw hole. Of course, both screw holes 25 and 26 may not penetrate vertically.

[0012]

[Effect of device]

 Since the present invention is configured as described above, it has the following effects. In the ion source device of the present invention, since the lower screw hole 26 is formed separately from the upper screw hole 25 of the insulating spacer 24, the tip ends of the upper screw 20 and the lower screw 21 are different from the conventional ones. Since the spaces are not opposite with the same screw hole, the length of the spacer 24 becomes (length of tightening part of one screw) + (insulation distance) or more, which is larger than that of the conventional one. The length can be shortened, the length of the spacer can be shortened, and the supporting portion can be shortened and downsized.

[Brief description of drawings]

1 is a cutaway front view of one embodiment of the present invention, FIG.
It is some cutting | disconnection right side views and some plan views.

FIG. 2 is a circuit configuration diagram of a conventional example.

FIG. 3 is a partially cut front view of a conventional example.

[Explanation of symbols]

 8 Deceleration Electrode 10 Ion Extraction Electrode 14 Electrode Support Frame 20 Upper Screw 21 Lower Screw 24 Insulating Spacer 25 Upper Screw Hole 26 Lower Screw Hole

Claims (1)

[Scope of utility model registration request] 1. An ion source device in which an ion extraction electrode is supported on an electrode support frame via an insulating spacer, wherein an upper screw hole is formed on an upper surface of the spacer and the upper screw hole is formed on a lower surface of the spacer. A lower screw hole is formed at a position displaced with respect to, and the upper screw inserted into the through hole of the electrode is screwed into the upper screw hole,
An ion source device in which a lower screw inserted through the through hole of the support frame is screwed into the lower screw hole.