JPS6331480Y2 - - Google Patents

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Publication number
JPS6331480Y2
JPS6331480Y2 JP1982114361U JP11436182U JPS6331480Y2 JP S6331480 Y2 JPS6331480 Y2 JP S6331480Y2 JP 1982114361 U JP1982114361 U JP 1982114361U JP 11436182 U JP11436182 U JP 11436182U JP S6331480 Y2 JPS6331480 Y2 JP S6331480Y2
Authority
JP
Japan
Prior art keywords
electrodes
high voltage
support
insulator
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982114361U
Other languages
Japanese (ja)
Other versions
JPS5918352U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11436182U priority Critical patent/JPS5918352U/en
Publication of JPS5918352U publication Critical patent/JPS5918352U/en
Application granted granted Critical
Publication of JPS6331480Y2 publication Critical patent/JPS6331480Y2/ja
Granted legal-status Critical Current

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Description

【考案の詳細な説明】 本考案は静電レンズ構造に関し、特にコンパク
トな構成の静電レンズ構造に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrostatic lens structure, and more particularly to an electrostatic lens structure with a compact structure.

例えばオージエ分折装置では試料表面の限定さ
れた領域にイオン銃からのイオンを照射し、エツ
チングを行い、試料の深さ方向の分折を行つてい
る。この際、イオンビームは試料上で例えば直径
1mm乃至0.1mm程度に細く絞られるが、この為、
2段程度の静電レンズが用意される。第1図はこ
のような2段の静電レンズを示しており、1A,
1B,1C,1D,1Eは各々円筒状の電極であ
る。該各電極は絶縁部材2A,2B,2C,2D
を介して一体的に構成されているが、電極1A,
1C,1Eは接地されており、電極1B,1Dに
は数KVオーダーの高電圧が印加され、結果とし
て2段の静電レンズ作用がこれらの電極によつて
もたらされる。ここで、各隣り合つた電極間には
数KVの電位差があるため、各絶縁部材は十分に
長く更には耐圧の優れた絶縁材料によつて形成し
なければならず、レンズ全体としては大型とな
り、高価となる。
For example, in an Augier spectrometer, a limited region of the surface of a sample is irradiated with ions from an ion gun, etching is performed, and the sample is analyzed in the depth direction. At this time, the ion beam is focused on the sample to a diameter of, for example, 1 mm to 0.1 mm, but for this reason,
Approximately two stages of electrostatic lenses are prepared. Figure 1 shows such a two-stage electrostatic lens, 1A,
1B, 1C, 1D, and 1E are cylindrical electrodes. The respective electrodes are insulating members 2A, 2B, 2C, 2D.
The electrodes 1A,
1C and 1E are grounded, and a high voltage on the order of several KV is applied to electrodes 1B and 1D, resulting in a two-stage electrostatic lens effect brought about by these electrodes. Here, since there is a potential difference of several KV between each adjacent electrode, each insulating member must be sufficiently long and made of an insulating material with excellent voltage resistance, making the lens as a whole large. , it becomes expensive.

本考案は上述した点に鑑みてなされたもので、
コンパクトな静電レンズ構造を提供することを目
的とする。
This invention was made in view of the above points,
The purpose is to provide a compact electrostatic lens structure.

本考案に基づく静電レンズ構造は、支持体と、
該支持体に固定され、接地電位あるいは低電圧が
印加される少なくとも3つの電極と、該電極の
内、外側の2つの電極の間に絶縁物を介して挟持
され、高電圧が印加される、少なくとも2つの高
電圧電極と、該高電圧電極の間に挟持された絶縁
物とを備え、該接地電位あるいは低電圧が印加さ
れる電極と高電圧電極とを交互に配置するように
構成したことを特徴としている。
The electrostatic lens structure based on the present invention includes a support,
At least three electrodes fixed to the support and to which a ground potential or a low voltage is applied, and an insulator sandwiched between the two outer and inner electrodes, to which a high voltage is applied. The structure includes at least two high voltage electrodes and an insulator sandwiched between the high voltage electrodes, and the electrodes to which the ground potential or low voltage is applied and the high voltage electrodes are arranged alternately. It is characterized by

以下本考案の一実施例を添付図面に基づき詳述
する。
An embodiment of the present invention will be described below in detail with reference to the accompanying drawings.

第2図において、11は絶縁基台であり、該基
台11にはイオン源12と導電性支持体13とが
固定されるが、該支持体13の両端部は円筒状に
形成されている。該支持体13には円筒状の電極
14,15,16がネジ止めされて固定される
が、該電極14,15との間には電極17が、又
電極15と16との間には電極18が配置され
る。該電極17と電極14との間には円筒状絶縁
体19が介在され、電極17と電極18との間に
は円筒状絶縁体20が介在され、電極18と電極
16との間には円筒状絶縁体21が夫々介在され
ている。該絶縁体20と21とは部分的に2ケ所
切欠かれており、その切欠部分以外は互いに接触
しておりその切欠部分の一方に電極18の支持部
18aが介在され、他の切欠部分を貫通して電極
15の支持棒15aが配置される。更に該電極1
6には絶縁体22が図示はされていないが、ネジ
止めされており、該絶縁体22には一対のX方向
偏向電極23,24がネジ止めされている。尚、
図示はされていないが該絶縁体22には更にY方
向の一対の偏向電極もネジ止めされている。
In FIG. 2, 11 is an insulating base, and an ion source 12 and a conductive support 13 are fixed to the base 11, and both ends of the support 13 are formed in a cylindrical shape. . Cylindrical electrodes 14, 15, and 16 are screwed and fixed to the support 13, and an electrode 17 is provided between the electrodes 14 and 15, and an electrode is provided between the electrodes 15 and 16. 18 are arranged. A cylindrical insulator 19 is interposed between the electrodes 17 and 14, a cylindrical insulator 20 is interposed between the electrodes 17 and 18, and a cylindrical insulator 20 is interposed between the electrodes 18 and 16. A shaped insulator 21 is interposed respectively. The insulators 20 and 21 are partially cut out at two places, and are in contact with each other except for the cutout parts, and the support part 18a of the electrode 18 is interposed in one of the cutout parts, and the support part 18a of the electrode 18 is inserted through the other cutout part. The support rod 15a of the electrode 15 is arranged accordingly. Furthermore, the electrode 1
Although not shown, an insulator 22 is screwed to the insulator 6, and a pair of X-direction deflection electrodes 23 and 24 are screwed to the insulator 22. still,
Although not shown, a pair of deflection electrodes in the Y direction are also screwed to the insulator 22.

上述した如き構成において、各電極を組立てる
際にはまず、基台11に支持体13が固定され、
その後電極14,15,16が該支持体13に固
定されるがこれらの電極のネジ止めの際に絶縁物
19,20,21、電極17,18を所定の位置
に配置し、これらの絶縁物と電極とを電極14と
電極16とによつて挾みつけるようにして固定
し、全体を一体化している。該導電性支持体13
に固定された電極14,15,16は接地電位と
されており、該接地電極に隣り合う電極17,1
8には高圧電源(図示せず)から数KVの高電圧
が印加され、その結果2段の静電レンズが構成さ
れる。ここで接地電位の電極は支持体13によつ
て互いに接続されており、又高電圧が印加される
電極17,18は絶縁体20を介して接続されて
いる。その結果、耐圧に十分な配慮が必要な絶縁
体は高電圧電極と接地電極とを接続する絶縁体1
9,21のみとなり、この絶縁体19,21を絶
縁性のすぐれた材料で大きく(長く)形成すれば
良く、他の絶縁物20としては耐圧の小さな材料
を使い、小さく(短く)形成することが可能とな
る。従つてレンズ構造を長く、大型にする原因と
なつていた耐圧に考慮すべき絶縁体の数を従来に
比し減らすことができ、レンズ構造がコンパクト
になると共に各電極を接続する構成体として耐圧
の小さな材料、あるいは導電体をも使用すること
が可能となるため、レンズ構造の設計が容易とな
る。尚、この実施例においては、比較的低電圧が
印加される偏向電極23,24は薄い絶縁体22
を介して接地電極16に固定されている。
In the configuration as described above, when assembling each electrode, first, the support 13 is fixed to the base 11,
Thereafter, the electrodes 14, 15, 16 are fixed to the support 13, but when screwing these electrodes, the insulators 19, 20, 21 and the electrodes 17, 18 are placed in predetermined positions, and these insulators are and electrodes are sandwiched and fixed by electrodes 14 and 16, and the whole is integrated. The conductive support 13
The electrodes 14, 15, 16 fixed to are at ground potential, and the electrodes 17, 1 adjacent to the ground electrodes
A high voltage of several KV is applied to 8 from a high voltage power supply (not shown), and as a result, a two-stage electrostatic lens is constructed. Here, the electrodes at ground potential are connected to each other by a support 13, and the electrodes 17 and 18 to which a high voltage is applied are connected via an insulator 20. As a result, the insulators that require sufficient consideration for withstand voltage are the insulator 1 that connects the high voltage electrode and the ground electrode.
9 and 21, and the insulators 19 and 21 need only be formed large (long) using a material with excellent insulating properties, and the other insulators 20 should be formed small (short) using a material with low withstand voltage. becomes possible. Therefore, it is possible to reduce the number of insulators that must be considered for voltage resistance, which would otherwise make the lens structure long and large. Since it becomes possible to use small materials or conductors, the design of the lens structure becomes easier. In this embodiment, the deflection electrodes 23 and 24 to which a relatively low voltage is applied are made of a thin insulator 22.
It is fixed to the ground electrode 16 via.

以上詳述した如く本考案により、コンパクトな
静電レンズ構造が提供される。尚、本考案は上述
した実施例に限定されることなく幾多の変形が可
能である。例えば、複数の接地電極を導電性支持
体に固定するようにしたが、この支持体を絶縁材
例では2段のレンズ構造を例に説明したが、3段
以上のレンズ構造にも本考案を適用することがで
きる。更に又電極14,15,16を接地した
が、これらの電極に比較的低い電圧を印加する場
合にも本考案を適用し得る。
As detailed above, the present invention provides a compact electrostatic lens structure. Note that the present invention is not limited to the embodiments described above, and can be modified in many ways. For example, a plurality of ground electrodes are fixed to a conductive support, and this support is made of an insulating material.Although the explanation was given using a two-stage lens structure as an example, the present invention can also be applied to a lens structure with three or more stages. Can be applied. Furthermore, although the electrodes 14, 15, and 16 are grounded, the present invention can also be applied to cases where a relatively low voltage is applied to these electrodes.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の静電レンズ構造を示す断面図、
第2図は本考案の一実施例を示す断面図である。 11:基台、12:イオン源、13:支持体、
14,15,16:接地電極、17,18:高電
圧電極、19,20,21,22:絶縁体、2
3,24:偏向電極。
Figure 1 is a cross-sectional view showing the structure of a conventional electrostatic lens.
FIG. 2 is a sectional view showing an embodiment of the present invention. 11: base, 12: ion source, 13: support,
14, 15, 16: Ground electrode, 17, 18: High voltage electrode, 19, 20, 21, 22: Insulator, 2
3, 24: Deflection electrode.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 支持体13と、該支持体13に固定され、接地
電位あるいは低電圧が印加される少なくとも3つ
の電極14,15,16と、該電極の内、外側の
2つの電極14,16の間に絶縁物19,21を
介して挟持され、高電圧が印加される、少なくと
も2つの高電圧電極17,18と、該高電圧電極
の間に挟持された絶縁物20とを備え、該接地電
位あるいは低電圧が印加される電極と高電圧電極
とを交互に配置するように構成した静電レンズ構
造。
Insulation is provided between the support 13, at least three electrodes 14, 15, 16 fixed to the support 13 and to which ground potential or low voltage is applied, and the two outer electrodes 14, 16. At least two high voltage electrodes 17 and 18 are sandwiched between objects 19 and 21 to which a high voltage is applied, and an insulator 20 is sandwiched between the high voltage electrodes, and the ground potential or the low An electrostatic lens structure configured to alternately arrange electrodes to which voltage is applied and high voltage electrodes.
JP11436182U 1982-07-28 1982-07-28 Electrostatic lens structure Granted JPS5918352U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11436182U JPS5918352U (en) 1982-07-28 1982-07-28 Electrostatic lens structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11436182U JPS5918352U (en) 1982-07-28 1982-07-28 Electrostatic lens structure

Publications (2)

Publication Number Publication Date
JPS5918352U JPS5918352U (en) 1984-02-03
JPS6331480Y2 true JPS6331480Y2 (en) 1988-08-23

Family

ID=30264386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11436182U Granted JPS5918352U (en) 1982-07-28 1982-07-28 Electrostatic lens structure

Country Status (1)

Country Link
JP (1) JPS5918352U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0429478Y2 (en) * 1984-10-23 1992-07-16

Also Published As

Publication number Publication date
JPS5918352U (en) 1984-02-03

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