JPS58201231A - Ion source device - Google Patents
Ion source deviceInfo
- Publication number
- JPS58201231A JPS58201231A JP8316182A JP8316182A JPS58201231A JP S58201231 A JPS58201231 A JP S58201231A JP 8316182 A JP8316182 A JP 8316182A JP 8316182 A JP8316182 A JP 8316182A JP S58201231 A JPS58201231 A JP S58201231A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- ion source
- source device
- magnetic field
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
Abstract
Description
【発明の詳細な説明】
〔発明の属す、る技術分封〕
本発明は、線状カスブ磁場を形成せる放電室を有すイオ
ン源装置の改良（ニーする。DETAILED DESCRIPTION OF THE INVENTION [Technical division to which the invention pertains] The present invention relates to an improvement of an ion source device having a discharge chamber capable of forming a linear cusp magnetic field.
放電熱ｖＩＩｋ極は、熱電子の放出が妨けられないよう
３０ガウスｉｔ以下のｉａ場顎城Ｃ二設けられなけれは
ならない。線状カスグミ場を形成せる磁石は放電ｍ壁に
設置されているから、放電基壁の近傍Ｃ二のみ磁場が局
在せられている。この両性３Ｋ［４二鑑み。The discharge heat vIIk pole must be provided with an ia field C2 of 30 Gauss or less so that the emission of thermoelectrons is not hindered. Since the magnet that forms the linear Kasugumi field is installed on the discharge m wall, the magnetic field is localized only in the vicinity C2 of the discharge base wall. This bisexual 3K [42 views.
従来、線条熱陰極は放電室壁な賞通し、強ａ場慣域を抜
き出るＩｉｌ、＊導入益の先端に設けられていた。Conventionally, the filament hot cathode has been installed at the tip of the discharge chamber wall, the Iil, which extracts the strong a-field inertia.
この鎗条熱＃Ｓ極用電流導入器は、一つの線榮当りぷニ
ー釣用いられ１通常のイオン源では数十率の蔵朱が用い
られている。ｔａ導入器は、放電室−からは電気的に絶
縁され、かつ外気の放電室内への漏洩を招かないように
されており、高価な用品である。This current introducer for the #S pole is used for one wire per line, and in a normal ion source, tens of tens of ratios are used. The TA introducer is electrically insulated from the discharge chamber and is designed to prevent outside air from leaking into the discharge chamber, and is an expensive item.
この発Ｆ９４Ｆｉ上述した従来装置の欠点を改良し、安
価な熱陰極支持法を提供することを目的とする。The purpose of this F94Fi is to improve the drawbacks of the conventional device described above and to provide an inexpensive hot cathode support method.
本発明は、少数本のｔｆｉ４人器を以って、ｂＯガウス
以上の強磁場領域に設けられた二枚の専電性板を支え、
これに支持棒な立てて放電用線条熱−極を保持するｍ成
とする。支持棒の長さを適宜に選ぶことにより、熱陰極
設置域の磁場癩涙な弱め熱電子の放出を促す。また、二
枚の環状平板を絶縁して支える絶縁部は、生成されたプ
ラズマや、熱陰極からのｌｋ発金金属よって表向が汚損
され、継続して使用すると表向漏洩電流が増大し絶縁不
良となる。これを防止するため、絶ｌｉｋ物表血の一部
が目隠しされるような絶縁物構成としたイオン源装置で
ある。The present invention uses a small number of TFI quadruple devices to support two electrically exclusive plates installed in a strong magnetic field region of bO Gauss or higher,
A support rod is erected on top of this to hold the wire heating electrode for discharge. By appropriately selecting the length of the support rod, the magnetic field in the hot cathode installation area is weakened and the emission of thermionic electrons is promoted. In addition, the surface of the insulating part that insulates and supports the two annular flat plates is contaminated by the generated plasma and the lk metal from the hot cathode, and if it is used continuously, the surface leakage current increases and the insulation becomes insulated. It becomes defective. In order to prevent this, the ion source device is constructed with an insulator so that a part of the surface blood of the patient is hidden.
本発明によれは、従来例に比べ少数の電流導入器を用い
ることによって、多数本のＨ条熱ｌ１ｊｆ極を支えるこ
とは、高価な電流尋入養数の大輪な節約を結果する。こ
の支持法は環状平板が＾但場領域に設けられること１二
より、特別にプラズマ損失を増大させる斃杏を轡ない。According to the present invention, by supporting a large number of H-line heating l1jf poles by using a smaller number of current introducers than in the conventional example, the number of expensive current introductions can be greatly reduced. This support method does not particularly suffer from increased plasma loss, since the annular plate is provided in the field area.
以下、本発明の詐細を図示の実施例によって直切する。 Hereinafter, the details of the present invention will be explained directly with reference to illustrated embodiments.
第１図は本発明の一実施例の歎略榊成を示す模式図であ
る。図中１は放電容器で、この壁外面に磁石２が般社ら
れている。容益内の５０ガウスを越える強ＷＩｉ場懺域
に二枚の塊状平板３を置き、電流導入器４で支える。環
状平板３には支持棒５薯二よって支えられた＃ｉ条熱隘
極６が埋め込まれる。FIG. 1 is a schematic diagram illustrating an embodiment of the present invention. In the figure, 1 is a discharge vessel, and a magnet 2 is mounted on the outer surface of this wall. Two massive flat plates 3 are placed in a strong WIi field area exceeding 50 Gauss within the space and supported by a current introducer 4. An #i-strip thermal pole 6 supported by two support rods 5 is embedded in the annular flat plate 3.
図でＵ［ｉ６が一本だ１示されているが一極６の総数は
、同構成で必要なだけ設けられる。支持棒５の長さは適
宜に選び１ｍ５ｉ条熱ｌｌ＆極６の箇かれる領域の磁楊
＠＆を下は侍る。第２図は塊状平板の支持榊敗鄭を拡大
した部分模式図を示す。電流導入器４は放電答姦壁ｌか
ら絶縁物７を介して電気的≦二絶縁きれてし＼る。電流
導入器の＊ａ導入芯部は塊状平板３をナツト構成などの
方式により支える。Although only one U[i6 is shown in the figure, the total number of poles 6 can be provided as many as necessary in the same configuration. The length of the support rod 5 is selected appropriately, and the bottom part is 1 m5 and the magnetic pole 6 is placed in the area where the heat ll&pole 6 is placed. Figure 2 shows an enlarged partial schematic diagram of the massive flat plate support. The current introducer 4 is electrically insulated from the discharge wall 1 via the insulator 7. The *a introduction core of the current introducer supports the blocky flat plate 3 by a nut structure or the like.
環状平板の相対位置関係は、絶縁カラー８．９゜ｌＯと
ビス・ナツト１１がら成る電気絶縁された締結部により
保持されている。この締結ｓ＃−ｉ絶縁部の−ｍ表向が
生成されたプラズマや熱隘惨から血視し侍ない様に構成
されている。The relative positional relationship of the annular flat plates is maintained by an electrically insulated fastener consisting of an insulating collar 8.9° lO and a screw nut 11. The -m surface of this fastening s#-i insulating part is constructed so as to protect it from generated plasma and heat disaster.
第１図は本発明のイオン源装置の放電室部の破断斜視図
、ＷＪ２図＃′ｉ部分拡大断面図である。
１・・・放電室 ２・・・磁石３・・・環状平
板 ４・・・電流導入器５・・・線条陰極支持棒
６・・・線条陰極７・・・絶縁物 ８・・・
絶縁カラー９・・・絶縁カラー ｌＯ川用縁カラー
１１・・・ビス・ナツト締結部
（７３１７）代堆入 弁理士 則 近 謝 佑 （＃１
か１名）第 １ 図FIG. 1 is a cutaway perspective view of the discharge chamber of the ion source device of the present invention, and an enlarged sectional view of a portion of Figure WJ2 #'i. 1... Discharge chamber 2... Magnet 3... Annular flat plate 4... Current introducer 5... Linear cathode support rod 6... Linear cathode 7... Insulator 8...
Insulation collar 9...Insulation collar IO River edge collar 11...Screw/nut fastening part (7317) Substitute Patent attorney Noriyuki Chika (#1
or 1 person) Figure 1
Claims (1)
配タリしこの放電１に縁状カスプ磁場を形成せる放電室
を有するイオン源装置−二おいて放を量的の５０カウス
を越える強磁場領域に二枚の集電性板を設けこの尋電性
板Ｃ＝立てた支持偉Ｉ：放電用線条熱隆極を保持し７た
ことを％似とするイオン源装置。 ＜２） ＃状平板二枚を電気絶縁して支える絶縁物の
表向の一部が放電によって形成されたプラズマより筐祝
し得ない徊成となっていて、絶縁物表面の全部が汚損さ
れることを防止せる特許請求の範囲第１）Ｊ記載のイオ
ン源装置。(1) An ion source device having a discharge chamber with two magnets arranged around the circumference C1ot forming a discharge chamber and forming an edge-shaped cusp magnetic field in this discharge 1. An ion source device in which two current-collecting plates are provided in the magnetic field region, and the current-collecting plate C = erected support I: holds a filamentary heat ridge for discharge. <2) A part of the surface of the insulator that electrically insulates and supports the two #-shaped flat plates has become irresistible due to the plasma formed by the discharge, and the entire surface of the insulator is contaminated. The ion source device according to claim 1) J, which prevents the above from occurring.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8316182A JPS5936384B2 (en) | 1982-05-19 | 1982-05-19 | ion source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8316182A JPS5936384B2 (en) | 1982-05-19 | 1982-05-19 | ion source device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58201231A true JPS58201231A (en) | 1983-11-24 |
| JPS5936384B2 JPS5936384B2 (en) | 1984-09-03 |
Family
ID=13794525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8316182A Expired JPS5936384B2 (en) | 1982-05-19 | 1982-05-19 | ion source device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5936384B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6188786U (en) * | 1984-11-15 | 1986-06-10 |
-
1982
- 1982-05-19 JP JP8316182A patent/JPS5936384B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5936384B2 (en) | 1984-09-03 |
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