JPS6251736U - - Google Patents
Info
- Publication number
- JPS6251736U JPS6251736U JP14137385U JP14137385U JPS6251736U JP S6251736 U JPS6251736 U JP S6251736U JP 14137385 U JP14137385 U JP 14137385U JP 14137385 U JP14137385 U JP 14137385U JP S6251736 U JPS6251736 U JP S6251736U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- conductor
- power supply
- threaded
- external
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000001133 acceleration Effects 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 2
- 238000010586 diagram Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図はこの考案の一実施例による筐体外より
の導体から装置内のエレメントへ電源を供給する
装置を示す構成図、第２図は従来の薄膜形成装置
を示す構成図である。
図において、１は真空槽、３は蒸着物質、５は
るつぼ、７は電子ボンバード用フイラメント、１
１はイオン化フイラメント、１６は加速電極、２
４は基板、２８はねじ導体、２９は槽壁、３０は
外部導体、３２は絶縁管、３３はねじ棒。なお、
図中同一符号は同一または相当部分を示す。
FIG. 1 is a block diagram showing an apparatus for supplying power from a conductor from outside the casing to elements within the apparatus according to an embodiment of the invention, and FIG. 2 is a block diagram showing a conventional thin film forming apparatus. In the figure, 1 is a vacuum chamber, 3 is a deposition material, 5 is a crucible, 7 is a filament for electron bombardment, 1
1 is an ionization filament, 16 is an accelerating electrode, 2
4 is a substrate, 28 is a threaded conductor, 29 is a tank wall, 30 is an external conductor, 32 is an insulating tube, and 33 is a threaded rod. In addition,
The same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
蒸発する蒸着物質のイオン化手段、イオンの加速
手段および薄膜を被着する基板を配設し、この基
板に上記蒸着物質の薄膜を形成する装置において
、上記加熱手段、イオン化手段、加速手段のよう
な外部電源より電力の供給を要する手段のために
、外部導体とねじによつて固定され、上記真空槽
の槽壁を絶縁管を介して貫通し、上記外部電源よ
り電力の供給を要する手段と接続するねじ導体と
、このねじ導体と間隔をおいて上記外部導体とね
じによつて固定され、槽壁を絶縁管を介して貫通
するねじ棒とを設けたことを特徴とする薄膜形成
装置。 In an apparatus for forming a thin film of the vapor deposition material on the substrate, the heating means for the crucible, the ionization means for the vapor deposition material evaporated from the crucible, the ion acceleration means, and the substrate to which the thin film is deposited are disposed in a vacuum chamber, For means that require power supply from an external power source, such as the heating means, ionization means, and acceleration means, the means are fixed with an external conductor and a screw, and penetrate the wall of the vacuum chamber via an insulating tube; A threaded conductor connected to a means that requires power supply from the external power supply, and a threaded rod that is fixed to the external conductor and the screw at a distance from the threaded conductor and that penetrates the tank wall via an insulated pipe. A thin film forming apparatus characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14137385U JPS6251736U (en) | 1985-09-18 | 1985-09-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14137385U JPS6251736U (en) | 1985-09-18 | 1985-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6251736U true JPS6251736U (en) | 1987-03-31 |
Family
ID=31049091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14137385U Pending JPS6251736U (en) | 1985-09-18 | 1985-09-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6251736U (en) |
-
1985
- 1985-09-18 JP JP14137385U patent/JPS6251736U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5710329A (en) | Sputter vapor depositing device | |
| US2988657A (en) | Ion pump | |
| JPS6251736U (en) | ||
| GB768003A (en) | Improvements in high vacuum pumps | |
| JPH051895Y2 (en) | ||
| US3327931A (en) | Ion-getter vacuum pump and gauge | |
| GB887251A (en) | Improvements in or relating to ionic vacuum pump devices | |
| JP2540492B2 (en) | Arc chamber device for ion source | |
| JPS6311560U (en) | ||
| JPS6251735U (en) | ||
| JPS5611332A (en) | Hot-cathode ionization vacuum gauge | |
| JP2606223B2 (en) | Insulator | |
| JPS637158U (en) | ||
| JPS62101860U (en) | ||
| JPH0784652B2 (en) | Ion plating device | |
| JPH0722843Y2 (en) | Plasma sputter type negative ion source | |
| JPS61176763U (en) | ||
| JPS6453751U (en) | ||
| JPS61113763A (en) | Electron bombardment type vapor depositing apparatus | |
| JPH0290663U (en) | ||
| JPS6361748U (en) | ||
| JPS6293837A (en) | Ion source | |
| JPS63115063U (en) | ||
| JPS62203265U (en) | ||
| JPH01279751A (en) | Thin film-forming equipment |