JPS6453751U - - Google Patents
Info
- Publication number
- JPS6453751U JPS6453751U JP14884887U JP14884887U JPS6453751U JP S6453751 U JPS6453751 U JP S6453751U JP 14884887 U JP14884887 U JP 14884887U JP 14884887 U JP14884887 U JP 14884887U JP S6453751 U JPS6453751 U JP S6453751U
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- vapor deposition
- sample
- electrical energy
- functional parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 claims 4
- 230000005684 electric field Effects 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 230000001133 acceleration Effects 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は本考案の実施例の要部縦断面図、第２
図はそのＡ―Ａ断面図、第３図はそのＢ―Ｂ断面
図である。
１……真空チヤンバ、１ａ……真空チヤンバ壁
体、２……加速用モジユール、２１……加速電極
、２１ａ……加速電極用導電性支柱、３……イオ
ン化用モジユール、３１……グリツド、３１ａ…
…グリツド用導電性支柱、３２……イオン化用フ
イラメント、３２ａ……フイラメント用導電性支
柱、３３……イオン化部熱反射板、７……接続端
子。
Figure 1 is a vertical sectional view of the main part of the embodiment of the present invention, Figure 2
The figure is a sectional view taken along line AA, and FIG. 3 is a sectional view taken along line BB. DESCRIPTION OF SYMBOLS 1... Vacuum chamber, 1a... Vacuum chamber wall, 2... Acceleration module, 21... Acceleration electrode, 21a... Conductive support for accelerating electrode, 3... Ionization module, 31... Grid, 31a …
... conductive support for grid, 32 ... filament for ionization, 32a ... conductive support for filament, 33 ... ionization part heat reflection plate, 7 ... connection terminal.
Claims (1)
空チヤンバに設けられた接続端子を介して電気エ
ネルギを供給することにより、蒸着材料を蒸発さ
せ、その蒸発粒子をイオン化し、そのイオンを所
定の電場で加速して上記真空チヤンバ内の試料表
面に衝突させることによつて、その試料表面に蒸
着薄膜を形成する装置において、上記蒸着用機能
部品群を一個もしくは複数個ごとにまとめて複数
のパーツに分割し、その各パーツを個別に導電性
支柱を介して上記真空チヤンバ内の所定位置に着
脱自在に装着し得るよう構成し、上記各パーツを
上記真空チヤンバ内に装着した際、上記蒸着用機
能部品それぞれに電気エネルギが、上記接続端子
および上記導電性支柱を介して供給されるよう構
成したことを特徴とする、クラスタイオンビーム
装置。 By supplying electrical energy to the functional parts for vapor deposition in the vacuum chamber through the connection terminals provided in the vacuum chamber, the vapor deposition material is evaporated, the evaporated particles are ionized, and the ions are applied to a predetermined electric field. In an apparatus that forms a vapor-deposited thin film on the surface of a sample by accelerating it at a speed and colliding with the surface of the sample in the vacuum chamber, the functional parts for vapor deposition are grouped one or more at a time to form a plurality of parts. The structure is such that each part can be separately attached and detached to a predetermined position in the vacuum chamber via a conductive support, and when each part is attached to the vacuum chamber, the vapor deposition function is achieved. A cluster ion beam device, characterized in that electrical energy is supplied to each component via the connection terminal and the conductive column.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14884887U JPS6453751U (en) | 1987-09-29 | 1987-09-29 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14884887U JPS6453751U (en) | 1987-09-29 | 1987-09-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6453751U true JPS6453751U (en) | 1989-04-03 |
Family
ID=31420539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14884887U Pending JPS6453751U (en) | 1987-09-29 | 1987-09-29 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6453751U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60162773A (en) * | 1984-01-31 | 1985-08-24 | Futaba Corp | Ion beam vapor deposition device |
-
1987
- 1987-09-29 JP JP14884887U patent/JPS6453751U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60162773A (en) * | 1984-01-31 | 1985-08-24 | Futaba Corp | Ion beam vapor deposition device |
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