JPS57155369A - High vacuum ion plating method and apparatus - Google Patents

High vacuum ion plating method and apparatus

Info

Publication number
JPS57155369A
JPS57155369A JP4071981A JP4071981A JPS57155369A JP S57155369 A JPS57155369 A JP S57155369A JP 4071981 A JP4071981 A JP 4071981A JP 4071981 A JP4071981 A JP 4071981A JP S57155369 A JPS57155369 A JP S57155369A
Authority
JP
Japan
Prior art keywords
steam stream
converged
magnetic material
source
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4071981A
Other languages
Japanese (ja)
Other versions
JPH0152472B2 (en
Inventor
Makoto Nagao
Akira Nahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4071981A priority Critical patent/JPS57155369A/en
Priority to DE19823204337 priority patent/DE3204337A1/en
Publication of JPS57155369A publication Critical patent/JPS57155369A/en
Publication of JPH0152472B2 publication Critical patent/JPH0152472B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To increase the deposition efficiency of a magnetic material and to improve the magnetic properties of a deposited film, by inoizing a steam stream of the magnetic material that has been converged by a difusion preventing means, and converging the stream further in a desired direction by an electric field. CONSTITUTION:In a high vaccum casing 1, a magnetic material evaporation source 4 housed in a hearth 3 is heated by an electron beam heating source 5 to evaporate as a steam stream V. The steam stream V rises and is converged as shown by arrows by a partition wall member 9 that is heated to at least the evaporation temperature of the evaporation source 4 by a heating source 12 and by the steam stream diffusion preventing means 6 including a heat shield member 10 on which a cooling coil 11 is wound, and is ionized to become an ion beam by an ionization facilitating means 13 comprising a thermoelectron discharge source 14 and an ionization electrode 15, the evaporation distribution is converged by a reticular converging electrode 16, and the ion beam is directed at a desired angle toward a substrate 18, and the evaporated particles are deposited to form a thin film thereon.
JP4071981A 1981-02-10 1981-03-20 High vacuum ion plating method and apparatus Granted JPS57155369A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4071981A JPS57155369A (en) 1981-03-20 1981-03-20 High vacuum ion plating method and apparatus
DE19823204337 DE3204337A1 (en) 1981-02-10 1982-02-09 Process and apparatus for forming a thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4071981A JPS57155369A (en) 1981-03-20 1981-03-20 High vacuum ion plating method and apparatus

Publications (2)

Publication Number Publication Date
JPS57155369A true JPS57155369A (en) 1982-09-25
JPH0152472B2 JPH0152472B2 (en) 1989-11-08

Family

ID=12588399

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4071981A Granted JPS57155369A (en) 1981-02-10 1981-03-20 High vacuum ion plating method and apparatus

Country Status (1)

Country Link
JP (1) JPS57155369A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (en) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd Vacuum deposition apparatus
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
JPS63204513A (en) * 1987-02-20 1988-08-24 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259835A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259832A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259833A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH01285023A (en) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH0256730A (en) * 1988-08-19 1990-02-26 Fuji Photo Film Co Ltd Production of magnetic recording medium

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021379A (en) * 1983-07-18 1985-02-02 Mitsubishi Heavy Ind Ltd Vacuum deposition apparatus
US4648347A (en) * 1984-05-30 1987-03-10 Leybold-Heraeus Gmbh Vacuum depositing apparatus
JPS63204513A (en) * 1987-02-20 1988-08-24 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259835A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259832A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPS63259833A (en) * 1987-04-17 1988-10-26 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH01285023A (en) * 1988-05-10 1989-11-16 Fuji Photo Film Co Ltd Apparatus for producing magnetic recording medium
JPH0256730A (en) * 1988-08-19 1990-02-26 Fuji Photo Film Co Ltd Production of magnetic recording medium

Also Published As

Publication number Publication date
JPH0152472B2 (en) 1989-11-08

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