JPS5868856A - Ion source - Google Patents
Ion sourceInfo
- Publication number
- JPS5868856A JPS5868856A JP56168188A JP16818881A JPS5868856A JP S5868856 A JPS5868856 A JP S5868856A JP 56168188 A JP56168188 A JP 56168188A JP 16818881 A JP16818881 A JP 16818881A JP S5868856 A JPS5868856 A JP S5868856A
- Authority
- JP
- Japan
- Prior art keywords
- ionized
- sample
- target
- argon
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007935 neutral effect Effects 0.000 claims abstract description 15
- 239000002245 particle Substances 0.000 claims abstract description 13
- 239000000126 substance Substances 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 29
- 229910052786 argon Inorganic materials 0.000 abstract description 17
- 150000002500 ions Chemical class 0.000 abstract description 14
- -1 argon ions Chemical class 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 7
- 239000007789 gas Substances 0.000 abstract description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 235000011187 glycerol Nutrition 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は質量分析装置に用いて好適なイオン源に関し、
特(こ試料を高速の中性粒子によって衝撃し試料のイオ
ン化を行うようにしたイオン源に関する0
近年導電性基板上に例えばグリセリンと被イオン化物質
との混合試料全塗布し、この試料に高速の中性粒子を衝
撃し、被イオン化物質をこの中性粒子のエネルギーによ
ってたたき出し、更1こイオン化する方式のイオン源が
注目されている。このイオン源は質量分析装置のイオン
源として用いた場合、イオン化のエネルギーが小さくソ
フトなイオン化であること、正イオンばかりでなく負イ
オンの生成率も高いこと、更には試料に中性粒子を衝撃
することからチャージアップがなく絶縁物試料でも容易
にイオン化ができる等多くの優れた特徴を有している。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ion source suitable for use in a mass spectrometer,
In recent years, a mixed sample of, for example, glycerin and a substance to be ionized has been completely coated on a conductive substrate, and this sample has been ionized by high-speed neutral particles. An ion source that bombards neutral particles and uses the energy of the neutral particles to knock out the substance to be ionized and further ionize it is attracting attention.When this ion source is used as an ion source for a mass spectrometer, The ionization energy is low and the ionization is soft, the generation rate of not only positive ions but also negative ions is high, and since neutral particles are bombarded with the sample, there is no charge-up and even insulating samples can be easily ionized. It has many excellent features such as:
しかしながらこのイオン源1こおいては、継続して一定
のエネルギー及び社の中性粒子を試料に衝撃しているに
も拘らず被イオン化物質のイオン化量は時間の経過と共
に除々に減少し、従って精密な試料の質量分析が困難と
なる〇このことは時間の経過と共に中性粒子の衝撃を受
ける試料表面部分において、この粒子の衝撃によっても
試料から離脱しすらい物質がエリ多く占めることによる
ものと推測され、更には試料表面の汚染による影響も無
視できないものとI(fi 1lll+される。However, in this ion source 1, although the sample is continuously bombarded with constant energy and neutral particles, the amount of ionization of the substance to be ionized gradually decreases with the passage of time. Accurate sample mass analysis becomes difficult. This is because over time, the surface of the sample that is bombarded by neutral particles is dominated by substances that tend to separate from the sample due to the bombardment of these particles. It is assumed that the influence of contamination on the sample surface cannot be ignored.
本発明は被イオン化物質のイオン化鼠全一定に保ち得る
イオン源を提供すること全目的とする。The overall object of the present invention is to provide an ion source that can maintain constant ionization of a substance to be ionized.
本発明は被イオン化物ぽを高速度の中性粒子によって衝
撃することによりイオン化するイオン源において、該物
質を加熱する手段をf+itlえることケ特徴としてい
る。本発明者による一実鹸Iこよればこの加熱により被
イオン化物質の可動性が向上し、試料内部から中性粒子
の衝撃を受ける試料の表面部分への被イオン化物質の移
動が活発化することからかなりの時間に亙って破イオン
化物質のイオン化fit’iニ一定1こ維持し得た。The present invention is characterized in that an ion source that ionizes a substance to be ionized by bombarding it with high-velocity neutral particles includes a means for heating the substance. According to Kazumi Ken I by the present inventor, this heating improves the mobility of the ionized substance and activates the movement of the ionized substance from the inside of the sample to the surface part of the sample that is bombarded by neutral particles. The ionization of the deionized substance could be maintained constant for a considerable period of time.
以下添付図面に基づき本発明の一実施例を詳述する。An embodiment of the present invention will be described in detail below based on the accompanying drawings.
図中1はアルゴンイオン銃であり、該イオン銃において
発生したアルゴンイオンは加速電極2によって加速され
る。この加速された高速度のアルゴンイオンビーム1ゴ
内部1こアルゴンガスが満たされた衝突室6内に入射し
その一部1まアルゴンガスと衝突して電荷を奪われ高速
の中性粒子となる。In the figure, 1 is an argon ion gun, and argon ions generated in the ion gun are accelerated by an accelerating electrode 2. This accelerated high-velocity argon ion beam 1 enters the collision chamber 6 filled with argon gas, and a portion of it collides with the argon gas, loses its charge and becomes high-speed neutral particles. .
この衝突室6の下部には静電偏向板4が配置されており
、該偏向板4によって衝突室3fc通過したアルゴンイ
オンは偏向して取り除かれ、中性粒子のみが該偏向板4
の下部に配置されたイオン化箱5内1こ導入される。該
イオン化箱5内部には基台6が配置されており、該基台
上には金属性支柱7.8が固定され該支柱間1こ1ま例
えばスポット溶接によってタングステンIIi!9が固
着されている。該タングステン線9上にIJ例えば銅製
のターゲット10がスポット溶接されている。該支柱7
,81:を加熱電源11に接続されており1.f:の結
果タングステン線91ま核電源11から供給される加熱
電流に応じて加熱される。該イ4ン化箱6.ターゲット
10等は電源12から例えば3KV程度のイオン加速電
圧が印加さ0.ており、更にこの加速電圧は分圧器16
で分圧され、スリット電(一群14に印加される。An electrostatic deflection plate 4 is disposed at the bottom of the collision chamber 6, and the argon ions that have passed through the collision chamber 3fc are deflected and removed by the deflection plate 4, and only neutral particles are transferred to the deflection plate 4.
The ionization box 5 is placed at the bottom of the ionization box 5. A base 6 is disposed inside the ionization box 5, and metal struts 7.8 are fixed onto the base, and the tungsten IIi! 9 is fixed. An IJ target 10 made of copper, for example, is spot welded onto the tungsten wire 9. The pillar 7
, 81: are connected to the heating power source 11 and 1. As a result of f:, the tungsten wire 91 is heated according to the heating current supplied from the nuclear power source 11. 6. An ion accelerating voltage of, for example, about 3 KV is applied to the target 10 etc. from the power source 12 and the voltage is 0.0 KV. Furthermore, this accelerating voltage is applied to the voltage divider 16.
The voltage is divided by the slit voltage and applied to the group 14.
上述した如き構成においてイオン銃1から発生し加速さ
れたアルゴンイオンの内のかなりのrfI+分は主とし
て衝突室6内においてアルゴン原子と衝突して電荷を失
う。該衝突室6から1−【中1’lのアルゴン原子と衝
突室内で電荷を失わなかったアルゴンイオンとの混合ビ
ームが得られるが、蒋アルゴンイオンは静電偏向板4に
よって偏向されその結果中+/IEアルゴン原子ビーム
のみが、ターゲット10に入射する。該ターゲットの表
面にIJ例えばグリセリン中に被イオン化物質全混合[
−た試料が塗布されており、R’l試料If中性アルゴ
ン原子ビームによって衝撃全労ける。該衝撃を受けた試
料表面の物質は蒸発し、そしてイオン化される。核イオ
ン化された物質はスリット電極群14によって引出され
、更に1オ加速されて質量分析部に導かれる。In the configuration as described above, a considerable amount of rfI+ of the argon ions generated and accelerated from the ion gun 1 mainly collides with argon atoms in the collision chamber 6 and loses electric charge. A mixed beam of argon atoms and argon ions that have not lost their charge in the collision chamber is obtained from the collision chamber 6, but the argon ions are deflected by the electrostatic deflection plate 4, resulting in Only the +/IE argon atomic beam is incident on the target 10. IJ is applied to the surface of the target, for example, by mixing the entire substance to be ionized in glycerin [
-A sample is coated and the R'l sample is bombarded by a neutral argon atomic beam. The material on the surface of the sample that has received the impact is evaporated and ionized. The nuclear ionized substance is extracted by the slit electrode group 14, further accelerated by 1°, and guided to the mass spectrometer.
ここで中性アルゴン原子ビームによって衝撃を受ける試
料表面部分1−1時間の経過と基に変化し、イオン化さ
れた物質の量が減少する。しかしながらこの実施例にお
いてはタングステン線9に電流全供給して加熱し、ター
ゲット10更には該ターゲット10に塗布された試料全
200°C乃至300C程度に加熱していることから試
料に含まれている破イオン化物質の可動性が向上し、ア
ルゴン原子ビームが衝撃する試料表面部分への該物質の
供給が活発化する。この結果上述した時間の経過と共に
イオン化物質の量が減少する現象1はほとんど生じなく
なり梢密なイオン化物質の質量分析を行うことができる
。Here, the sample surface portion 1-1 bombarded by the neutral argon atomic beam changes over time, and the amount of ionized material decreases. However, in this embodiment, the tungsten wire 9 is heated by supplying the full amount of current, and the target 10 and the entire sample coated on the target 10 are heated to about 200°C to 300°C. The mobility of the fractured ionized substance is improved, and the supply of this substance to the part of the sample surface that is bombarded by the argon atomic beam is increased. As a result, the above-described phenomenon 1 in which the amount of ionized substances decreases with the passage of time hardly occurs, and dense mass spectrometry of ionized substances can be performed.
以上本発明全詳述したが、本発明は上述した実施例1こ
限定されることなく幾多の変形が可能である。例えば被
イオン化物質を加熱するためターゲットが固着されたタ
ングステン線を通電加熱するようにしたが、ターゲット
(試料)に接近してf−E意のヒーターを配置し、この
ヒーターからの輻射熱によって試料を加熱するように1
−でも良く、又仙の加熱手段を用いても艮い。Although the present invention has been fully described in detail above, the present invention is not limited to the first embodiment described above and can be modified in many ways. For example, in order to heat the substance to be ionized, a tungsten wire to which a target is fixed is heated by passing an electric current through it, but an f-E type heater is placed close to the target (sample), and the sample is heated by the radiant heat from this heater. 1 to heat
It is also possible to use other heating means.
添付図面(J本発明の一実楕例全示す図である。
1:イオン銃、2:加速市1極、3:衝突室、4:靜i
i!m向板、5:イオン化箱、6:基r)、7゜8:支
柱、9:タングステン線、10:ターゲット、11:加
熱電源、12:電源、16:分子E器、14ニスリット
電極群。
特許出願人
日本電子株式会社
代表者加勢忠椎Attached drawings (J This is a diagram showing a complete example of the present invention. 1: Ion gun, 2: Acceleration city 1 pole, 3: Collision chamber, 4: Silence)
i! m direction plate, 5: ionization box, 6: group r), 7° 8: pillar, 9: tungsten wire, 10: target, 11: heating power source, 12: power source, 16: molecular E device, 14 Nislit electrode group. Patent applicant JEOL Ltd. Representative Tadashi Kasei
Claims (1)
とによりイオン化するイオン源において、該物質を加熱
する手段を備えたことを特徴とするイオン源。An ion source that ionizes a substance to be ionized by bombarding it with high-velocity neutral particles, the ion source comprising means for heating the substance.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56168188A JPS5868856A (en) | 1981-10-21 | 1981-10-21 | Ion source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56168188A JPS5868856A (en) | 1981-10-21 | 1981-10-21 | Ion source |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5868856A true JPS5868856A (en) | 1983-04-23 |
JPH0228226B2 JPH0228226B2 (en) | 1990-06-22 |
Family
ID=15863408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56168188A Granted JPS5868856A (en) | 1981-10-21 | 1981-10-21 | Ion source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5868856A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5493361U (en) * | 1977-12-14 | 1979-07-02 |
-
1981
- 1981-10-21 JP JP56168188A patent/JPS5868856A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5493361U (en) * | 1977-12-14 | 1979-07-02 |
Also Published As
Publication number | Publication date |
---|---|
JPH0228226B2 (en) | 1990-06-22 |
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