JPS5868857A - Ion source - Google Patents

Ion source

Info

Publication number
JPS5868857A
JPS5868857A JP56168189A JP16818981A JPS5868857A JP S5868857 A JPS5868857 A JP S5868857A JP 56168189 A JP56168189 A JP 56168189A JP 16818981 A JP16818981 A JP 16818981A JP S5868857 A JPS5868857 A JP S5868857A
Authority
JP
Japan
Prior art keywords
ionized
target
ion source
argon
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56168189A
Other languages
Japanese (ja)
Inventor
Norihiro Naito
統広 内藤
Yoshihiro Naito
内藤 善博
Fumio Kunihiro
国広 文夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP56168189A priority Critical patent/JPS5868857A/en
Publication of JPS5868857A publication Critical patent/JPS5868857A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/14Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/08Ion sources
    • H01J2237/0802Field ionization sources
    • H01J2237/0807Gas field ion sources [GFIS]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To obtain an ion source with high ionized efficiency by arranging an electric field ionized means in close vicinity to a target. CONSTITUTION:The argon ions generated from an ion gun 1 and accelerated by it are incident on a bombardment chamber 3 that is filled with argon gas. A part of them collides with argon gas, is deprived of charge, changes into a high speed neutral particle, is introduced in an ionized box 5, and is incident on a target 6. The surface of the target 6 is coated with a sample in which an ionized material is mixed. The sample is bombarded by a neutral argon atmic beam, is beaten and driven out from above the target, and is ionized, but part of it is not ionized but is floated. Positive high voltage is applied to a linear member 7 and negative high voltage is applied to an electrode 9. Since an electric field is concentrated in the vicinity of the linear member 7, a suspended particle is ionized by this intense electric field.

Description

【発明の詳細な説明】 本発明I4質量分析装齢に用いて好適なイオン源に関し
、特に試料を高速の中性粒子によって衝撃し、試料のイ
オン化を行うようにしたイオン源に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an ion source suitable for use in an I4 mass spectrometer, and particularly to an ion source that bombards a sample with high-speed neutral particles to ionize the sample.

近年導電性ターゲット上に例えばグリセリンと被イオン
化物質との混合試料全塗布し、この試料に高速の中性粒
子を衝撃し、被イオン化物質をこの中性粒子のエネルギ
ー1こよってたたキI L、更にイオン化する方式のイ
オン源が注[Iされている。
In recent years, a mixed sample of, for example, glycerin and a substance to be ionized is coated on a conductive target, the sample is bombarded with high-speed neutral particles, and the substance to be ionized is struck by the energy of the neutral particles. However, an ion source with further ionization has been introduced.

このイオン源は質量分析装置のイオン源として用オンの
生成率も高論こと、四に11試料に中性粒子を衝撃する
ことからチャージアップがなく絶縁物試料でも容易にイ
オン化ができる等多くの優れた特徴を有している。しか
しながらこのイオン源において、高速度の中性粒子の衝
撃によってたたき出された被イオン化物′贋の一部(J
イオン化さ0、るに至らず、中性粒子とたって浮、・・
Tし、イオン化室内のAずれかの部材に耐層する。
This ion source is used as an ion source for mass spectrometers, and has many advantages such as a high rate of ion generation, and because it bombards the sample with neutral particles, there is no charge-up and even insulating samples can be easily ionized. It has excellent characteristics. However, in this ion source, a part of the ionized material (J
Ionization does not reach 0 or 0, and it floats as a neutral particle...
T, and apply a layer to any member A in the ionization chamber.

本発明はイオン化効率の高いイオン源を提供することを
目的とするものである。
An object of the present invention is to provide an ion source with high ionization efficiency.

本発明においてCオターゲットヒに保持さC1た破イオ
ン化物質を高速度の中性粒子によって衝撃子ることによ
゛つてイオン化するイオン源に訃いて、該ターゲットに
接近して電界イオン化手段を配置すること全特徴として
いる。鹸電岑イオン化手段は例えばターゲットに接近し
て配置さn該ターゲットと略同電位の細い線状部材と、
該線状部材に接近して配置さn e t Ifとより成
り、該線状部材と核電礪間に高電圧が印加されることか
ら該ターゲットからたたき出されたがイオン化されない
被イオン化物質の粒子は該線状部材に集中している高を
芹によってイオン化され、従ってイオン源のイオン化効
率金高めることができる。
In the present invention, an electric field ionization means is placed close to the ion source, which ionizes the C1 fractured ionized substance held in the C target by bombarding it with high-velocity neutral particles. It has all the features. The ionizing means includes, for example, a thin wire member disposed close to the target and having approximately the same potential as the target;
Particles of the ionized substance that are placed close to the linear member and are ejected from the target but not ionized due to the application of a high voltage between the linear member and the nuclear cell. The particles concentrated in the linear member are ionized by the ions, thus increasing the ionization efficiency of the ion source.

以下本発明の一実施例全添付図面に基づき詳述する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to all the accompanying drawings.

図中1はアルゴンイオン銃であり、該イオン銃において
発生したアルゴンイオンは加速室(執2によって加速さ
れる。この加速さ(また高速度のアルゴンイオンビーム
1ま内部にアルゴンガスが満たされた衝突室6内に入射
し、その一部1まアルゴンガスと面突して電荷を奪われ
、高速の中性粒°子となる。この衝突室乙の下部には静
電偏向板4が配置されており、該偏向板4によって衝突
室3を通過したアルゴンイオン1ま偏向さ0.て取り除
かれ、電該イオン化箱5内には例えば銅製のターゲット
6が配置され、又該ターゲット乙に娶近して導電性の線
状部材7が配置されているが肘イオン化箱5、ターゲッ
ト6及び線状部材7には電源8がら例えば3KVの電圧
が印加さ0.る。更にU線伏KB材7上ボした如き構成
においてイオン銃1から発生し加速されたアルゴンイオ
ンの内のかなりの部分は主として衝突室6内においてア
ルゴン原子ト衝突して電荷を失う。該衝突室6から11
中件の高車アルゴン原子と衝突室内で電荷を失わなかっ
たアルゴンイオンとの混合ビームがイ()ら0.るが、
該アルゴンイオンIJljl)電偏向板4によってf[
;a向され、その結果中性のアルゴン原子ビームのみが
ターゲット6に入射する。該ターゲット乙の表面に11
例えばグリセリン中の被イオン化物質全混合した試料が
塗布されており、該試料は中性アルゴン原子ビームによ
って衝撃を受ける。該衝撃を受けた試料表面の物′題は
該ターゲット上からたたき出され更に中性アルゴン原子
ビームのエネルギー1こよってイオン化される。蒋イオ
ン化されt粒子は電極9によって引出され更に加速され
て質量分析部に導かれる。ところで、糟ターゲットから
たたき出された被イオン化物質の一部1まイオン化まで
に至らず浮遊する。ここで線状部材7に1ま正の高電圧
が、又1!極9には負の高電圧が印加されていることか
ら語線状部材7の近傍に1ば電界が集中し、該浮遊粒子
1まこの強電界1こよってイオン化され直ちに電極9に
よって加速され、質量分析部に導かれるO このように本発明においては高速度の中性粒子の衝撃に
よ−っでもイオン化しなかった物質粒子をtWによって
イオン化することができるため、イオン化効率を高める
ことができる。従って試料の量が少い場合でも十分な質
量分析を行うことができると共に、高速中1生粒子の衝
撃によってはイオン化しずらい物質でも電界の補助によ
−ってイオン化を行うことができる。
In the figure, 1 is an argon ion gun, and the argon ions generated in the ion gun are accelerated by an acceleration chamber (2). They enter the collision chamber 6, and a part of them collides with the argon gas and is deprived of electric charge, becoming high-speed neutral particles.An electrostatic deflection plate 4 is arranged at the bottom of the collision chamber 6. The argon ions 1 that have passed through the collision chamber 3 are deflected and removed by the deflection plate 4, and a target 6 made of copper, for example, is placed in the electrical ionization box 5, and a target 6 made of copper, for example, is placed in the ionization box 5. A conductive wire member 7 is placed close to the elbow ionization box 5, target 6, and wire member 7, and a voltage of 3 KV, for example, is applied from a power source 8.In addition, a U wire KB material is applied to the elbow ionization box 5, target 6, and wire member 7. 7 In the configuration shown above, a considerable portion of the argon ions generated and accelerated from the ion gun 1 mainly collide with argon atoms in the collision chamber 6 and lose charge.
A mixed beam of high-speed argon atoms and argon ions that did not lose their charge in the collision chamber was released from I() to 0. However,
The argon ions IJljl) are f[
; As a result, only the neutral argon atomic beam is incident on the target 6. 11 on the surface of the target
For example, a sample containing a complete mixture of substances to be ionized in glycerin is applied, and the sample is bombarded with a beam of neutral argon atoms. Objects on the sample surface that have received the impact are ejected from the target and further ionized by the energy 1 of the neutral argon atomic beam. The ionized T-particles are extracted by the electrode 9, further accelerated, and guided to the mass spectrometer. By the way, a part of the ionized substance ejected from the carbon target does not reach the stage of ionization and remains floating. Here, a positive high voltage of 1 is applied to the wire member 7, and 1! Since a negative high voltage is applied to the electrode 9, an electric field is concentrated in the vicinity of the wire member 7, and the floating particles 1 are ionized by the strong electric field 1 and immediately accelerated by the electrode 9. In this way, in the present invention, material particles that are not ionized even by the impact of high-velocity neutral particles can be ionized by tW, so the ionization efficiency can be increased. . Therefore, sufficient mass spectrometry can be performed even when the amount of sample is small, and even substances that are difficult to ionize due to the impact of high-speed primary particles can be ionized with the aid of an electric field.

以上本発明全詳述したが、本発明let 1:Jした実
施例に限定されることなく幾多の変形が可能である。例
えば線状部材7に代え格子状あるい1:【メツシュ状の
線状部材を配置しても良く、又従来の電界脱離イオン源
に使用される多数の針状材を有した線状部材音用いても
良い。
Although the present invention has been fully described in detail above, the present invention is not limited to the embodiments described above and can be modified in many ways. For example, instead of the linear member 7, a grid-like or mesh-like linear member may be arranged, or a linear member having a large number of needle-like members used in a conventional field desorption ion source. You can also use sound.

【図面の簡単な説明】[Brief explanation of drawings]

添付図面は本発明の一実泡例を示す[4である。 1:アルゴンイオン銃、2:加法電極、3:衝突室、4
:静電偏向板、5:イオン化箱、6:ターゲット、7:
線状部材、8:電源、9:電極、10:′α源。 特許出願人 日日本電子株式会社 代表者 加 勢 忠 Jイ( 手続補正書(自発ン 昭i[156年12月2Br+ 1事件の表示 昭 和56−+1tI−!1′  許 願第 1681
89号2発 ty]  の名称 イオン源 3 補正をする者 特 許 出+m人 住 所  東京都昭島市中神町1418番地(置042
5(43)1111)名称 (427)日本電子株式会
社 4補正の対象 明細1第6頁8行目と9行目の間1こ以下の文酢を挿入
する。 「 更lこ上述しtこ実施例ではターデッドb ’4固
定であったが、ターデッドとして例えば移動しイiるベ
ルトを使用し、このベル) l(液体クロマトグラフか
らの流出液を展開保持させて連続的1こイオン化箱5内
へ送り込んで中性粒子を照射すれば、流出液1こ含まれ
る試料を順次イオン化し買置分析することが可能となる
。」 以上
The accompanying drawings show a single foam example of the present invention [4]. 1: Argon ion gun, 2: Additive electrode, 3: Collision chamber, 4
: Electrostatic deflection plate, 5: Ionization box, 6: Target, 7:
Linear member, 8: power source, 9: electrode, 10: 'α source. Patent Applicant Japan Electronics Co., Ltd. Representative Tadashi Kasei
No. 89, 2 shots ty] Name of ion source 3 Patent for the person making the correction Issue + m Address 1418 Nakagami-cho, Akishima City, Tokyo (Location 042)
5 (43) 1111) Name (427) JEOL Co., Ltd. 4 Amendment Subject Specification 1 Page 6, between lines 8 and 9, insert one or less sentences. In addition, in the above-mentioned embodiment, the turret belt was fixed, but for example, a movable belt was used as the turret, and this belt was used to develop and hold the effluent from the liquid chromatograph. By continuously feeding one sample into the ionization box 5 and irradiating it with neutral particles, it becomes possible to sequentially ionize the sample containing one sample of the effluent and conduct an analysis.''

Claims (1)

【特許請求の範囲】 L ターゲット上に保持さC1た破イオン化物質を高速
度の中性粒子によってfI撃すること1こよりイオン比
するイオン#jこお1八で、才亥ターゲットに接近して
電がイオン化手段全配置したイオン源。 2 前記を界イオン化手段はターゲットに接近して配置
され該ターゲットと略同電位の線状部材と、該線状部材
に接近して配IMさ0.た電極とより成り、該線状部材
と該電1―間に高電圧が印加さαる特許請求の範囲第1
項記載のイオン源。
[Claims]L: Bombarding the C1-depleted ionized substance held on the target with high-velocity neutral particles. Ion source with all ionization means arranged. 2. The field ionizing means includes a linear member disposed close to the target and having substantially the same potential as the target, and an IM 0. claim 1, wherein a high voltage is applied between the linear member and the electrode.
Ion source as described in section.
JP56168189A 1981-10-21 1981-10-21 Ion source Pending JPS5868857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56168189A JPS5868857A (en) 1981-10-21 1981-10-21 Ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56168189A JPS5868857A (en) 1981-10-21 1981-10-21 Ion source

Publications (1)

Publication Number Publication Date
JPS5868857A true JPS5868857A (en) 1983-04-23

Family

ID=15863428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56168189A Pending JPS5868857A (en) 1981-10-21 1981-10-21 Ion source

Country Status (1)

Country Link
JP (1) JPS5868857A (en)

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